Ananda K. Banerji

Person

West Linn, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Film stack simplification for high aspect ratio patterning and vert...
- Patent number 12,080,592
- Issue date Sep 3, 2024
- Lam Research Corporation
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capped ALD films for doping fin-shaped channel regions of 3-D IC tr...
- Patent number 11,011,379
- Issue date May 18, 2021
- Lam Research Corporation
- Reza Arghavani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of encapsulation
- Patent number 10,763,107
- Issue date Sep 1, 2020
- Lam Research Corporation
- Bart J. van Schravendijk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of encapsulation
- Patent number 10,566,186
- Issue date Feb 18, 2020
- Lam Research Corporation
- Bart J. van Schravendijk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capped ALD films for doping fin-shaped channel regions of 3-D IC tr...
- Patent number 10,559,468
- Issue date Feb 11, 2020
- Lam Research Corporation
- Reza Arghavani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of encapsulation
- Patent number 10,157,736
- Issue date Dec 18, 2018
- Lam Research Corporation
- Bart J. van Schravendijk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capped ALD films for doping fin-shaped channel regions of 3-D IC tr...
- Patent number 9,997,357
- Issue date Jun 12, 2018
- Lam Research Corporation
- Reza Arghavani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sacrificial pre-metal dielectric for self-aligned contact scheme
- Patent number 9,379,210
- Issue date Jun 28, 2016
- Lam Research Corporation
- Thomas Weller Mountsier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High growth rate process for conformal aluminum nitride
- Patent number 9,214,334
- Issue date Dec 15, 2015
- Lam Research Corporation
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sacrificial pre-metal dielectric for self-aligned contact scheme
- Patent number 9,190,489
- Issue date Nov 17, 2015
- Lam Research Corporation
- Thomas Weller Mountsier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hardmask materials
- Patent number 8,846,525
- Issue date Sep 30, 2014
- Novellus Systems, Inc.
- Vishwanathan Rangarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hardmask materials
- Patent number 8,536,073
- Issue date Sep 17, 2013
- Novellus Systems, Inc.
- Vishwanathan Rangarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hardmask materials
- Patent number 8,247,332
- Issue date Aug 21, 2012
- Novellus Systems, Inc.
- Vishwanathan Rangarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Interfacial layers for electromigration resistance improvement in d...
- Patent number 7,858,510
- Issue date Dec 28, 2010
- Novellus Systems, Inc.
- Ananda Banerji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Interfacial layers for electromigration resistance improvement in d...
- Patent number 7,799,671
- Issue date Sep 21, 2010
- Novellus Systems, Inc.
- Ananda Banerji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Interfacial layers for electromigration resistance improvement in d...
- Patent number 7,648,899
- Issue date Jan 19, 2010
- Novellus Systems, Inc.
- Ananda Banerji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...
- Publication number 20240387258
- Publication date Nov 21, 2024
- LAM RESEARCH CORPORATION
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH MODULUS BORON-BASED CERAMICS FOR SEMICONDUCTOR APPLICATIONS
- Publication number 20230112746
- Publication date Apr 13, 2023
- LAM RESEARCH CORPORATION
- Ananda K. BANERJI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...
- Publication number 20220051938
- Publication date Feb 17, 2022
- LAM RESEARCH CORPORATION
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF ENCAPSULATION
- Publication number 20200152452
- Publication date May 14, 2020
- LAM RESEARCH CORPORATION
- Bart J. van Schravendijk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TR...
- Publication number 20190385850
- Publication date Dec 19, 2019
- LAM RESEARCH CORPORATION
- Reza Arghavani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF ENCAPSULATION
- Publication number 20190157078
- Publication date May 23, 2019
- Lam Research Corporation
- Bart J. van Schravendijk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TR...
- Publication number 20180269061
- Publication date Sep 20, 2018
- LAM RESEARCH CORPORATION
- Reza Arghavani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF ENCAPSULATION
- Publication number 20170323803
- Publication date Nov 9, 2017
- LAM RESEARCH CORPORATION
- Bart J. van Schravendijk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TR...
- Publication number 20160379826
- Publication date Dec 29, 2016
- LAM RESEARCH CORPORATION
- Reza Arghavani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SACRIFICIAL PRE-METAL DIELECTRIC FOR SELF-ALIGNED CONTACT SCHEME
- Publication number 20160071953
- Publication date Mar 10, 2016
- LAM RESEARCH CORPORATION
- Thomas Weller Mountsier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH GROWTH RATE PROCESS FOR CONFORMAL ALUMINUM NITRIDE
- Publication number 20160064211
- Publication date Mar 3, 2016
- LAM RESEARCH CORPORATION
- Shankar Swaminathan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TR...
- Publication number 20150249013
- Publication date Sep 3, 2015
- LAM RESEARCH CORPORATION
- Reza Arghavani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH GROWTH RATE PROCESS FOR CONFORMAL ALUMINUM NITRIDE
- Publication number 20150235835
- Publication date Aug 20, 2015
- LAM RESEARCH CORPORATION
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HARDMASK MATERIALS
- Publication number 20130330932
- Publication date Dec 12, 2013
- Novellus Systems, Inc.
- Vishwanathan Rangarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HARDMASK MATERIALS
- Publication number 20120276752
- Publication date Nov 1, 2012
- Vishwanathan Rangarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HARDMASK MATERIALS
- Publication number 20110135557
- Publication date Jun 9, 2011
- Vishwanathan Rangarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Ananda K. Banerji

Person

Patents Grantslast 30 patents

Film stack simplification for high aspect ratio patterning and vert...

Capped ALD films for doping fin-shaped channel regions of 3-D IC tr...

Methods of encapsulation

Methods of encapsulation

Capped ALD films for doping fin-shaped channel regions of 3-D IC tr...

Methods of encapsulation

Capped ALD films for doping fin-shaped channel regions of 3-D IC tr...

Sacrificial pre-metal dielectric for self-aligned contact scheme

High growth rate process for conformal aluminum nitride

Sacrificial pre-metal dielectric for self-aligned contact scheme

Hardmask materials

Hardmask materials

Hardmask materials

Interfacial layers for electromigration resistance improvement in d...

Interfacial layers for electromigration resistance improvement in d...

Interfacial layers for electromigration resistance improvement in d...

Patents Applicationslast 30 patents

FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...

HIGH MODULUS BORON-BASED CERAMICS FOR SEMICONDUCTOR APPLICATIONS

FILM STACK SIMPLIFICATION FOR HIGH ASPECT RATIO PATTERNING AND VERT...

METHODS OF ENCAPSULATION

CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TR...

METHODS OF ENCAPSULATION

CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TR...

METHODS OF ENCAPSULATION

CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TR...

SACRIFICIAL PRE-METAL DIELECTRIC FOR SELF-ALIGNED CONTACT SCHEME

HIGH GROWTH RATE PROCESS FOR CONFORMAL ALUMINUM NITRIDE

CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TR...

HIGH GROWTH RATE PROCESS FOR CONFORMAL ALUMINUM NITRIDE

HARDMASK MATERIALS

HARDMASK MATERIALS

HARDMASK MATERIALS