ANANTHA K. SUBRAMANI

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Symmetric plasma source to generate pie-shaped treatment
- Patent number 12,142,458
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Single process volume to perform high-pressure and low-pressure pro...
- Patent number 12,012,652
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Kelvin Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isolation valve
- Patent number 11,982,359
- Issue date May 14, 2024
- Applied Materials, Inc.
- Benjamin Riordon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isolation valve
- Patent number 11,953,097
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Benjamin Riordon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hot showerhead
- Patent number 11,946,140
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Internally divisible process chamber using a shutter disk assembly
- Patent number 11,830,710
- Issue date Nov 28, 2023
- Applied Materials, Inc.
- John Joseph Mazzocco
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma source for spatial plasma enhanced atomic layer de...
- Patent number 11,823,871
- Issue date Nov 21, 2023
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
UHV in-situ cryo-cool chamber
- Patent number 11,802,340
- Issue date Oct 31, 2023
- Applied Materials, Inc.
- Bharath Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition system with multi-cathode and method of manufacture thereof
- Patent number 11,600,476
- Issue date Mar 7, 2023
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxygen controlled PVD ALN buffer for GAN-based optoelectronic and e...
- Patent number 11,575,071
- Issue date Feb 7, 2023
- Applied Materials, Inc.
- Mingwei Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resonant process monitor
- Patent number 11,551,905
- Issue date Jan 10, 2023
- Intel Corporation
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internally divisible process chamber using a shutter disk assembly
- Patent number 11,545,347
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- John Joseph Mazzocco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple sequential linear powder dispensers for additive manufactu...
- Patent number 11,446,740
- Issue date Sep 20, 2022
- Applied Materials, Inc.
- Christopher A. Rowland
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Fabricating a recursive flow gas distribution stack using multiple...
- Patent number 11,371,148
- Issue date Jun 28, 2022
- Applied Materials, Inc.
- Sumit Agarwal
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Seamless electrical conduit
- Patent number 11,368,003
- Issue date Jun 21, 2022
- Applied Materials, Inc.
- Philip Allan Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF return path for reduction of parasitic plasma
- Patent number 11,335,543
- Issue date May 17, 2022
- Applied Materials, Inc.
- Anantha K. Subramani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source for rotating susceptor
- Patent number 11,315,769
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shaped electrodes for improved plasma exposure from vertical plasma...
- Patent number 11,315,763
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition (PVD) chamber with in situ chamber cleani...
- Patent number 11,289,312
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Adolph M. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Showerhead with interlaced gas feed and removal and methods of use
- Patent number 11,189,502
- Issue date Nov 30, 2021
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition system with multi-cathode and method of manufacture thereof
- Patent number 11,183,375
- Issue date Nov 23, 2021
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for producing low angle depositions
- Patent number 11,170,982
- Issue date Nov 9, 2021
- Applied Materials, Inc.
- Anantha K. Subramani
- B08 - CLEANING
Information Patent Grant
Methods and apparatus for co-sputtering multiple targets
- Patent number 11,101,117
- Issue date Aug 24, 2021
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and e...
- Patent number 11,081,623
- Issue date Aug 3, 2021
- Applied Materials, Inc.
- Mingwei Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit for multi-cathode processing chamber
- Patent number 11,043,364
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Hanbing Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PVD buffer layers for LED fabrication
- Patent number 11,011,676
- Issue date May 18, 2021
- Applied Materials, Inc.
- Mingwei Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for multi-cathode substrate processing
- Patent number 11,011,357
- Issue date May 18, 2021
- Applied Materials, Inc.
- Hanbing Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing tool having a monitoring device
- Patent number 10,957,565
- Issue date Mar 23, 2021
- Applied Materials, Inc.
- Shimin Mao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extension of PVD chamber with multiple reaction gases, high bias po...
- Patent number 10,927,449
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Jingjing Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source for rotating susceptor
- Patent number 10,903,056
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
BACKSIDE DEPOSITION FOR WAFER BOW MANAGEMENT
- Publication number 20240096605
- Publication date Mar 21, 2024
- Applied Materials, Inc.
- Arun Kumar Kotrappa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROTARY ELECTRICAL FEEDTHROUGH INTEGRATION FOR PROCESS CHAMBER
- Publication number 20240018646
- Publication date Jan 18, 2024
- Applied Materials, Inc.
- ANANTHA SUBRAMANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CHAMBER WITH GAS CROSS-FLOW, MICROWAVE RESONATORS AND A ROTA...
- Publication number 20230395356
- Publication date Dec 7, 2023
- Applied Materials, Inc.
- Anantha Subramani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THROTTLE VALVE AND FORELINE CLEANING USING A MICROWAVE SOURCE
- Publication number 20230390811
- Publication date Dec 7, 2023
- Applied Materials, Inc.
- Khokan Chandra Paul
- B08 - CLEANING
Information Patent Application
SHOWERHEAD ASSEMBLY WITH HEATED SHOWERHEAD
- Publication number 20230335377
- Publication date Oct 19, 2023
- Anantha K. SUBRAMANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIASABLE ROTATING PEDESTAL
- Publication number 20230282506
- Publication date Sep 7, 2023
- Applied Materials, Inc.
- Anantha Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERNALLY DIVISIBLE PROCESS CHAMBER USING A SHUTTER DISK ASSEMBLY
- Publication number 20220319822
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- John Joseph MAZZOCCO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HOT SHOWERHEAD
- Publication number 20220307131
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTORESIST DEPOSITION USING INDEPENDENT MULTICHANNEL SHOWERHEAD
- Publication number 20220155689
- Publication date May 19, 2022
- Applied Materials, Inc.
- Farzad Houshmand
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERNALLY DIVISIBLE PROCESS CHAMBER USING A SHUTTER DISK ASSEMBLY
- Publication number 20220139684
- Publication date May 5, 2022
- John Joseph MAZZOCCO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FABRICATING A RECURSIVE FLOW GAS DISTRIBUTION STACK USING MULTIPLE...
- Publication number 20220056584
- Publication date Feb 24, 2022
- Applied Materials, Inc.
- Sumit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS DESIGN FOR PHOTORESIST DEPOSITION
- Publication number 20220049350
- Publication date Feb 17, 2022
- Applied Materials, Inc.
- Farzad Houshmand
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Showerhead With Interlaced Gas Feed And Removal And Methods Of Use
- Publication number 20220051910
- Publication date Feb 17, 2022
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition System With Multi-Cathode And Method Of Manufacture Thereof
- Publication number 20220037136
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DISTRIBUTION COMPONENTS FOR SEMICONDUCTOR PROCESSING SYSTEMS
- Publication number 20220028710
- Publication date Jan 27, 2022
- Applied Materials, Inc.
- Anantha K. Subramani
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
CLEAN UNIT FOR CHAMBER EXHAUST CLEANING
- Publication number 20210391156
- Publication date Dec 16, 2021
- Applied Materials, Inc.
- Kelvin Chan
- B08 - CLEANING
Information Patent Application
OXYGEN CONTROLLED PVD ALN BUFFER FOR GAN-BASED OPTOELECTRONIC AND E...
- Publication number 20210328104
- Publication date Oct 21, 2021
- Applied Materials, Inc.
- Mingwei ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF RETURN PATH FOR REDUCTION OF PARASITIC PLASMA
- Publication number 20210305020
- Publication date Sep 30, 2021
- Applied Materials, Inc.
- Anantha K. Subramani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Symmetric Plasma Source to Generate Pie-Shaped Treatment
- Publication number 20210210312
- Publication date Jul 8, 2021
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Source For Rotating Susceptor
- Publication number 20210166923
- Publication date Jun 3, 2021
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...
- Publication number 20210050187
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Shaped Electrodes For Improved Plasma Exposure From Vertical Plasma...
- Publication number 20200395194
- Publication date Dec 17, 2020
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER WITH IN SITU CHAMBER CLEANI...
- Publication number 20200395198
- Publication date Dec 17, 2020
- Applied Materials, Inc.
- ADOLPH M. ALLEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF COMPONENTS WITH CHEMICALLY RESISTANT SURFACES
- Publication number 20200385866
- Publication date Dec 10, 2020
- Applied Materials, Inc.
- Swaminathan Srinivasan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEAMLESS ELECTRICAL CONDUIT
- Publication number 20200388998
- Publication date Dec 10, 2020
- Applied Materials, Inc.
- Philip Allan KRAUS
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
PROCESSING TOOL HAVING A MONITORING DEVICE
- Publication number 20200357669
- Publication date Nov 12, 2020
- Applied Materials, Inc.
- Shimin Mao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OXYGEN CONTROLLED PVD ALN BUFFER FOR GAN-BASED OPTOELECTRONIC AND E...
- Publication number 20200127164
- Publication date Apr 23, 2020
- Applied Materials, Inc.
- Mingwei ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLED REFLECTIVE ADAPTER PLATE FOR A DEPOSITION CHAMBER
- Publication number 20200098559
- Publication date Mar 26, 2020
- Applied Materials, Inc.
- Ashish GOEL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PRODUCING LOW ANGLE DEPOSITIONS
- Publication number 20200051794
- Publication date Feb 13, 2020
- ANANTHA K. SUBRAMANI
- B08 - CLEANING
Information Patent Application
METHODS AND APPARATUS FOR CO-SPUTTERING MULTIPLE TARGETS
- Publication number 20200013597
- Publication date Jan 9, 2020
- Applied Materials, Inc.
- Anantha K. SUBRAMANI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

ANANTHA K. SUBRAMANI

Person

Patents Grantslast 30 patents

Symmetric plasma source to generate pie-shaped treatment

Single process volume to perform high-pressure and low-pressure pro...

Isolation valve

Isolation valve

Hot showerhead

Internally divisible process chamber using a shutter disk assembly

Microwave plasma source for spatial plasma enhanced atomic layer de...

UHV in-situ cryo-cool chamber

Deposition system with multi-cathode and method of manufacture thereof

Oxygen controlled PVD ALN buffer for GAN-based optoelectronic and e...

Resonant process monitor

Internally divisible process chamber using a shutter disk assembly

Multiple sequential linear powder dispensers for additive manufactu...

Fabricating a recursive flow gas distribution stack using multiple...

Seamless electrical conduit

RF return path for reduction of parasitic plasma

Plasma source for rotating susceptor

Shaped electrodes for improved plasma exposure from vertical plasma...

Physical vapor deposition (PVD) chamber with in situ chamber cleani...

Showerhead with interlaced gas feed and removal and methods of use

Deposition system with multi-cathode and method of manufacture thereof

Methods and apparatus for producing low angle depositions

Methods and apparatus for co-sputtering multiple targets

Oxygen controlled PVD AlN buffer for GaN-based optoelectronic and e...

Process kit for multi-cathode processing chamber

PVD buffer layers for LED fabrication

Methods and apparatus for multi-cathode substrate processing

Processing tool having a monitoring device

Extension of PVD chamber with multiple reaction gases, high bias po...

Plasma source for rotating susceptor

Patents Applicationslast 30 patents

BACKSIDE DEPOSITION FOR WAFER BOW MANAGEMENT

ROTARY ELECTRICAL FEEDTHROUGH INTEGRATION FOR PROCESS CHAMBER

PLASMA CHAMBER WITH GAS CROSS-FLOW, MICROWAVE RESONATORS AND A ROTA...

THROTTLE VALVE AND FORELINE CLEANING USING A MICROWAVE SOURCE

SHOWERHEAD ASSEMBLY WITH HEATED SHOWERHEAD

BIASABLE ROTATING PEDESTAL

INTERNALLY DIVISIBLE PROCESS CHAMBER USING A SHUTTER DISK ASSEMBLY

HOT SHOWERHEAD

PHOTORESIST DEPOSITION USING INDEPENDENT MULTICHANNEL SHOWERHEAD

INTERNALLY DIVISIBLE PROCESS CHAMBER USING A SHUTTER DISK ASSEMBLY

FABRICATING A RECURSIVE FLOW GAS DISTRIBUTION STACK USING MULTIPLE...

APPARATUS DESIGN FOR PHOTORESIST DEPOSITION

Showerhead With Interlaced Gas Feed And Removal And Methods Of Use

Deposition System With Multi-Cathode And Method Of Manufacture Thereof

DISTRIBUTION COMPONENTS FOR SEMICONDUCTOR PROCESSING SYSTEMS

CLEAN UNIT FOR CHAMBER EXHAUST CLEANING

OXYGEN CONTROLLED PVD ALN BUFFER FOR GAN-BASED OPTOELECTRONIC AND E...

RF RETURN PATH FOR REDUCTION OF PARASITIC PLASMA

Symmetric Plasma Source to Generate Pie-Shaped Treatment

Plasma Source For Rotating Susceptor

Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...

Shaped Electrodes For Improved Plasma Exposure From Vertical Plasma...

PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER WITH IN SITU CHAMBER CLEANI...

RF COMPONENTS WITH CHEMICALLY RESISTANT SURFACES

SEAMLESS ELECTRICAL CONDUIT

PROCESSING TOOL HAVING A MONITORING DEVICE

OXYGEN CONTROLLED PVD ALN BUFFER FOR GAN-BASED OPTOELECTRONIC AND E...

COOLED REFLECTIVE ADAPTER PLATE FOR A DEPOSITION CHAMBER

METHODS AND APPARATUS FOR PRODUCING LOW ANGLE DEPOSITIONS

METHODS AND APPARATUS FOR CO-SPUTTERING MULTIPLE TARGETS