Anantha Sethuraman

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Predictive modeling of metrology in semiconductor processes
- Patent number 11,187,992
- Issue date Nov 30, 2021
- Applied Materials, Inc.
- Raman K. Nurani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Data management and mining to correlate wafer alignment, design, de...
- Patent number 11,088,039
- Issue date Aug 10, 2021
- Applied Materials, Inc.
- Raman K. Nurani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of predicting areas of vulnerable yield in a semiconductor s...
- Patent number 10,614,262
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- Raman K. Nurani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor process control method
- Patent number 10,579,041
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- Raman K. Nurani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Using design proximity index and effect-to-design proximity ratio t...
- Patent number 10,579,769
- Issue date Mar 3, 2020
- Applied Materials, Inc.
- Raman K. Nurani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Data analytics and computational analytics for semiconductor proces...
- Patent number 10,481,199
- Issue date Nov 19, 2019
- Applied Materials, Inc.
- Raman K. Nurani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and systems for monitoring a parameter of a measurement dev...
- Patent number 8,831,767
- Issue date Sep 9, 2014
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and systems for monitoring a parameter of a measurement dev...
- Patent number 8,010,222
- Issue date Aug 30, 2011
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and systems for monitoring a parameter of a measurement dev...
- Patent number 7,332,438
- Issue date Feb 19, 2008
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and systems for determining a characteristic of polishing w...
- Patent number 7,175,503
- Issue date Feb 13, 2007
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and systems for detecting a presence of blobs on a specimen...
- Patent number 7,052,369
- Issue date May 30, 2006
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and systems for monitoring a parameter of a measurement dev...
- Patent number 7,030,018
- Issue date Apr 18, 2006
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Methods and systems for generating a two-dimensional map of a chara...
- Patent number 6,935,922
- Issue date Aug 30, 2005
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Systems and methods for characterizing a polishing process
- Patent number 6,884,146
- Issue date Apr 26, 2005
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Windows configurable to be coupled to a process tool or to be dispo...
- Patent number 6,866,559
- Issue date Mar 15, 2005
- KLA Tencor Technologies
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and methods for detecting killer particles during chemica...
- Patent number 6,671,051
- Issue date Dec 30, 2003
- KLA Tencor
- Mehrdad Nikoonahad
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
DETERMINING SUBSTRATE CHARACTERISTICS BY VIRTUAL SUBSTRATE MEASUREMENT
- Publication number 20240152675
- Publication date May 9, 2024
- Applied Materials, Inc.
- Dheeraj Kumar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
GENERATION AND UTILIZATION OF VIRTUAL FEATURES FOR PROCESS MODELING
- Publication number 20240086597
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Sundar Narayanan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PIECEWISE FUNCTIONAL FITTING OF SUBSTRATE PROFILES FOR PROCESS LEAR...
- Publication number 20240054333
- Publication date Feb 15, 2024
- Applied Materials, Inc.
- Bharath Ram Sundar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
USING ELEMENTAL MAPS INFORMATION FROM X-RAY ENERGY-DISPERSIVE SPECT...
- Publication number 20230081446
- Publication date Mar 16, 2023
- Applied Materials, Inc.
- Sundararaman Narayanan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF PREDICTING AREAS OF VULNERABLE YIELD IN A SEMICONDUCTOR S...
- Publication number 20190171786
- Publication date Jun 6, 2019
- APPLIED MATERIALS, INC.
- Raman K. NURANI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR PROCESS CONTROL METHOD
- Publication number 20190171181
- Publication date Jun 6, 2019
- Applied Materials, Inc.
- Raman K. NURANI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
USING DESIGN PROXIMITY INDEX AND DEFECT-TO-DESIGN PROXIMITY RATIO T...
- Publication number 20190171787
- Publication date Jun 6, 2019
- Applied Materials, Inc.
- Raman K. NURANI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DATA ANALYTICS AND COMPUTATIONAL ANALYTICS FOR SEMICONDUCTOR PROCES...
- Publication number 20190170812
- Publication date Jun 6, 2019
- Applied Materials, Inc.
- Raman K. NURANI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DATA MANAGEMENT AND MINING TO CORRELATE WAFER ALIGNMENT, DESIGN, DE...
- Publication number 20190122944
- Publication date Apr 25, 2019
- Applied Materials, Inc.
- Raman K. NURANI
- G05 - CONTROLLING REGULATING
Information Patent Application
PREDICTIVE MODELING OF METROLOGY IN SEMICONDUCTOR PROCESSES
- Publication number 20190121237
- Publication date Apr 25, 2019
- Applied Materials, Inc.
- Raman K. NURANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR MONITORING A PARAMETER OF A MEASUREMENT DEV...
- Publication number 20110313558
- Publication date Dec 22, 2011
- KLA-Tencor Technologies Corporation
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Application
METHODS AND SYSTEMS FOR MONITORING A PARAMETER OF A MEASUREMENT DEV...
- Publication number 20080207089
- Publication date Aug 28, 2008
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Application
Methods and systems for detecting a presence of blobs on a specimen...
- Publication number 20060148383
- Publication date Jul 6, 2006
- KLA-Tencor Technologies.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Application
Methods and systems for monitoring a parameter of a measurement dev...
- Publication number 20060131273
- Publication date Jun 22, 2006
- KLA-Tencor Technologies Corp.
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Application
Methods and systems for detecting a presence of blobs on a specimen...
- Publication number 20030190864
- Publication date Oct 9, 2003
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Application
Methods and systems for determining a characteristic of polishing w...
- Publication number 20030181138
- Publication date Sep 25, 2003
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Application
Methods and systems for monitoring a parameter of a measurement dev...
- Publication number 20030180973
- Publication date Sep 25, 2003
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Application
Systems and methods for characterizing a polishing process
- Publication number 20030181131
- Publication date Sep 25, 2003
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Application
Methods and systems for generating a two-dimensional map of a chara...
- Publication number 20030181132
- Publication date Sep 25, 2003
- Kurt Lehman
- B24 - GRINDING POLISHING
Information Patent Application
Windows configurable to be coupled to a process tool or to be dispo...
- Publication number 20030181139
- Publication date Sep 25, 2003
- Kurt Lehman
- B24 - GRINDING POLISHING

Anantha Sethuraman

Person

Patents Grantslast 30 patents

Predictive modeling of metrology in semiconductor processes

Data management and mining to correlate wafer alignment, design, de...

Method of predicting areas of vulnerable yield in a semiconductor s...

Semiconductor process control method

Using design proximity index and effect-to-design proximity ratio t...

Data analytics and computational analytics for semiconductor proces...

Methods and systems for monitoring a parameter of a measurement dev...

Methods and systems for monitoring a parameter of a measurement dev...

Methods and systems for monitoring a parameter of a measurement dev...

Methods and systems for determining a characteristic of polishing w...

Methods and systems for detecting a presence of blobs on a specimen...

Methods and systems for monitoring a parameter of a measurement dev...

Methods and systems for generating a two-dimensional map of a chara...

Systems and methods for characterizing a polishing process

Windows configurable to be coupled to a process tool or to be dispo...

Apparatus and methods for detecting killer particles during chemica...

Patents Applicationslast 30 patents

DETERMINING SUBSTRATE CHARACTERISTICS BY VIRTUAL SUBSTRATE MEASUREMENT

GENERATION AND UTILIZATION OF VIRTUAL FEATURES FOR PROCESS MODELING

PIECEWISE FUNCTIONAL FITTING OF SUBSTRATE PROFILES FOR PROCESS LEAR...

USING ELEMENTAL MAPS INFORMATION FROM X-RAY ENERGY-DISPERSIVE SPECT...

METHOD OF PREDICTING AREAS OF VULNERABLE YIELD IN A SEMICONDUCTOR S...

SEMICONDUCTOR PROCESS CONTROL METHOD

USING DESIGN PROXIMITY INDEX AND DEFECT-TO-DESIGN PROXIMITY RATIO T...

DATA ANALYTICS AND COMPUTATIONAL ANALYTICS FOR SEMICONDUCTOR PROCES...

DATA MANAGEMENT AND MINING TO CORRELATE WAFER ALIGNMENT, DESIGN, DE...

PREDICTIVE MODELING OF METROLOGY IN SEMICONDUCTOR PROCESSES

METHODS AND SYSTEMS FOR MONITORING A PARAMETER OF A MEASUREMENT DEV...

METHODS AND SYSTEMS FOR MONITORING A PARAMETER OF A MEASUREMENT DEV...

Methods and systems for detecting a presence of blobs on a specimen...

Methods and systems for monitoring a parameter of a measurement dev...

Methods and systems for detecting a presence of blobs on a specimen...

Methods and systems for determining a characteristic of polishing w...

Methods and systems for monitoring a parameter of a measurement dev...

Systems and methods for characterizing a polishing process

Methods and systems for generating a two-dimensional map of a chara...

Windows configurable to be coupled to a process tool or to be dispo...