Andersen Chang

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Miaoli Hsien, TW

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Patents Grantslast 30 patents

Information Patent Grant
Method for planarizing barc layer in dual damascene process
- Patent number 6,680,252
- Issue date Jan 20, 2004
- United Microelectronics Corp.
- Anseime Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method for planarizing barc layer in dual damascene process
- Publication number 20020173152
- Publication date Nov 21, 2002
- Anseime Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photolithography process for producing gates and conductive lines
- Publication number 20020110765
- Publication date Aug 15, 2002
- United Microelectronics Corp.
- Chien-Wen Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photolithography process for forming an opening
- Publication number 20020106588
- Publication date Aug 8, 2002
- Chien-Wen Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Thermal reflow photolithographic process
- Publication number 20020076656
- Publication date Jun 20, 2002
- I-Hsiung Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY