Andre Poock

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Malschwitz, DE

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Patents Grantslast 30 patents

Information Patent Grant
Method and system for excursion monitoring in optical lithography p...
- Patent number 8,660,681
- Issue date Feb 25, 2014
- GLOBALFOUNDRIES Inc.
- Andre Poock
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of detecting repeating defects in lithography masks on the b...
- Patent number 7,887,978
- Issue date Feb 15, 2011
- GLOBALFOUNDRIES Inc.
- Uwe Griebenow
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Method and System for Excursion Monitoring in Optical Lithography P...
- Publication number 20120004758
- Publication date Jan 5, 2012
- GLOBALFOUNDRIES INC.
- Andre Poock
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-CORRECTING SUBSTRATE SUPPORT SYSTEM FOR FOCUS CONTROL IN EXPOS...
- Publication number 20100112468
- Publication date May 6, 2010
- Andre Poock
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETECTING REPEATING DEFECTS IN LITHOGRAPHY MASKS ON THE B...
- Publication number 20090274981
- Publication date Nov 5, 2009
- Uwe Griebenow
- G01 - MEASURING TESTING