Andreas Boettcher

Person

Nussloch, DE

People

Patents Grantslast 30 patents

Information Patent Grant
(Meth)acrylate copolymer based UV-crosslinkable materials
- Patent number 5,389,699
- Issue date Feb 14, 1995
- BASF Aktiengesellschaft
- Gerd Rehmer
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Aqueous polymer dispersions containing organic compounds having car...
- Patent number 5,314,936
- Issue date May 24, 1994
- BASF Aktiengesellschaft
- Manfred Schwartz
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
UV-crosslinkable copolymers
- Patent number 5,294,688
- Issue date Mar 15, 1994
- BASF Aktiengesellschaft
- Gerd Rehmer
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compounds containing carbonate groups and carbonyl groups and the p...
- Patent number 5,292,915
- Issue date Mar 8, 1994
- BASF Aktiengesellschaft
- Andreas Boettcher
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Benzophenone derivatives and their preparation
- Patent number 5,264,533
- Issue date Nov 23, 1993
- BASF Aktiengesellschaft
- Gerd Rehmer
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-senstive, ethylenically unsaturated, copolymerizable comp...
- Patent number 5,248,805
- Issue date Sep 28, 1993
- BASF Aktiengesellschaft
- Andreas Boettcher
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium salts and use thereof
- Patent number 5,220,037
- Issue date Jun 15, 1993
- BASF Aktiengesellschaft
- Reinhold Schwalm
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive, ethylenically unsaturated copolymerizable comp...
- Patent number 5,206,417
- Issue date Apr 27, 1993
- Andreas Boettcher
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salts having acid-labile groups
- Patent number 5,191,124
- Issue date Mar 2, 1993
- BASF Aktiengesellschaft
- Reinhold Schwalm
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Agents curable by ultraviolet radiation
- Patent number 5,180,756
- Issue date Jan 19, 1993
- BASF Aktiengesellschaft
- Gerd Rehmer
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Radiation-sensitive polymers
- Patent number 5,130,392
- Issue date Jul 14, 1992
- BASF Aktiengesellschaft
- Reinhold Schwalm
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive, ethylenically unsaturated, copolymerizable sul...
- Patent number 5,101,053
- Issue date Mar 31, 1992
- BASF Aktiengesellschaft
- Andreas Boettcher
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Copolymers crosslinkable by ultraviolet radiation in the atmosphere
- Patent number 5,073,611
- Issue date Dec 17, 1991
- BASF Aktiengesellschaft
- Gerd Rehmer
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive mixture containing acid labile groups and produ...
- Patent number 5,073,474
- Issue date Dec 17, 1991
- BASF Aktiengesellschaft
- Reinhold Schwalm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive mixture and production of relief patterns
- Patent number 5,069,998
- Issue date Dec 3, 1991
- BASF Aktiengesellschaft
- Reinhold Schwalm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
UV-crosslinkable materials based on isoamyl (meth)acrylate copolymers
- Patent number 5,026,806
- Issue date Jun 25, 1991
- BASF Aktiengesellschaft
- Gerd Rehmer
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Preparation of symmetric and asymmetric monoacetals of aromatic 1,2...
- Patent number 4,967,010
- Issue date Oct 30, 1990
- BASF Aktiengesellschaft
- Andreas Boettcher
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photopolymerizable recording materials containing a triazole sensit...
- Patent number 4,962,011
- Issue date Oct 9, 1990
- BASF Aktiengesellschaft
- Reinhard Aldag
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymerizable recording materials and photoresist layers and l...
- Patent number 4,940,649
- Issue date Jul 10, 1990
- BASF Aktiengesellschaft
- Reinhard Aldag
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
4-Quinazolone compounds
- Patent number 4,908,448
- Issue date Mar 13, 1990
- BASF Aktiengesellschaft
- Reinhard Aldag
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymerizable recording materials, photoresist layers and lith...
- Patent number 4,891,301
- Issue date Jan 2, 1990
- BASF Aktiengesellschaft
- Reinhard Aldag
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymerizable recording materials and photoresist layers and l...
- Patent number 4,886,735
- Issue date Dec 12, 1989
- BASF Aktiengesellschaft
- Andreas Boettcher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive mixture for photosensitive coating materials
- Patent number 4,883,740
- Issue date Nov 28, 1989
- BASF Aktiengesellschaft
- Reinhold Schwalm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymerizable recording material, in particular for the produc...
- Patent number 4,868,091
- Issue date Sep 19, 1989
- BASF Aktiengesellschaft
- Andreas Boettcher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Andreas Boettcher

Person

Patents Grantslast 30 patents

(Meth)acrylate copolymer based UV-crosslinkable materials

Aqueous polymer dispersions containing organic compounds having car...

UV-crosslinkable copolymers

Compounds containing carbonate groups and carbonyl groups and the p...

Benzophenone derivatives and their preparation

Radiation-senstive, ethylenically unsaturated, copolymerizable comp...

Sulfonium salts and use thereof

Radiation-sensitive, ethylenically unsaturated copolymerizable comp...

Sulfonium salts having acid-labile groups

Agents curable by ultraviolet radiation

Radiation-sensitive polymers

Radiation-sensitive, ethylenically unsaturated, copolymerizable sul...

Copolymers crosslinkable by ultraviolet radiation in the atmosphere

Radiation-sensitive mixture containing acid labile groups and produ...

Radiation sensitive mixture and production of relief patterns

UV-crosslinkable materials based on isoamyl (meth)acrylate copolymers

Preparation of symmetric and asymmetric monoacetals of aromatic 1,2...

Photopolymerizable recording materials containing a triazole sensit...

Photopolymerizable recording materials and photoresist layers and l...

4-Quinazolone compounds

Photopolymerizable recording materials, photoresist layers and lith...

Photopolymerizable recording materials and photoresist layers and l...

Radiation-sensitive mixture for photosensitive coating materials

Photopolymerizable recording material, in particular for the produc...