Andrei Mikhailovich Yakunin

Person

Mierlo, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Graphene spectral purity filter
- Patent number 10,481,510
- Issue date Nov 19, 2019
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Membranes for use within a lithographic apparatus and a lithographi...
- Patent number 10,228,615
- Issue date Mar 12, 2019
- ASML Netherlands B.V.
- Andrey Alexandrovich Nikipelov
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus
- Patent number 10,031,422
- Issue date Jul 24, 2018
- ASML Netherlands B.V.
- Andrey Nikipelov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, spectral purity filter and device manufactu...
- Patent number 10,001,709
- Issue date Jun 19, 2018
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for reticle and multilayer mirror
- Patent number 9,989,844
- Issue date Jun 5, 2018
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic system
- Patent number 9,989,863
- Issue date Jun 5, 2018
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for generating radiation
- Patent number 9,986,628
- Issue date May 29, 2018
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element comprising oriented carbon nanotube sheet and litho...
- Patent number 9,897,930
- Issue date Feb 20, 2018
- ASML Netherlands B.V.
- Leonid Aizikovitch Sjmaenok
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source
- Patent number 9,860,966
- Issue date Jan 2, 2018
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spectral purity filter
- Patent number 9,726,989
- Issue date Aug 8, 2017
- ASML Netherlands B.V.
- Wouter Anthon Soer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source
- Patent number 9,632,419
- Issue date Apr 25, 2017
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method of manufacturing a device
- Patent number 9,606,445
- Issue date Mar 28, 2017
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, spectral purity filter and device manufactu...
- Patent number 9,594,306
- Issue date Mar 14, 2017
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation source, lithographic apparatus, and device manufacturing...
- Patent number 9,529,283
- Issue date Dec 27, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pellicle for reticle and multilayer mirror
- Patent number 9,482,960
- Issue date Nov 1, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Source module of an EUV lithographic apparatus, lithographic appara...
- Patent number 9,465,306
- Issue date Oct 11, 2016
- ASML Netherlands B.V.
- Maarten Marinus Johannes Wilhelmus Van Herpen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multilayer mirror, method of producing a multilayer mirror and lith...
- Patent number 9,448,492
- Issue date Sep 20, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for generating radiation
- Patent number 9,442,380
- Issue date Sep 13, 2016
- ASML Netherlands B.V.
- Ramin Badie
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Source-collector device, lithographic apparatus, and device manufac...
- Patent number 9,411,238
- Issue date Aug 9, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithographic apparatus and method
- Patent number 9,395,630
- Issue date Jul 19, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Grazing incidence reflectors, lithographic apparatus, methods for m...
- Patent number 9,377,695
- Issue date Jun 28, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation source
- Patent number 9,366,967
- Issue date Jun 14, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multilayer mirror
- Patent number 9,329,503
- Issue date May 3, 2016
- ASML Netherlands B.V.
- Vadim Iourievich Timoshkov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation source apparatus, lithographic apparatus, method of gener...
- Patent number 9,298,110
- Issue date Mar 29, 2016
- ASML Netherlands B.V.
- Jens Arno Steinhoff
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Mirror, lithographic apparatus and device manufacturing method
- Patent number 9,285,690
- Issue date Mar 15, 2016
- ASML Netherlands B.V.
- Vadim Yevgenyevich Banine
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic patterning process and resists to use therein
- Patent number 9,261,784
- Issue date Feb 16, 2016
- ASML Netherlands B.V.
- Sander Frederik Wuister
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Spectral purity filter, lithographic apparatus, and method for manu...
- Patent number 9,195,152
- Issue date Nov 24, 2015
- ASML Netherlands B.V.
- Wouter Anthon Soer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multilayer mirror and lithographic apparatus
- Patent number 9,046,780
- Issue date Jun 2, 2015
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Spectral purity filter
- Patent number 9,007,565
- Issue date Apr 14, 2015
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- G02 - OPTICS
Information Patent Grant
Radiation source and lithographic apparatus
- Patent number 8,755,032
- Issue date Jun 17, 2014
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
PATTERNING DEVICE CONDITIONING SYSTEM AND METHOD
- Publication number 20240094647
- Publication date Mar 21, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR RETICLE AND MULTILAYER MIRROR
- Publication number 20180259846
- Publication date Sep 13, 2018
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Application
MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHI...
- Publication number 20170205704
- Publication date Jul 20, 2017
- ASML NETHERLANDS B.V.
- Andrey Alexandrovich NIKIPELOV
- G02 - OPTICS
Information Patent Application
Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...
- Publication number 20170160646
- Publication date Jun 8, 2017
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich BANINE
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC SYSTEM
- Publication number 20170052456
- Publication date Feb 23, 2017
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus VAN SCHOOT
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PELLICLE FOR RETICLE AND MULTILAYER MIRROR
- Publication number 20170017150
- Publication date Jan 19, 2017
- ASML Netherlands B.V.
- Andrei Mikhailovich YAKUNIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and Apparatus for Generating Radiation
- Publication number 20150296602
- Publication date Oct 15, 2015
- ASML NETHERLANDS B.V.
- Erik Roelof Loopstra
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithographic Apparatus
- Publication number 20150286145
- Publication date Oct 8, 2015
- ASML NETHERLANDS B.V.
- Andrey Nikipelov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method and Apparatus for Generating Radiation
- Publication number 20150268559
- Publication date Sep 24, 2015
- ASML NETHERLANDS B.V.
- Ramin Badie
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Lithographic Apparatus and Method of Manufacturing a Device
- Publication number 20150192861
- Publication date Jul 9, 2015
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION SOURCE
- Publication number 20150146182
- Publication date May 28, 2015
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus Van Schoot
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SOURCE-COLLECTOR DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFAC...
- Publication number 20140375974
- Publication date Dec 25, 2014
- Andrei Mikhailovich Yakunin
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
RADIATION SOURCE
- Publication number 20140368802
- Publication date Dec 18, 2014
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich Yakunin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHIC PATTERNING PROCESS AND RESISTS TO USE THEREIN
- Publication number 20140212819
- Publication date Jul 31, 2014
- ASML NETHERLANDS B.V.
- Sander Frederik Wuister
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MULTILAYER MIRROR, METHOD OF PRODUCING A MULTILAYER MIRROR AND LITH...
- Publication number 20140198306
- Publication date Jul 17, 2014
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Application
PELLICLE FOR RETICLE AND MULTILAYER MIRROR
- Publication number 20140160455
- Publication date Jun 12, 2014
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich YAKUNIN
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...
- Publication number 20140085619
- Publication date Mar 27, 2014
- ASML NETHERLANDS B.V.
- Vadim Yevgenyevich Banine
- B82 - NANO-TECHNOLOGY
Information Patent Application
Grazing Incidence Reflectors, Lithographic Apparatus, Methods for M...
- Publication number 20140078486
- Publication date Mar 20, 2014
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20130088699
- Publication date Apr 11, 2013
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHODS TO CONTROL EUV EXPOSURE DOSE AND EUV LITHOGRAPHIC METHODS A...
- Publication number 20130077073
- Publication date Mar 28, 2013
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus VAN SCHOOT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM FOR REMOVING CONTAMINANT PARTICLES, LITHOGRAPHIC APPARATUS,...
- Publication number 20130070218
- Publication date Mar 21, 2013
- ASML Netherland B.V.
- Vladimir Vitalevich Ivanov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multilayer Mirror
- Publication number 20130057840
- Publication date Mar 7, 2013
- ASML Netherland B.V.
- Vadim Iourievich Timoshkov
- B82 - NANO-TECHNOLOGY
Information Patent Application
SPECTRAL PURITY FILTER
- Publication number 20130038926
- Publication date Feb 14, 2013
- Wouter Anthon Soer
- G02 - OPTICS
Information Patent Application
EUV Radiation Source and EUV Radiation Generation Method
- Publication number 20130015373
- Publication date Jan 17, 2013
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHIC APPARATUS AND SPECTRAL PURITY FILTER
- Publication number 20130010275
- Publication date Jan 10, 2013
- ASML NETHERLANDS B.V.
- Viacheslav Medvedev
- B82 - NANO-TECHNOLOGY
Information Patent Application
Radiation Source, Lithographic Apparatus and Device Manufacturing M...
- Publication number 20120327381
- Publication date Dec 27, 2012
- ASML NETHERLANDS B.V.
- Dzmitry Labetski
- G02 - OPTICS
Information Patent Application
MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS
- Publication number 20120320354
- Publication date Dec 20, 2012
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich YAKUNIN
- B82 - NANO-TECHNOLOGY
Information Patent Application
SPECTRAL PURITY FILTER
- Publication number 20120307224
- Publication date Dec 6, 2012
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich Yakunin
- G02 - OPTICS
Information Patent Application
MULTILAYER MIRROR, LITHOGRAPIC APPARATUS, AND METHODS FOR MANUFACTU...
- Publication number 20120229785
- Publication date Sep 13, 2012
- ASML NETHERLANDS B.V.
- Vladimir Mihailovitch Krivtsun
- G02 - OPTICS
Information Patent Application
SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACT...
- Publication number 20120182537
- Publication date Jul 19, 2012
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich Yakunin
- G02 - OPTICS

Andrei Mikhailovich Yakunin

Person

Patents Grantslast 30 patents

Graphene spectral purity filter

Membranes for use within a lithographic apparatus and a lithographi...

Lithographic apparatus

Lithographic apparatus, spectral purity filter and device manufactu...

Pellicle for reticle and multilayer mirror

Lithographic system

Method and apparatus for generating radiation

Optical element comprising oriented carbon nanotube sheet and litho...

Radiation source

Spectral purity filter

Radiation source

Lithographic apparatus and method of manufacturing a device

Lithographic apparatus, spectral purity filter and device manufactu...

Radiation source, lithographic apparatus, and device manufacturing...

Pellicle for reticle and multilayer mirror

Source module of an EUV lithographic apparatus, lithographic appara...

Multilayer mirror, method of producing a multilayer mirror and lith...

Method and apparatus for generating radiation

Source-collector device, lithographic apparatus, and device manufac...

Lithographic apparatus and method

Grazing incidence reflectors, lithographic apparatus, methods for m...

Radiation source

Multilayer mirror

Radiation source apparatus, lithographic apparatus, method of gener...

Mirror, lithographic apparatus and device manufacturing method

Lithographic patterning process and resists to use therein

Spectral purity filter, lithographic apparatus, and method for manu...

Multilayer mirror and lithographic apparatus

Spectral purity filter

Radiation source and lithographic apparatus

Patents Applicationslast 30 patents

PATTERNING DEVICE CONDITIONING SYSTEM AND METHOD

PELLICLE FOR RETICLE AND MULTILAYER MIRROR

MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHI...

Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...

LITHOGRAPHIC SYSTEM

PELLICLE FOR RETICLE AND MULTILAYER MIRROR

Method and Apparatus for Generating Radiation

Lithographic Apparatus

Method and Apparatus for Generating Radiation

Lithographic Apparatus and Method of Manufacturing a Device

RADIATION SOURCE

SOURCE-COLLECTOR DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFAC...

RADIATION SOURCE

LITHOGRAPHIC PATTERNING PROCESS AND RESISTS TO USE THEREIN

MULTILAYER MIRROR, METHOD OF PRODUCING A MULTILAYER MIRROR AND LITH...

PELLICLE FOR RETICLE AND MULTILAYER MIRROR

Lithographic Apparatus, Spectral Purity Filter and Device Manufactu...

Grazing Incidence Reflectors, Lithographic Apparatus, Methods for M...

LITHOGRAPHIC APPARATUS AND METHOD

METHODS TO CONTROL EUV EXPOSURE DOSE AND EUV LITHOGRAPHIC METHODS A...

SYSTEM FOR REMOVING CONTAMINANT PARTICLES, LITHOGRAPHIC APPARATUS,...

Multilayer Mirror

SPECTRAL PURITY FILTER

EUV Radiation Source and EUV Radiation Generation Method

LITHOGRAPHIC APPARATUS AND SPECTRAL PURITY FILTER

Radiation Source, Lithographic Apparatus and Device Manufacturing M...

MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS

SPECTRAL PURITY FILTER

MULTILAYER MIRROR, LITHOGRAPIC APPARATUS, AND METHODS FOR MANUFACTU...

SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACT...