Andrei V. Shchegrov

Person

Campbell, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and systems for targeted monitoring of semiconductor measur...
- Patent number 12,019,030
- Issue date Jun 25, 2024
- KLA Corporation
- Antonio Arion Gellineau
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for combining x-ray metrology data sets to impr...
- Patent number 11,990,380
- Issue date May 21, 2024
- KLA Corporation
- Christopher Liman
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology tool equipped with modulated illumination sources
- Patent number 11,913,874
- Issue date Feb 27, 2024
- KLA Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Self-calibrating overlay metrology
- Patent number 11,880,142
- Issue date Jan 23, 2024
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bandgap measurements of patterned film stacks using spectroscopic m...
- Patent number 11,796,390
- Issue date Oct 24, 2023
- KLA Corporation
- Tianhan Wang
- G01 - MEASURING TESTING
Information Patent Grant
Measurement of overlay error using device inspection system
- Patent number 11,784,097
- Issue date Oct 10, 2023
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay metrology using spectroscopic phase
- Patent number 11,713,959
- Issue date Aug 1, 2023
- KLA Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for overlay measurement based on soft X-ray Sca...
- Patent number 11,698,251
- Issue date Jul 11, 2023
- KLA Corporation
- Andrei V. Shchegrov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-calibrated overlay metrology using a skew training sample
- Patent number 11,604,063
- Issue date Mar 14, 2023
- KLA Corporation
- Stilian Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Self-calibrating overlay metrology
- Patent number 11,604,420
- Issue date Mar 14, 2023
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Loosely-coupled inspection and metrology system for high-volume pro...
- Patent number 11,562,289
- Issue date Jan 24, 2023
- KLA Corporation
- Song Wu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods for combined reflectometry and photoelectron sp...
- Patent number 11,536,674
- Issue date Dec 27, 2022
- KLA Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Transmission small-angle X-ray scattering metrology system
- Patent number 11,519,719
- Issue date Dec 6, 2022
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Computationally efficient x-ray based overlay measurement
- Patent number 11,428,650
- Issue date Aug 30, 2022
- KLA Corporation
- John Hench
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Bandgap measurements of patterned film stacks using spectroscopic m...
- Patent number 11,378,451
- Issue date Jul 5, 2022
- KLA Corporation
- Tianhan Wang
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for semiconductor metrology based on polychroma...
- Patent number 11,333,621
- Issue date May 17, 2022
- KLA-Tencor Corporation
- Daniel Wack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pupil-plane beam scanning for metrology
- Patent number 11,300,524
- Issue date Apr 12, 2022
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology tool equipped with modulated illumination sources
- Patent number 10,969,328
- Issue date Apr 6, 2021
- KLA Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Measurement of overlay error using device inspection system
- Patent number 10,943,838
- Issue date Mar 9, 2021
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Differential methods and apparatus for metrology of semiconductor t...
- Patent number 10,935,893
- Issue date Mar 2, 2021
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for combined x-ray reflectometry and photoelect...
- Patent number 10,895,541
- Issue date Jan 19, 2021
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G02 - OPTICS
Information Patent Grant
Semiconductor metrology based on hyperspectral imaging
- Patent number 10,801,953
- Issue date Oct 13, 2020
- KLA-Tencor Corporation
- David Y. Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for co-located metrology
- Patent number 10,804,167
- Issue date Oct 13, 2020
- KLA-Tencor Corporation
- David Y. Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology tool with combined X-ray and optical scatterometers
- Patent number 10,801,975
- Issue date Oct 13, 2020
- KLA-Tencor Corporation
- Michael S. Bakeman
- G01 - MEASURING TESTING
Information Patent Grant
Transmission small-angle X-ray scattering metrology system
- Patent number 10,767,978
- Issue date Sep 8, 2020
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Integrated use of model-based metrology and a process model
- Patent number 10,769,320
- Issue date Sep 8, 2020
- KLA-Tencor Corporation
- Alexander Kuznetsov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process robust overlay metrology based on optical scatterometry
- Patent number 10,732,516
- Issue date Aug 4, 2020
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Hybrid metrology for patterned wafer characterization
- Patent number 10,712,145
- Issue date Jul 14, 2020
- KLA-Tencor Corporation
- Boxue Chen
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology with small illumination spot size
- Patent number 10,648,796
- Issue date May 12, 2020
- KLA-Tencor Corporation
- Noam Sapiens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of multiple patterning parameters
- Patent number 10,612,916
- Issue date Apr 7, 2020
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS
- Publication number 20230359129
- Publication date Nov 9, 2023
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods And Systems For Targeted Monitoring Of Semiconductor Measur...
- Publication number 20230228692
- Publication date Jul 20, 2023
- KLA Corporation
- Antonio Arion Gellineau
- G01 - MEASURING TESTING
Information Patent Application
SELF-CALIBRATING OVERLAY METROLOGY
- Publication number 20230221656
- Publication date Jul 13, 2023
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-CALIBRATED OVERLAY METROLOGY USING A SKEW TRAINING SAMPLE
- Publication number 20220412734
- Publication date Dec 29, 2022
- Stilian Pandev
- G01 - MEASURING TESTING
Information Patent Application
SELF-CALIBRATING OVERLAY METROLOGY
- Publication number 20220357673
- Publication date Nov 10, 2022
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Bandgap Measurements of Patterned Film Stacks Using Spectroscopic M...
- Publication number 20220349752
- Publication date Nov 3, 2022
- KLA Corporation
- Tianhan Wang
- G01 - MEASURING TESTING
Information Patent Application
OVERLAY METROLOGY USING SPECTROSCOPIC PHASE
- Publication number 20220299308
- Publication date Sep 22, 2022
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL METROLOGY TOOL EQUIPPED WITH MODULATED ILLUMINATION SOURCES
- Publication number 20210223166
- Publication date Jul 22, 2021
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Overlay Measurement Based On Soft X-Ray Sca...
- Publication number 20210207956
- Publication date Jul 8, 2021
- KLA Corporation
- Andrei V. Shchegrov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Measurement of Overlay Error Using Device Inspection System
- Publication number 20210159128
- Publication date May 27, 2021
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Transmission Small-Angle X-Ray Scattering Metrology System
- Publication number 20210088325
- Publication date Mar 25, 2021
- KLA Corporation
- Andrei V. Shchegrov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Systems And Methods For Combined Reflectometry And Photoelectron Sp...
- Publication number 20210055237
- Publication date Feb 25, 2021
- KLA Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Combining X-Ray Metrology Data Sets To Impr...
- Publication number 20200335406
- Publication date Oct 22, 2020
- KLA Corporation
- Christopher Liman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods And Systems For Co-Located Metrology
- Publication number 20200243400
- Publication date Jul 30, 2020
- KLA-Tencor Corporation
- David Y. Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Semiconductor Metrology Based On Hyperspectral Imaging
- Publication number 20200225151
- Publication date Jul 16, 2020
- KLA-Tencor Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Application
Loosely-Coupled Inspection and Metrology System for High-Volume Pro...
- Publication number 20200184372
- Publication date Jun 11, 2020
- KLA-Tencor Corporation
- Song Wu
- G01 - MEASURING TESTING
Information Patent Application
Computationally Efficient X-ray Based Overlay Measurement
- Publication number 20200116655
- Publication date Apr 16, 2020
- KLA Corporation
- John Hench
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM, METHOD AND COMPUTER PROGRAM PRODUCT FOR FAST AUTOMATIC DETE...
- Publication number 20200025554
- Publication date Jan 23, 2020
- KLA-Tencor Corporation
- Antonio A. Gellineau
- G01 - MEASURING TESTING
Information Patent Application
Metrology and Control of Overlay and Edge Placement Errors
- Publication number 20190271542
- Publication date Sep 5, 2019
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Measurement of Overlay Error Using Device Inspection System
- Publication number 20190252270
- Publication date Aug 15, 2019
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Systems And Methods For Combined X-Ray Reflectometry And Photoelect...
- Publication number 20190212281
- Publication date Jul 11, 2019
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Optical Metrology Tool Equipped with Modulated Illumination Sources
- Publication number 20190195782
- Publication date Jun 27, 2019
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Bandgap Measurements of Patterned Film Stacks Using Spectroscopic M...
- Publication number 20190041266
- Publication date Feb 7, 2019
- KLA-Tencor Corporation
- Tianhan Wang
- G01 - MEASURING TESTING
Information Patent Application
Overlay Metrology Using Multiple Parameter Configurations
- Publication number 20190041329
- Publication date Feb 7, 2019
- KLA-Tencor Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Semiconductor Metrology Based On Polychroma...
- Publication number 20190017946
- Publication date Jan 17, 2019
- KLA-Tencor Corporation
- Daniel Wack
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Transmission Small-Angle X-Ray Scattering Metrology System
- Publication number 20180299259
- Publication date Oct 18, 2018
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process Robust Overlay Metrology Based On Optical Scatterometry
- Publication number 20180252514
- Publication date Sep 6, 2018
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Optical Metrology With Small Illumination Spot Size
- Publication number 20180180406
- Publication date Jun 28, 2018
- KLA-Tencor Corporation
- Noam Sapiens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hybrid Metrology For Patterned Wafer Characterization
- Publication number 20180112968
- Publication date Apr 26, 2018
- KLA-Tencor Corporation
- Boxue Chen
- G01 - MEASURING TESTING
Information Patent Application
Metrology Systems And Methods For Process Control
- Publication number 20180108578
- Publication date Apr 19, 2018
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING

Andrei V. Shchegrov

Person

Patents Grantslast 30 patents

Methods and systems for targeted monitoring of semiconductor measur...

Methods and systems for combining x-ray metrology data sets to impr...

Optical metrology tool equipped with modulated illumination sources

Self-calibrating overlay metrology

Bandgap measurements of patterned film stacks using spectroscopic m...

Measurement of overlay error using device inspection system

Overlay metrology using spectroscopic phase

Methods and systems for overlay measurement based on soft X-ray Sca...

Self-calibrated overlay metrology using a skew training sample

Self-calibrating overlay metrology

Loosely-coupled inspection and metrology system for high-volume pro...

Systems and methods for combined reflectometry and photoelectron sp...

Transmission small-angle X-ray scattering metrology system

Computationally efficient x-ray based overlay measurement

Bandgap measurements of patterned film stacks using spectroscopic m...

Methods and systems for semiconductor metrology based on polychroma...

Pupil-plane beam scanning for metrology

Optical metrology tool equipped with modulated illumination sources

Measurement of overlay error using device inspection system

Differential methods and apparatus for metrology of semiconductor t...

Systems and methods for combined x-ray reflectometry and photoelect...

Semiconductor metrology based on hyperspectral imaging

Methods and systems for co-located metrology

Metrology tool with combined X-ray and optical scatterometers

Transmission small-angle X-ray scattering metrology system

Integrated use of model-based metrology and a process model

Process robust overlay metrology based on optical scatterometry

Hybrid metrology for patterned wafer characterization

Optical metrology with small illumination spot size

Measurement of multiple patterning parameters

Patents Applicationslast 30 patents

MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS

Methods And Systems For Targeted Monitoring Of Semiconductor Measur...

SELF-CALIBRATING OVERLAY METROLOGY

SELF-CALIBRATED OVERLAY METROLOGY USING A SKEW TRAINING SAMPLE

SELF-CALIBRATING OVERLAY METROLOGY

Bandgap Measurements of Patterned Film Stacks Using Spectroscopic M...

OVERLAY METROLOGY USING SPECTROSCOPIC PHASE

OPTICAL METROLOGY TOOL EQUIPPED WITH MODULATED ILLUMINATION SOURCES

Methods And Systems For Overlay Measurement Based On Soft X-Ray Sca...

Measurement of Overlay Error Using Device Inspection System

Transmission Small-Angle X-Ray Scattering Metrology System

Systems And Methods For Combined Reflectometry And Photoelectron Sp...

Methods And Systems For Combining X-Ray Metrology Data Sets To Impr...

Methods And Systems For Co-Located Metrology

Semiconductor Metrology Based On Hyperspectral Imaging

Loosely-Coupled Inspection and Metrology System for High-Volume Pro...

Computationally Efficient X-ray Based Overlay Measurement

SYSTEM, METHOD AND COMPUTER PROGRAM PRODUCT FOR FAST AUTOMATIC DETE...

Metrology and Control of Overlay and Edge Placement Errors

Measurement of Overlay Error Using Device Inspection System

Systems And Methods For Combined X-Ray Reflectometry And Photoelect...

Optical Metrology Tool Equipped with Modulated Illumination Sources

Bandgap Measurements of Patterned Film Stacks Using Spectroscopic M...

Overlay Metrology Using Multiple Parameter Configurations

Methods And Systems For Semiconductor Metrology Based On Polychroma...

Transmission Small-Angle X-Ray Scattering Metrology System

Process Robust Overlay Metrology Based On Optical Scatterometry

Optical Metrology With Small Illumination Spot Size

Hybrid Metrology For Patterned Wafer Characterization

Metrology Systems And Methods For Process Control