Andrei Veldman

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optical metrology tool equipped with modulated illumination sources
- Patent number 11,913,874
- Issue date Feb 27, 2024
- KLA Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Full beam metrology for x-ray scatterometry systems
- Patent number 11,313,816
- Issue date Apr 26, 2022
- KLA Corporation
- Antonio Arion Gellineau
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Visualization of three-dimensional semiconductor structures
- Patent number 11,099,137
- Issue date Aug 24, 2021
- KLA Corporation
- Aaron J. Rosenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimizing computational efficiency by multiple truncation of spati...
- Patent number 11,086,288
- Issue date Aug 10, 2021
- KLA-Tencor Corporation
- Andrei Veldman
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for characterization of an x-ray beam with high...
- Patent number 11,073,487
- Issue date Jul 27, 2021
- KLA-Tencor Corporation
- Alexander Bykanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical metrology tool equipped with modulated illumination sources
- Patent number 10,969,328
- Issue date Apr 6, 2021
- KLA Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Visualization of three-dimensional semiconductor structures
- Patent number 10,794,839
- Issue date Oct 6, 2020
- KLA Corporation
- Aaron J. Rosenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Full beam metrology for X-ray scatterometry systems
- Patent number 10,775,323
- Issue date Sep 15, 2020
- KLA-Tencor Corporation
- Antonio Arion Gellineau
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Hybrid metrology for patterned wafer characterization
- Patent number 10,712,145
- Issue date Jul 14, 2020
- KLA-Tencor Corporation
- Boxue Chen
- G01 - MEASURING TESTING
Information Patent Grant
Phase revealing optical and X-ray semiconductor metrology
- Patent number 10,677,586
- Issue date Jun 9, 2020
- KLA-Tencor Corporation
- John Hench
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology tool equipped with modulated illumination sources
- Patent number 10,215,688
- Issue date Feb 26, 2019
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Optimizing computational efficiency by multiple truncation of spati...
- Patent number 10,185,303
- Issue date Jan 22, 2019
- KLA-Tencor Corporation
- Andrei Veldman
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for measuring semiconductor device overlay us...
- Patent number 9,885,962
- Issue date Feb 6, 2018
- KLA-Tencor Corporation
- Andrei Veldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computation efficiency by iterative spatial harmonics order truncation
- Patent number 9,523,800
- Issue date Dec 20, 2016
- KLA-Tencor Corporation
- Andrei Veldman
- G02 - OPTICS
Information Patent Grant
Optical metrology tool equipped with modulated illumination sources
- Patent number 9,400,246
- Issue date Jul 26, 2016
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system optimization for parameter tracking
- Patent number 9,255,877
- Issue date Feb 9, 2016
- KLA-Tencor Corporation
- Andrei Veldman
- G01 - MEASURING TESTING
Information Patent Grant
Measuring critical dimensions of a semiconductor structure
- Patent number 8,798,966
- Issue date Aug 5, 2014
- KLA-Tencor Corporation
- John Hench
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model-based metrology using tesselation-based discretization
- Patent number 8,760,649
- Issue date Jun 24, 2014
- KLA-Tencor Corporation
- Andrei Veldman
- G01 - MEASURING TESTING
Information Patent Grant
Method for optimizing the configuration of a scatterometry measurem...
- Patent number 7,826,072
- Issue date Nov 2, 2010
- KLA-Tencor Technologies Corporation
- Daniel C. Wack
- G01 - MEASURING TESTING
Information Patent Grant
Model-based measurement of semiconductor device features with feed...
- Patent number 7,716,003
- Issue date May 11, 2010
- KLA-Tencor Technologies Corporation
- Daniel C. Wack
- G01 - MEASURING TESTING
Information Patent Grant
Time-domain computation of scattering spectra for use in spectrosco...
- Patent number 7,480,047
- Issue date Jan 20, 2009
- KLA-Tencor Corporation
- Edward Ratner
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Full Beam Metrology For X-Ray Scatterometry Systems
- Publication number 20220268714
- Publication date Aug 25, 2022
- KLA Corporation
- Antonio Arion Gellineau
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Visualization of Three-Dimensional Semiconductor Structures
- Publication number 20200393386
- Publication date Dec 17, 2020
- KLA Corporation
- Aaron J. Rosenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Full Beam Metrology For X-Ray Scatterometry Systems
- Publication number 20200300790
- Publication date Sep 24, 2020
- KLA Corporation
- Antonio Arion Gellineau
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Visualization of Three-Dimensional Semiconductor Structures
- Publication number 20200271595
- Publication date Aug 27, 2020
- KLA-Tencor Corporation
- Aaron J. Rosenberg
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Phase Revealing Optical and X-Ray Semiconductor Metrology
- Publication number 20200080836
- Publication date Mar 12, 2020
- KLA-Tencor Corporation
- John Hench
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Optical Metrology Tool Equipped with Modulated Illumination Sources
- Publication number 20190195782
- Publication date Jun 27, 2019
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Optimizing Computational Efficiency By Multiple Truncation Of Spati...
- Publication number 20190129376
- Publication date May 2, 2019
- KLA-Tencor Corporation
- Andrei Veldman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods And Systems For Characterization Of An X-Ray Beam With High...
- Publication number 20180328868
- Publication date Nov 15, 2018
- KLA-Tencor Corporation
- Alexander Bykanov
- G01 - MEASURING TESTING
Information Patent Application
Hybrid Metrology For Patterned Wafer Characterization
- Publication number 20180112968
- Publication date Apr 26, 2018
- KLA-Tencor Corporation
- Boxue Chen
- G01 - MEASURING TESTING
Information Patent Application
Full Beam Metrology For X-Ray Scatterometry Systems
- Publication number 20180106735
- Publication date Apr 19, 2018
- KLA-Tencor Corporation
- Antonio Arion Gellineau
- G01 - MEASURING TESTING
Information Patent Application
Optical Metrology Tool Equipped with Modulated Illumination Sources
- Publication number 20170016815
- Publication date Jan 19, 2017
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Optimizing Computational Efficiency By Multiple Truncation Of Spati...
- Publication number 20160246285
- Publication date Aug 25, 2016
- KLA-Tencor Corporation
- Andrei Veldman
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND APPARATUS FOR MEASURING SEMICONDUCTOR DEVICE OVERLAY US...
- Publication number 20150117610
- Publication date Apr 30, 2015
- KLA-Tencor Corporation
- Andrei Veldman
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY SYSTEM OPTIMIZATION FOR PARAMETER TRACKING
- Publication number 20140347666
- Publication date Nov 27, 2014
- Andrei Veldman
- G01 - MEASURING TESTING
Information Patent Application
Optical Metrology Tool Equipped with Modulated Illumination Sources
- Publication number 20130169966
- Publication date Jul 4, 2013
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
COMPUTATION EFFICIENCY BY ITERATIVE SPATIAL HARMONICS ORDER TRUNCATION
- Publication number 20110288822
- Publication date Nov 24, 2011
- Andrei Veldman
- G02 - OPTICS

Andrei Veldman

Person

Patents Grantslast 30 patents

Optical metrology tool equipped with modulated illumination sources

Full beam metrology for x-ray scatterometry systems

Visualization of three-dimensional semiconductor structures

Optimizing computational efficiency by multiple truncation of spati...

Methods and systems for characterization of an x-ray beam with high...

Optical metrology tool equipped with modulated illumination sources

Visualization of three-dimensional semiconductor structures

Full beam metrology for X-ray scatterometry systems

Hybrid metrology for patterned wafer characterization

Phase revealing optical and X-ray semiconductor metrology

Optical metrology tool equipped with modulated illumination sources

Optimizing computational efficiency by multiple truncation of spati...

Methods and apparatus for measuring semiconductor device overlay us...

Computation efficiency by iterative spatial harmonics order truncation

Optical metrology tool equipped with modulated illumination sources

Metrology system optimization for parameter tracking

Measuring critical dimensions of a semiconductor structure

Model-based metrology using tesselation-based discretization

Method for optimizing the configuration of a scatterometry measurem...

Model-based measurement of semiconductor device features with feed...

Time-domain computation of scattering spectra for use in spectrosco...

Patents Applicationslast 30 patents

Full Beam Metrology For X-Ray Scatterometry Systems

Visualization of Three-Dimensional Semiconductor Structures

Full Beam Metrology For X-Ray Scatterometry Systems

Visualization of Three-Dimensional Semiconductor Structures

Phase Revealing Optical and X-Ray Semiconductor Metrology

Optical Metrology Tool Equipped with Modulated Illumination Sources

Optimizing Computational Efficiency By Multiple Truncation Of Spati...

Methods And Systems For Characterization Of An X-Ray Beam With High...

Hybrid Metrology For Patterned Wafer Characterization

Full Beam Metrology For X-Ray Scatterometry Systems

Optical Metrology Tool Equipped with Modulated Illumination Sources

Optimizing Computational Efficiency By Multiple Truncation Of Spati...

METHODS AND APPARATUS FOR MEASURING SEMICONDUCTOR DEVICE OVERLAY US...

METROLOGY SYSTEM OPTIMIZATION FOR PARAMETER TRACKING

Optical Metrology Tool Equipped with Modulated Illumination Sources

COMPUTATION EFFICIENCY BY ITERATIVE SPATIAL HARMONICS ORDER TRUNCATION