Andrej S. Mitrovic

Person

Phoenix, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Time-resolved OES data collection
- Patent number 12,158,374
- Issue date Dec 3, 2024
- Tokyo Electron Limited
- Sergey Voronin
- G01 - MEASURING TESTING
Information Patent Grant
System and method for using first-principles simulation to analyze...
- Patent number 8,296,687
- Issue date Oct 23, 2012
- Tokyo Electron Limited
- Eric J. Strang
- G05 - CONTROLLING REGULATING
Information Patent Grant
Gas cluster ion beam system with cleaning apparatus
- Patent number 8,173,980
- Issue date May 8, 2012
- TEL Epion Inc.
- Michael Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for using first-principles simulation to control...
- Patent number 8,073,667
- Issue date Dec 6, 2011
- Tokyo Electron Limited
- Eric J. Strang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for using first-principles simulation to provide...
- Patent number 8,050,900
- Issue date Nov 1, 2011
- Tokyo Electron Limited
- Andrej S. Mitrovic
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
System and method for using first-principles simulation to control...
- Patent number 8,036,869
- Issue date Oct 11, 2011
- Tokyo Electron Limited
- Eric J. Strang
- G05 - CONTROLLING REGULATING
Information Patent Grant
System and method for using first-principles simulation to facilita...
- Patent number 8,032,348
- Issue date Oct 4, 2011
- Tokyo Electron Limited
- Andrej S. Mitrovic
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for using first-principles simulation to characte...
- Patent number 8,014,991
- Issue date Sep 6, 2011
- Tokyo Electron Limited
- Andrej S. Mitrovic
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Chuck pedestal shield
- Patent number 7,789,963
- Issue date Sep 7, 2010
- Tokyo Electron Limited
- Andrej S. Mitrovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for use of optical system with a plasma proces...
- Patent number 7,591,923
- Issue date Sep 22, 2009
- Tokyo Electron Limited
- Andrej S Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for monitoring component consumption
- Patent number 7,353,141
- Issue date Apr 1, 2008
- Tokyo Electron Limited
- Andrej S. Mitrovic
- G01 - MEASURING TESTING
Information Patent Grant
Honeycomb optical window deposition shield and method for a plasma...
- Patent number 7,241,397
- Issue date Jul 10, 2007
- Tokyo Electron Limited
- Steven T. Fink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for monitoring component consumption
- Patent number 7,233,878
- Issue date Jun 19, 2007
- Tokyo Electron Limited
- Andrej S. Mitrovic
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for temperature control of a substrate
- Patent number 7,230,204
- Issue date Jun 12, 2007
- Tokyo Electron Limited
- Andrej Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for monitoring RF impedance to determine conditio...
- Patent number 7,208,067
- Issue date Apr 24, 2007
- Tokyo Electron Limited
- Andrej S Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma chamber wall segment temperature control
- Patent number 7,186,313
- Issue date Mar 6, 2007
- Tokyo Electron Limited
- Andrej S Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improved plasma processing uniformity
- Patent number 7,164,236
- Issue date Jan 16, 2007
- Tokyo Electron Limited
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method of improving impedance matching between an RF...
- Patent number 7,109,788
- Issue date Sep 19, 2006
- Tokyo Electron Limited
- Jovan Jevtic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and structure for controlling electrode temperature
- Patent number 7,075,031
- Issue date Jul 11, 2006
- Tokyo Electron Limited
- Eric J. Strang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for determining clamping status of semiconduct...
- Patent number 7,073,383
- Issue date Jul 11, 2006
- Tokyo Electron Limited
- William Jones
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for determining chemistry of part's residual c...
- Patent number 7,020,583
- Issue date Mar 28, 2006
- Tokyo Electron Limited
- Paula Calabrese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for transferring heat from a substrate to a chuck
- Patent number 7,017,652
- Issue date Mar 28, 2006
- Tokyo Electron Limited
- Andrej J. Mitrovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for determining plasma impedance
- Patent number 7,015,414
- Issue date Mar 21, 2006
- Tokyo Electron Limited
- Andrej S. Mitrovic
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Low reflection microwave window
- Patent number 6,965,287
- Issue date Nov 15, 2005
- Tokyo Electron Limited
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlled method for segmented electrode apparatus and method for...
- Patent number 6,962,664
- Issue date Nov 8, 2005
- Tokyo Electron Limited
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for 2-d spatially resolved optical emission an...
- Patent number 6,958,484
- Issue date Oct 25, 2005
- Tokyo Electron Limited
- Andrej S. Mitrovic
- G01 - MEASURING TESTING
Information Patent Grant
Addition of power at selected harmonics of plasma processor drive f...
- Patent number 6,917,204
- Issue date Jul 12, 2005
- Tokyo Electron Limited
- Andrej S. Mitrovic
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Closed-drift hall effect plasma vacuum pump for process reactors
- Patent number 6,899,527
- Issue date May 31, 2005
- Tokyo Electron Limited
- Bill H Quon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Segmented electrode apparatus for plasma processing
- Patent number 6,863,020
- Issue date Mar 8, 2005
- Tokyo Electron Limited
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Linear inductive plasma pump for process reactors
- Patent number 6,824,363
- Issue date Nov 30, 2004
- Tokyo Electron Limited
- Andrej S. Mitrovic
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...

Patents Applicationslast 30 patents

Information Patent Application
HYBRID X-RAY AND OPTICAL METROLOGY AND NAVIGATION
- Publication number 20250060324
- Publication date Feb 20, 2025
- TOKYO ELECTRON LIMITED
- Francisco Machuca
- G01 - MEASURING TESTING
Information Patent Application
Time-Resolved OES Data Collection
- Publication number 20240230409
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- G01 - MEASURING TESTING
Information Patent Application
Time-Resolved OES Data Collection
- Publication number 20240133742
- Publication date Apr 25, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- G01 - MEASURING TESTING
Information Patent Application
GAS CLUSTER ION BEAM SYSTEM WITH CLEANING APPARATUS
- Publication number 20110272593
- Publication date Nov 10, 2011
- TEL Epion Inc.
- Michael Graf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR MONITORING COMPONENT CONSUMPTION
- Publication number 20070192059
- Publication date Aug 16, 2007
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- G01 - MEASURING TESTING
Information Patent Application
Plasma chamber wall segment temperature control
- Publication number 20070131650
- Publication date Jun 14, 2007
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma chamber wall segment temperature control
- Publication number 20070113976
- Publication date May 24, 2007
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma chamber wall segment temperature control
- Publication number 20070114206
- Publication date May 24, 2007
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- G05 - CONTROLLING REGULATING
Information Patent Application
Temperature control of plasma density probe
- Publication number 20070074812
- Publication date Apr 5, 2007
- Andrej Mitrovic
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Chuck pedestal shield
- Publication number 20060191484
- Publication date Aug 31, 2006
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and system for temperature control of a substrate
- Publication number 20060175305
- Publication date Aug 10, 2006
- TOKYO ELECTRON LIMITED
- Andrej Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system and method
- Publication number 20060060303
- Publication date Mar 23, 2006
- TOKYO ELECTRON LIMITED
- Steven T. Fink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Honeycomb optical window deposition shield and method for a plasma...
- Publication number 20050225248
- Publication date Oct 13, 2005
- TOKYO ELECTRON LIMITED
- Steven T. Fink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW REFLECTION MICROWAVE WINDOW
- Publication number 20050219015
- Publication date Oct 6, 2005
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system and method
- Publication number 20050189069
- Publication date Sep 1, 2005
- TOKYO ELECTRON LIMITED
- Audunn Ludviksson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for use of optical system with a plasma proces...
- Publication number 20050173375
- Publication date Aug 11, 2005
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for monitoring component consumption
- Publication number 20050171730
- Publication date Aug 4, 2005
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for determining chemistry of part's residual c...
- Publication number 20050171702
- Publication date Aug 4, 2005
- TOKYO ELECTRON LIMITED
- Paula Calabrese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of and apparatus for measuring and controlling substrate hol...
- Publication number 20050089077
- Publication date Apr 28, 2005
- TOKYO ELECTRON LIMITED
- William Jones
- G01 - MEASURING TESTING
Information Patent Application
System and method for using first-principles simulation to characte...
- Publication number 20050071036
- Publication date Mar 31, 2005
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method for using first-principles simulation to provide...
- Publication number 20050071039
- Publication date Mar 31, 2005
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method for using first-principles simulation to facilita...
- Publication number 20050071034
- Publication date Mar 31, 2005
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and apparatus for determining plasma impedance
- Publication number 20050067386
- Publication date Mar 31, 2005
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma chamber wall segment temperature control
- Publication number 20040211660
- Publication date Oct 28, 2004
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- G05 - CONTROLLING REGULATING
Information Patent Application
Method and system for monitoring RF impedance to determine conditio...
- Publication number 20040188021
- Publication date Sep 30, 2004
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for improved plasma processing uniformity
- Publication number 20040168770
- Publication date Sep 2, 2004
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor coil magnet
- Publication number 20040168771
- Publication date Sep 2, 2004
- TOKYO ELECTRON LIMITED
- Andrej S. Mitrovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Closed-drift hall effect plasma vacuum pump for process reactors
- Publication number 20040151595
- Publication date Aug 5, 2004
- TOKYO ELECTRON LIMITED
- Bill H. Quon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Apparatus and method for determining clamping status of semiconduct...
- Publication number 20040149041
- Publication date Aug 5, 2004
- William Jones
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method of improving impedance matching between an rf...
- Publication number 20040134614
- Publication date Jul 15, 2004
- Jovan Jevtic
- H01 - BASIC ELECTRIC ELEMENTS

Andrej S. Mitrovic

Person

Patents Grantslast 30 patents

Time-resolved OES data collection

System and method for using first-principles simulation to analyze...

Gas cluster ion beam system with cleaning apparatus

System and method for using first-principles simulation to control...

System and method for using first-principles simulation to provide...

System and method for using first-principles simulation to control...

System and method for using first-principles simulation to facilita...

System and method for using first-principles simulation to characte...

Chuck pedestal shield

Apparatus and method for use of optical system with a plasma proces...

Method and system for monitoring component consumption

Honeycomb optical window deposition shield and method for a plasma...

Method and system for monitoring component consumption

Method and system for temperature control of a substrate

Method and system for monitoring RF impedance to determine conditio...

Plasma chamber wall segment temperature control

Method and apparatus for improved plasma processing uniformity

Apparatus and method of improving impedance matching between an RF...

Method of and structure for controlling electrode temperature

Apparatus and method for determining clamping status of semiconduct...

Method and apparatus for determining chemistry of part's residual c...

Method and apparatus for transferring heat from a substrate to a chuck

Method and apparatus for determining plasma impedance

Low reflection microwave window

Controlled method for segmented electrode apparatus and method for...

Method and apparatus for 2-d spatially resolved optical emission an...

Addition of power at selected harmonics of plasma processor drive f...

Closed-drift hall effect plasma vacuum pump for process reactors

Segmented electrode apparatus for plasma processing

Linear inductive plasma pump for process reactors

Patents Applicationslast 30 patents

HYBRID X-RAY AND OPTICAL METROLOGY AND NAVIGATION

Time-Resolved OES Data Collection

Time-Resolved OES Data Collection

GAS CLUSTER ION BEAM SYSTEM WITH CLEANING APPARATUS

METHOD AND SYSTEM FOR MONITORING COMPONENT CONSUMPTION

Plasma chamber wall segment temperature control

Plasma chamber wall segment temperature control

Plasma chamber wall segment temperature control

Temperature control of plasma density probe

Chuck pedestal shield

Method and system for temperature control of a substrate

Plasma processing system and method

Honeycomb optical window deposition shield and method for a plasma...

LOW REFLECTION MICROWAVE WINDOW

Plasma processing system and method

Apparatus and method for use of optical system with a plasma proces...

Method and system for monitoring component consumption

Method and apparatus for determining chemistry of part's residual c...

Method of and apparatus for measuring and controlling substrate hol...

System and method for using first-principles simulation to characte...

System and method for using first-principles simulation to provide...

System and method for using first-principles simulation to facilita...

Method and apparatus for determining plasma impedance

Plasma chamber wall segment temperature control

Method and system for monitoring RF impedance to determine conditio...

Method and apparatus for improved plasma processing uniformity

Plasma reactor coil magnet

Closed-drift hall effect plasma vacuum pump for process reactors

Apparatus and method for determining clamping status of semiconduct...

Apparatus and method of improving impedance matching between an rf...