Andrew Grenville

Person

Eugene, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,235,578
- Issue date Feb 25, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,189,286
- Issue date Jan 7, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,958
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,960
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation based patterning methods
- Patent number 11,988,961
- Issue date May 21, 2024
- Inpria Corporation
- Jason K. Stowers
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,966,159
- Issue date Apr 23, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation based patterning methods
- Patent number 11,693,312
- Issue date Jul 4, 2023
- Inpria Corporation
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation based patterning methods
- Patent number 11,599,022
- Issue date Mar 7, 2023
- Inpria Corporation
- Jason K. Stowers
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation based patterning methods
- Patent number 11,392,031
- Issue date Jul 19, 2022
- Inpria Corporation
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pre-patterned lithography templates
- Patent number 11,347,145
- Issue date May 31, 2022
- Inpria Corporation
- Jason K. Stowers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation based patterning methods
- Patent number 10,782,610
- Issue date Sep 22, 2020
- Inpria Corporation
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pre-patterned lithography templates, processes based on radiation p...
- Patent number 10,649,328
- Issue date May 12, 2020
- Inpria Corporation
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 10,416,554
- Issue date Sep 17, 2019
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 10,025,179
- Issue date Jul 17, 2018
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterned inorganic layers, radiation based patterning compositions...
- Patent number 9,823,564
- Issue date Nov 21, 2017
- Inpria Corporation
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 9,310,684
- Issue date Apr 12, 2016
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution processible hardmasks for high resolution lithography
- Patent number 9,281,207
- Issue date Mar 8, 2016
- Inpria Corporation
- Jason K. Stowers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Patterned inorganic layers, radiation based patterning compositions...
- Patent number 9,176,377
- Issue date Nov 3, 2015
- Inpria Corporation
- Jason K. Stowers
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Patterned inorganic layers, radiation based patterning compositions...
- Patent number 8,415,000
- Issue date Apr 9, 2013
- Inpria Corporation
- Jason K. Stowers
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20250093773
- Publication date Mar 20, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION BASED PATTERNING METHODS
- Publication number 20250004365
- Publication date Jan 2, 2025
- INPRIA CORPORATION
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION BASED PATTERNING METHODS
- Publication number 20230305390
- Publication date Sep 28, 2023
- INPRIA CORPORATION
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20230004082
- Publication date Jan 5, 2023
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20230004083
- Publication date Jan 5, 2023
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20230004081
- Publication date Jan 5, 2023
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION BASED PATTERNING METHODS
- Publication number 20220413382
- Publication date Dec 29, 2022
- INPRIA CORPORATION
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20220365429
- Publication date Nov 17, 2022
- Inrpia Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION BASED PATTERNING METHODS
- Publication number 20220308447
- Publication date Sep 29, 2022
- INPRIA CORPORATION
- Jason K. Stowers
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RADIATION BASED PATTERNING METHODS
- Publication number 20200292937
- Publication date Sep 17, 2020
- INPRIA CORPORATION
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRE-PATTERNED LITHOGRAPHY TEMPLATES
- Publication number 20200225578
- Publication date Jul 16, 2020
- INPRIA CORPORATION
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20190369489
- Publication date Dec 5, 2019
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20180307137
- Publication date Oct 25, 2018
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION BASED PATTERNING METHODS
- Publication number 20180039172
- Publication date Feb 8, 2018
- INPRIA CORPORATION
- Jason K. Stowers
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PRE-PATTERNED LITHOGRAPHY TEMPLATES, PROCESSES BASED ON RADIATION P...
- Publication number 20170261850
- Publication date Sep 14, 2017
- INPRIA CORPORATION
- Jason K. Stowers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20160216606
- Publication date Jul 28, 2016
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNED INORGANIC LAYERS, RADIATION BASED PATTERNING COMPOSITIONS...
- Publication number 20160011505
- Publication date Jan 14, 2016
- Inpria Corporation
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20150056542
- Publication date Feb 26, 2015
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOLUTION PROCESSIBLE HARDMASKS FOR HIGH RESOLUTION LITHOGRAPHY
- Publication number 20120223418
- Publication date Sep 6, 2012
- Jason K. Stowers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PATTERENED INORGANIC LAYERS, RADIATION BASED PATTERNING COMPOSITION...
- Publication number 20120070613
- Publication date Mar 22, 2012
- Inpria Corporation
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNED INORGANIC LAYERS, RADIATION BASED PATTERNING COMPOSITIONS...
- Publication number 20110293888
- Publication date Dec 1, 2011
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Andrew Grenville

Person

Patents Grantslast 30 patents

Organometallic solution based high resolution patterning compositions

Organometallic solution based high resolution patterning compositions

Organometallic solution based high resolution patterning compositions

Organometallic solution based high resolution patterning compositions

Radiation based patterning methods

Organometallic solution based high resolution patterning compositions

Radiation based patterning methods

Radiation based patterning methods

Radiation based patterning methods

Pre-patterned lithography templates

Radiation based patterning methods

Pre-patterned lithography templates, processes based on radiation p...

Organometallic solution based high resolution patterning compositions

Organometallic solution based high resolution patterning compositions

Patterned inorganic layers, radiation based patterning compositions...

Organometallic solution based high resolution patterning compositions

Solution processible hardmasks for high resolution lithography

Patterned inorganic layers, radiation based patterning compositions...

Patterned inorganic layers, radiation based patterning compositions...

Patents Applicationslast 30 patents

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

RADIATION BASED PATTERNING METHODS

RADIATION BASED PATTERNING METHODS

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

RADIATION BASED PATTERNING METHODS

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

RADIATION BASED PATTERNING METHODS

RADIATION BASED PATTERNING METHODS

PRE-PATTERNED LITHOGRAPHY TEMPLATES

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

RADIATION BASED PATTERNING METHODS

PRE-PATTERNED LITHOGRAPHY TEMPLATES, PROCESSES BASED ON RADIATION P...

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

PATTERNED INORGANIC LAYERS, RADIATION BASED PATTERNING COMPOSITIONS...

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

SOLUTION PROCESSIBLE HARDMASKS FOR HIGH RESOLUTION LITHOGRAPHY

PATTERENED INORGANIC LAYERS, RADIATION BASED PATTERNING COMPOSITION...

PATTERNED INORGANIC LAYERS, RADIATION BASED PATTERNING COMPOSITIONS...