Andrew J. Blakeney

Person

Blasdell, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Hydroxy-amino thermally cured undercoat for 193 nm lithography
- Patent number 7,217,497
- Issue date May 15, 2007
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Thermally cured underlayer for lithographic application
- Patent number 6,924,339
- Issue date Aug 2, 2005
- Arch Specialty Chemicals, Inc.
- Binod B. De
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist compositions
- Patent number 6,911,297
- Issue date Jun 28, 2005
- Arch Specialty Chemicals, Inc.
- David Brzozowy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generators for use in photoresist compositions
- Patent number 6,855,476
- Issue date Feb 15, 2005
- Arch Specialty Chemicals, Inc.
- Lawrence Ferreira
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Hydroxy-amino thermally cured undercoat of 193 nm lithography
- Patent number 6,783,916
- Issue date Aug 31, 2004
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicon-containing acetal protected polymers and photoresists compo...
- Patent number 6,783,917
- Issue date Aug 31, 2004
- Arch Specialty Chemicals, Inc.
- Andrew J. Blakeney
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Thermally cured underlayer for lithographic application
- Patent number 6,610,808
- Issue date Aug 26, 2003
- Arch Specialty Chemicals, Inc.
- Binod B. De
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Radiation sensitive compositions containing image quality and profi...
- Patent number 6,514,664
- Issue date Feb 4, 2003
- Arch Specialty Chemicals, Inc.
- Medhat A. Touky
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Hydroxy-epoxide thermally cured undercoat for 193 NM lithography
- Patent number 6,492,092
- Issue date Dec 10, 2002
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Production of acetal derivatized hydroxyl aromatic polymers and the...
- Patent number 6,380,317
- Issue date Apr 30, 2002
- Arch Specialty Chemicals, Inc.
- Sanjay Malik
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hydroxy-amino thermally cured undercoat for 193 NM lithography
- Patent number 6,323,287
- Issue date Nov 27, 2001
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Production of acetal derivatized hydroxyl aromatic polymers and the...
- Patent number 6,309,793
- Issue date Oct 30, 2001
- Arch Specialty Chemicals, Inc.
- Sanjay Malik
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Production of acetal derivatized hydroxyl aromatic polymers and the...
- Patent number 6,159,653
- Issue date Dec 12, 2000
- Arch Specialty Chemicals, Inc.
- Sanjay Malik
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive terpolymer, photoresist compositions thereof an...
- Patent number 6,146,793
- Issue date Nov 14, 2000
- Arch Specialty Chemicals, Inc.
- Ulrich Schaedeli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive polybenzoxazole precursor compositions
- Patent number 6,143,467
- Issue date Nov 7, 2000
- Arch Specialty Chemicals, Inc.
- Steve Lien-Chung Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive diazonaphthoquinone esters based on selected cyclic...
- Patent number 6,140,026
- Issue date Oct 31, 2000
- Arch Specialty Chemicals, Inc.
- Andrew J. Blakeney
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Production of acetal derivatized hydroxyl aromatic polymers and the...
- Patent number 6,133,412
- Issue date Oct 17, 2000
- Arch Chemicals, Inc.
- Sanjay Malik
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hydroxy-diisocyanate thermally cured undercoat for 193 nm lithography
- Patent number 6,054,248
- Issue date Apr 25, 2000
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive diazonaphthoquinone esters based on selected cyclic...
- Patent number 6,040,107
- Issue date Mar 21, 2000
- Olin Microelectronic Chemicals, Inc.
- Andrew J. Blakeney
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for preparing a radiation-sensitive composition
- Patent number 6,027,853
- Issue date Feb 22, 2000
- Olin Microelectronic Chemicals, Inc.
- Sanjay Malik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selected high thermal novolaks and positive-working radiation-sensi...
- Patent number 5,985,507
- Issue date Nov 16, 1999
- Olin Microelectronic Chemicals, Inc.
- Andrew J. Blakeney
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for making polyimide-polyamic ester copolymers
- Patent number 5,834,581
- Issue date Nov 10, 1998
- Olin Microelectronic Chemicals, Inc.
- Ahmad Naiini
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemical imidization reagent for polyimide synthesis
- Patent number 5,789,524
- Issue date Aug 4, 1998
- Olin Microelectronic Chemicals, Inc.
- Steve L. C. Hsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for making polyimides from diamines and tetracarboxylic dia...
- Patent number 5,789,525
- Issue date Aug 4, 1998
- Olin Microelectronic Chemicals, Inc.
- Ahmad Naiini
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Selected O-quinonediazide sulfonic acid esters of phenolic compound...
- Patent number 5,602,260
- Issue date Feb 11, 1997
- OCG Microelectronic Materials, Inc.
- Andrew J. Blakeney
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
O-quinonediazide sulfonic acid esters of phenolic compounds and the...
- Patent number 5,547,814
- Issue date Aug 20, 1996
- OCG Microelectronic Materials, Inc.
- Andrew J. Blakeney
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Selected o-quinonediazide sulfonic acid esters of phenolic compound...
- Patent number 5,541,033
- Issue date Jul 30, 1996
- OCG Microelectronic Materials, Inc.
- Andrew J. Blakeney
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Selected block phenolic oligomers and their use in phenolic resin c...
- Patent number 5,302,688
- Issue date Apr 12, 1994
- OCG Microelectronic Materials, Inc.
- Alfred T. Jeffries
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process of developing an image-wise exposed resist-coated substrate
- Patent number 5,234,795
- Issue date Aug 10, 1993
- OCG Microelectronic Materials, Inc.
- Alfred T. Jeffries
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selected block copolymer novolak binder resins
- Patent number 5,235,022
- Issue date Aug 10, 1993
- OCG Microelectronic Materials, Inc.
- Alfred T. Jeffries
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Hydroxy-amino thermally cured undercoat for 193 NM lithography
- Publication number 20040219454
- Publication date Nov 4, 2004
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresist compositions
- Publication number 20040072095
- Publication date Apr 15, 2004
- Arch Speciality Chemical, Inc.
- David Brzozowy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Thermally cured underlayer for lithographic application
- Publication number 20030204035
- Publication date Oct 30, 2003
- Arch Specialty Chemicals Inc.
- Binod B. De
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Silicon-containing acetal protected polymers and photoresists compo...
- Publication number 20030065101
- Publication date Apr 3, 2003
- ARCH SPECIALITY CHEMICALS, INC.
- Andrew J. Blakeney
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Tertiary-butyl acrylate polymers and their use in photoresist compo...
- Publication number 20030022097
- Publication date Jan 30, 2003
- Arch Specialty Chemicals, Inc.
- Sanjay Malik
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoacid generators for use in photoresist compositions
- Publication number 20020197558
- Publication date Dec 26, 2002
- Arch Specialty Chemicals, Inc.
- Lawrence Ferreira
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Thermally cured underlayer for lithographic application
- Publication number 20020173594
- Publication date Nov 21, 2002
- Arch Specialty Chemicals, Inc.
- Binod B. De
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Hydroxy-amino thermally cured undercoat for 193 nm lithography
- Publication number 20020007018
- Publication date Jan 17, 2002
- Arch Specialty Chemicals, Inc.
- Patrick Foster
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

Andrew J. Blakeney

Person

Patents Grantslast 30 patents

Hydroxy-amino thermally cured undercoat for 193 nm lithography

Thermally cured underlayer for lithographic application

Photoresist compositions

Photoacid generators for use in photoresist compositions

Hydroxy-amino thermally cured undercoat of 193 nm lithography

Silicon-containing acetal protected polymers and photoresists compo...

Thermally cured underlayer for lithographic application

Radiation sensitive compositions containing image quality and profi...

Hydroxy-epoxide thermally cured undercoat for 193 NM lithography

Production of acetal derivatized hydroxyl aromatic polymers and the...

Hydroxy-amino thermally cured undercoat for 193 NM lithography

Production of acetal derivatized hydroxyl aromatic polymers and the...

Production of acetal derivatized hydroxyl aromatic polymers and the...

Radiation sensitive terpolymer, photoresist compositions thereof an...

Photosensitive polybenzoxazole precursor compositions

Photosensitive diazonaphthoquinone esters based on selected cyclic...

Production of acetal derivatized hydroxyl aromatic polymers and the...

Hydroxy-diisocyanate thermally cured undercoat for 193 nm lithography

Photosensitive diazonaphthoquinone esters based on selected cyclic...

Process for preparing a radiation-sensitive composition

Selected high thermal novolaks and positive-working radiation-sensi...

Process for making polyimide-polyamic ester copolymers

Chemical imidization reagent for polyimide synthesis

Process for making polyimides from diamines and tetracarboxylic dia...

Selected O-quinonediazide sulfonic acid esters of phenolic compound...

O-quinonediazide sulfonic acid esters of phenolic compounds and the...

Selected o-quinonediazide sulfonic acid esters of phenolic compound...

Selected block phenolic oligomers and their use in phenolic resin c...

Process of developing an image-wise exposed resist-coated substrate

Selected block copolymer novolak binder resins

Patents Applicationslast 30 patents

Hydroxy-amino thermally cured undercoat for 193 NM lithography

Photoresist compositions

Thermally cured underlayer for lithographic application

Silicon-containing acetal protected polymers and photoresists compo...

Tertiary-butyl acrylate polymers and their use in photoresist compo...

Photoacid generators for use in photoresist compositions

Thermally cured underlayer for lithographic application

Hydroxy-amino thermally cured undercoat for 193 nm lithography