Andrew J. McKerrow

Person

Lake Oswego, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Conformal damage-free encapsulation of chalcogenide materials
- Patent number 11,832,533
- Issue date Nov 28, 2023
- Lam Research Corporation
- James Samuel Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conformal damage-free encapsulation of chalcogenide materials
- Patent number 11,239,420
- Issue date Feb 1, 2022
- Lam Research Corporation
- James Samuel Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Suppressing interfacial reactions by varying the wafer temperature...
- Patent number 11,075,127
- Issue date Jul 27, 2021
- Lam Research Corporation
- Seshasayee Varadarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Configuration and method of operation of an electrodeposition syste...
- Patent number 10,745,817
- Issue date Aug 18, 2020
- Novellus Systems, Inc.
- Kousik Ganesan
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method for reducing the wet etch rate of a sin film without damagin...
- Patent number 10,454,029
- Issue date Oct 22, 2019
- Lam Research Corporation
- Andrew John McKerrow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Suppressing interfacial reactions by varying the wafer temperature...
- Patent number 10,347,547
- Issue date Jul 9, 2019
- Lam Research Corporation
- Seshasayee Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for depositing silicon oxide on metal layers
- Patent number 10,319,582
- Issue date Jun 11, 2019
- Lam Research Corporation
- Bhadri N. Varadarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Clean resistant windows for ultraviolet thermal processing
- Patent number 10,240,236
- Issue date Mar 26, 2019
- Lam Research Corporation
- James Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma activated conformal dielectric film deposition
- Patent number 10,043,655
- Issue date Aug 7, 2018
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing ALD films using halide-based precursors
- Patent number 10,020,188
- Issue date Jul 10, 2018
- Lam Research Corporation
- James S. Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing metals free ald silicon nitride films using h...
- Patent number 9,824,884
- Issue date Nov 21, 2017
- Lam Research Corporation
- James S. Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Configuration and method of operation of an electrodeposition syste...
- Patent number 9,816,193
- Issue date Nov 14, 2017
- Novellus Systems, Inc.
- Kousik Ganesan
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Plasma activated conformal dielectric film deposition
- Patent number 9,570,274
- Issue date Feb 14, 2017
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-k damage repair and pore sealing agents with photosensitive end...
- Patent number 9,502,255
- Issue date Nov 22, 2016
- Lam Research Corporation
- George Andrew Antonelli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma activated conformal dielectric film deposition
- Patent number 8,999,859
- Issue date Apr 7, 2015
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma activated conformal dielectric film deposition
- Patent number 8,637,411
- Issue date Jan 28, 2014
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SixNy AS A NUCLEATION LAYER FOR SiCxOy
- Publication number 20220235463
- Publication date Jul 28, 2022
- LAM RESEARCH CORPORATION
- Guangbi Yuan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL DAMAGE-FREE ENCAPSULATION OF CHALCOGENIDE MATERIALS
- Publication number 20220115592
- Publication date Apr 14, 2022
- LAM RESEARCH CORPORATION
- James Samuel Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF DEPOSITING SILICON NITRIDE FILMS
- Publication number 20210384028
- Publication date Dec 9, 2021
- LAM RESEARCH CORPORATION
- James S. SIMS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPRESSING INTERFACIAL REACTIONS BY VARYING THE WAFER TEMPERATURE...
- Publication number 20200066607
- Publication date Feb 27, 2020
- LAM RESEARCH CORPORATION
- Seshasayee Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL DAMAGE-FREE ENCAPSULATION OF CHALCOGENIDE MATERIALS
- Publication number 20200066987
- Publication date Feb 27, 2020
- LAM RESEARCH CORPORATION
- James Samuel Sims
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR DEPOSITING SILICON OXIDE ON METAL LAYERS
- Publication number 20180315597
- Publication date Nov 1, 2018
- LAM RESEARCH CORPORATION
- Bhadri N. Varadarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REDUCING THE WET ETCH RATE OF A SIN FILM WITHOUT DAMAGIN...
- Publication number 20180138405
- Publication date May 17, 2018
- LAM RESEARCH CORPORATION
- Andrew John McKerrow
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING ALD FILMS USING HALIDE-BASED PRECURSORS
- Publication number 20180102245
- Publication date Apr 12, 2018
- LAM RESEARCH CORPORATION
- James S. Sims
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUPPRESSING INTERFACIAL REACTIONS BY VARYING THE WAFER TEMPERATURE...
- Publication number 20180047645
- Publication date Feb 15, 2018
- LAM RESEARCH CORPORATION
- Seshasayee Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFIGURATION AND METHOD OF OPERATION OF AN ELECTRODEPOSITION SYSTE...
- Publication number 20180038007
- Publication date Feb 8, 2018
- Novellus Systems, Inc.
- Kousik Ganesan
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION
- Publication number 20170148628
- Publication date May 25, 2017
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEAN RESISTANT WINDOWS FOR ULTRAVIOLET THERMAL PROCESSING
- Publication number 20160258057
- Publication date Sep 8, 2016
- LAM RESEARCH CORPORATION
- James Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW-K DAMAGE REPAIR AND PORE SEALING AGENTS WITH PHOTOSENSITIVE END...
- Publication number 20160111288
- Publication date Apr 21, 2016
- LAM RESEARCH CORPORATION
- George Andrew Antonelli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION
- Publication number 20150206719
- Publication date Jul 23, 2015
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION
- Publication number 20140216337
- Publication date Aug 7, 2014
- Novellus Systems, Inc.
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFIGURATION AND METHOD OF OPERATION OF AN ELECTRODEPOSITION SYSTE...
- Publication number 20120175263
- Publication date Jul 12, 2012
- Kousik GANESAN
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION
- Publication number 20120028454
- Publication date Feb 2, 2012
- Shankar Swaminathan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Andrew J. McKerrow

Person

Patents Grantslast 30 patents

Conformal damage-free encapsulation of chalcogenide materials

Conformal damage-free encapsulation of chalcogenide materials

Suppressing interfacial reactions by varying the wafer temperature...

Configuration and method of operation of an electrodeposition syste...

Method for reducing the wet etch rate of a sin film without damagin...

Suppressing interfacial reactions by varying the wafer temperature...

Methods and apparatus for depositing silicon oxide on metal layers

Clean resistant windows for ultraviolet thermal processing

Plasma activated conformal dielectric film deposition

Method for depositing ALD films using halide-based precursors

Method for depositing metals free ald silicon nitride films using h...

Configuration and method of operation of an electrodeposition syste...

Plasma activated conformal dielectric film deposition

Low-k damage repair and pore sealing agents with photosensitive end...

Plasma activated conformal dielectric film deposition

Plasma activated conformal dielectric film deposition

Patents Applicationslast 30 patents

SixNy AS A NUCLEATION LAYER FOR SiCxOy

CONFORMAL DAMAGE-FREE ENCAPSULATION OF CHALCOGENIDE MATERIALS

METHOD OF DEPOSITING SILICON NITRIDE FILMS

SUPPRESSING INTERFACIAL REACTIONS BY VARYING THE WAFER TEMPERATURE...

CONFORMAL DAMAGE-FREE ENCAPSULATION OF CHALCOGENIDE MATERIALS

METHODS AND APPARATUS FOR DEPOSITING SILICON OXIDE ON METAL LAYERS

METHOD FOR REDUCING THE WET ETCH RATE OF A SIN FILM WITHOUT DAMAGIN...

METHOD FOR DEPOSITING ALD FILMS USING HALIDE-BASED PRECURSORS

SUPPRESSING INTERFACIAL REACTIONS BY VARYING THE WAFER TEMPERATURE...

CONFIGURATION AND METHOD OF OPERATION OF AN ELECTRODEPOSITION SYSTE...

PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION

CLEAN RESISTANT WINDOWS FOR ULTRAVIOLET THERMAL PROCESSING

LOW-K DAMAGE REPAIR AND PORE SEALING AGENTS WITH PHOTOSENSITIVE END...

PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION

PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION

CONFIGURATION AND METHOD OF OPERATION OF AN ELECTRODEPOSITION SYSTE...

PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION