Andrew Nolan

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Troy, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Method of plasma etching of silicon-containing organic film using s...
- Patent number 10,529,589
- Issue date Jan 7, 2020
- Tokyo Electron Limited
- Erdinc Karakas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of in situ hard mask removal
- Patent number 10,490,404
- Issue date Nov 26, 2019
- Tokyo Electron Limited
- Christopher Talone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective SiARC removal
- Patent number 10,115,591
- Issue date Oct 30, 2018
- Tokyo Electron Limited
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF PLASMA ETCHING OF SILICON-CONTAINING ORGANIC FILM USING S...
- Publication number 20180358233
- Publication date Dec 13, 2018
- TOKYO ELECTRON LIMITED
- Erdinc Karakas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective SiARC Removal
- Publication number 20180197730
- Publication date Jul 12, 2018
- TOKYO ELECTRON LIMITED
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF IN SITU HARD MASK REMOVAL
- Publication number 20180082842
- Publication date Mar 22, 2018
- TOKYO ELECTRON LIMITED
- Christopher Talone
- H01 - BASIC ELECTRIC ELEMENTS