Andrew Wank

Person

Avondale, PA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods of making chemical mechanical polishing layers having impro...
- Patent number 11,524,390
- Issue date Dec 13, 2022
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing layer analyzer and method
- Patent number 10,272,541
- Issue date Apr 30, 2019
- Rohm and Haas Electronic Matericals CMP Holdings, Inc.
- Scott Chang
- B24 - GRINDING POLISHING
Information Patent Grant
Method of making polishing layer for chemical mechanical polishing pad
- Patent number 10,144,115
- Issue date Dec 4, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Grant
Method of making polishing layer for chemical mechanical polishing pad
- Patent number 10,105,825
- Issue date Oct 23, 2018
- Rohm and Haas Electronics Materials CMP Holdings, Inc.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Grant
Method of making composite polishing layer for chemical mechanical...
- Patent number 10,092,998
- Issue date Oct 9, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Method of making composite polishing layer for chemical mechanical...
- Patent number 10,011,002
- Issue date Jul 3, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Controlled-porosity method for forming polishing pad
- Patent number 10,005,172
- Issue date Jun 26, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yuhua Tong
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Chemical mechanical polishing pad and method of making same
- Patent number 9,776,300
- Issue date Oct 3, 2017
- Rohm and Haas Electronic Materials CMP Holdings Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Method of manufacturing chemical mechanical polishing pads
- Patent number 9,770,808
- Issue date Sep 26, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Francis V. Acholla
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Chemical mechanical polishing pad, polishing layer analyzer and method
- Patent number 9,737,971
- Issue date Aug 22, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Francis V. Acholla
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad and method of making same
- Patent number 9,586,305
- Issue date Mar 7, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Controlled-expansion CMP PAD casting method
- Patent number 9,586,304
- Issue date Mar 7, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Alkaline-earth metal oxide-polymeric polishing pad
- Patent number 9,073,172
- Issue date Jul 7, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Hollow polymeric-alkaline earth metal oxide composite
- Patent number 8,894,732
- Issue date Nov 25, 2014
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Andrew R. Wank
- B24 - GRINDING POLISHING
Information Patent Grant
Forming alkaline-earth metal oxide polishing pad
- Patent number 8,888,877
- Issue date Nov 18, 2014
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Donna M. Alden
- B24 - GRINDING POLISHING
Information Patent Grant
Hollow polymeric-silicate composite
- Patent number 8,357,446
- Issue date Jan 22, 2013
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Andrew R. Wank
- B24 - GRINDING POLISHING
Information Patent Grant
Silicate composite polishing pad
- Patent number 8,257,152
- Issue date Sep 4, 2012
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Andrew R. Wank
- B24 - GRINDING POLISHING
Information Patent Grant
Method of forming silicate polishing pad
- Patent number 8,202,334
- Issue date Jun 19, 2012
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Donna M. Alden
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
MICRO-LAYER CMP POLISHING SUBPAD
- Publication number 20240181596
- Publication date Jun 6, 2024
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Guanhua Hou
- B24 - GRINDING POLISHING
Information Patent Application
DUAL-LAYER CMP POLISHING SUBPAD
- Publication number 20240181597
- Publication date Jun 6, 2024
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Guanhua Hou
- B24 - GRINDING POLISHING
Information Patent Application
METHODS OF MAKING CHEMICAL MECHANICAL POLISHING LAYERS HAVING IMPRO...
- Publication number 20180311792
- Publication date Nov 1, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING LAYER ANALYZER AND METHOD
- Publication number 20170209979
- Publication date Jul 27, 2017
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Scott Chang
- G01 - MEASURING TESTING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD, POLISHING LAYER ANALYZER AND METHOD
- Publication number 20170197290
- Publication date Jul 13, 2017
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Francis V. Acholla
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF MANUFACTURING CHEMICAL MECHANICAL POLISHING PADS
- Publication number 20170197295
- Publication date Jul 13, 2017
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Francis V. Acholla
- B26 - HAND CUTTING TOOLS CUTTING SEVERING
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
- Publication number 20160379840
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME
- Publication number 20160375543
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- G02 - OPTICS
Information Patent Application
CONTROLLED-POROSITY METHOD FOR FORMING POLISHING PAD
- Publication number 20160375550
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Yuhua Tong
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20160375553
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...
- Publication number 20160375552
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...
- Publication number 20160375554
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20160375555
- Publication date Dec 29, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- David Michael Veneziale
- B24 - GRINDING POLISHING
Information Patent Application
CONTROLLED-EXPANSION CMP PAD CASTING METHOD
- Publication number 20160176013
- Publication date Jun 23, 2016
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Bainian Qian
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Forming Alkaline-Earth Metal Oxide Polishing Pad
- Publication number 20130298472
- Publication date Nov 14, 2013
- Donna M. Alden
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Alkaline-Earth Metal Oxide-Polymeric Polishing Pad
- Publication number 20130303061
- Publication date Nov 14, 2013
- David B. James
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Hollow Polymeric-Alkaline Earth Metal Oxide Composite
- Publication number 20130298473
- Publication date Nov 14, 2013
- Andrew R. WANK
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Silicate Composite Polishing Pad
- Publication number 20120122381
- Publication date May 17, 2012
- Andrew R. Wank
- B24 - GRINDING POLISHING
Information Patent Application
METHOD OF FORMING SILICATE POLISHING PAD
- Publication number 20120117889
- Publication date May 17, 2012
- Donna M. Alden
- B24 - GRINDING POLISHING
Information Patent Application
Hollow Polymeric-Silicate Composite
- Publication number 20120117888
- Publication date May 17, 2012
- Andrew R. Wank
- B24 - GRINDING POLISHING

Andrew Wank

Person

Patents Grantslast 30 patents

Methods of making chemical mechanical polishing layers having impro...

Polishing layer analyzer and method

Method of making polishing layer for chemical mechanical polishing pad

Method of making polishing layer for chemical mechanical polishing pad

Method of making composite polishing layer for chemical mechanical...

Method of making composite polishing layer for chemical mechanical...

Controlled-porosity method for forming polishing pad

Chemical mechanical polishing pad and method of making same

Method of manufacturing chemical mechanical polishing pads

Chemical mechanical polishing pad, polishing layer analyzer and method

Chemical mechanical polishing pad and method of making same

Controlled-expansion CMP PAD casting method

Alkaline-earth metal oxide-polymeric polishing pad

Hollow polymeric-alkaline earth metal oxide composite

Forming alkaline-earth metal oxide polishing pad

Hollow polymeric-silicate composite

Silicate composite polishing pad

Method of forming silicate polishing pad

Patents Applicationslast 30 patents

MICRO-LAYER CMP POLISHING SUBPAD

DUAL-LAYER CMP POLISHING SUBPAD

METHODS OF MAKING CHEMICAL MECHANICAL POLISHING LAYERS HAVING IMPRO...

POLISHING LAYER ANALYZER AND METHOD

CHEMICAL MECHANICAL POLISHING PAD, POLISHING LAYER ANALYZER AND METHOD

METHOD OF MANUFACTURING CHEMICAL MECHANICAL POLISHING PADS

CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME

CHEMICAL MECHANICAL POLISHING PAD AND METHOD OF MAKING SAME

CONTROLLED-POROSITY METHOD FOR FORMING POLISHING PAD

METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD

METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...

METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL...

METHOD OF MAKING POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD

CONTROLLED-EXPANSION CMP PAD CASTING METHOD

Forming Alkaline-Earth Metal Oxide Polishing Pad

Alkaline-Earth Metal Oxide-Polymeric Polishing Pad

Hollow Polymeric-Alkaline Earth Metal Oxide Composite

Silicate Composite Polishing Pad

METHOD OF FORMING SILICATE POLISHING PAD

Hollow Polymeric-Silicate Composite