Andy Lok-Fung CHOW

Person

  • Tseung Kwan O, HK

Patents Grantslast 30 patents

  • Information Patent Grant

    Electroless copper plating compositions

    • Patent number 9,869,026
    • Issue date Jan 16, 2018
    • Rohm and Haas Electronic Materials LLC
    • David S. Laitar
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Electroless copper plating compositions

    • Patent number 9,702,046
    • Issue date Jul 11, 2017
    • Dow Global Technologies LLC
    • David S. Laitar
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Formaldehyde free electroless copper plating compositions and methods

    • Patent number 9,611,550
    • Issue date Apr 4, 2017
    • Rohm and Haas Electronic Materials LLC
    • Andy Lok-Fung Chow
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

  • Information Patent Application

    ELECTROLESS COPPER PLATING COMPOSITIONS

    • Publication number 20160122876
    • Publication date May 5, 2016
    • Rohm and Haas Electronic Materials L.L.C.
    • David S. LAITAR
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    ELECTROLESS COPPER PLATING COMPOSITIONS

    • Publication number 20160017498
    • Publication date Jan 21, 2016
    • Rohm and Haas Electronic Materials L.L.C.
    • David S. LAITAR
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    FORMALDEHYDE FREE ELECTROLESS COPPER PLATING COMPOSITIONS AND METHODS

    • Publication number 20140178572
    • Publication date Jun 26, 2014
    • Rohm and Haas Electronic Materials L.L.C.
    • Andy Lok-Fung CHOW
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...