Angus C. Fox III

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Process for manufacturing a DRAM capacitor having an annularly-groo...
- Patent number 5,763,286
- Issue date Jun 9, 1998
- Micron Semiconductor, Inc.
- Thomas A. Figura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sub-micron diffusion area isolation with Si-SEG for a DRAM array
- Patent number 5,600,161
- Issue date Feb 4, 1997
- Micron Technology, Inc.
- Fernando Gonzalez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating spacer support structures useful in flat pan...
- Patent number 5,492,234
- Issue date Feb 20, 1996
- Micron Technology, Inc.
- Angus C. Fox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sub-micron diffusion area isolation with SI-SEG for a DRAM array
- Patent number 5,453,396
- Issue date Sep 26, 1995
- Micron Technology, Inc.
- Fernando Gonzalez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improving planarity of chemical-mechanical...
- Patent number 5,232,875
- Issue date Aug 3, 1993
- Micron Technology, Inc.
- Mark E. Tuttle
- B24 - GRINDING POLISHING
Information Patent Grant
High-density electronic package comprising stacked sub-modules whic...
- Patent number 5,128,831
- Issue date Jul 7, 1992
- Micron Technology, Inc.
- Angus C. Fox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for creating an etch mask suitable for deep plasma etches e...
- Patent number 5,053,105
- Issue date Oct 1, 1991
- Micron Technology, Inc.
- Angus C. Fox
- H01 - BASIC ELECTRIC ELEMENTS

Angus C. Fox III

Person

Patents Grantslast 30 patents

Process for manufacturing a DRAM capacitor having an annularly-groo...

Sub-micron diffusion area isolation with Si-SEG for a DRAM array

Method for fabricating spacer support structures useful in flat pan...

Sub-micron diffusion area isolation with SI-SEG for a DRAM array

Method and apparatus for improving planarity of chemical-mechanical...

High-density electronic package comprising stacked sub-modules whic...

Process for creating an etch mask suitable for deep plasma etches e...