Anil K. Pant

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Fabrication of an ion exchange polish pad
- Patent number 6,905,526
- Issue date Jun 14, 2005
- Planar Labs Corporation
- Sanjay Dabral
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus to recondition an ion exchange polish pad
- Patent number 6,773,337
- Issue date Aug 10, 2004
- Planar Labs Corporation
- Sanjay Dabral
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for electrodialytic chemical mechanical polish...
- Patent number 6,722,950
- Issue date Apr 20, 2004
- Planar Labs Corporation
- Sanjay Dabral
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Integrated pad and belt for chemical mechanical polishing
- Patent number 6,656,025
- Issue date Dec 2, 2003
- Lam Research Corporation
- Anil K. Pant
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing head for chemical mechanical polishing using linear plana...
- Patent number 6,425,812
- Issue date Jul 30, 2002
- Lam Research Corporation
- Anil K. Pant
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for polishing semiconductor wafers
- Patent number 6,416,385
- Issue date Jul 9, 2002
- Lam Research Corporation
- Edward T. Ferri
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for polishing semiconductor wafers
- Patent number 6,336,845
- Issue date Jan 8, 2002
- Lam Research Corporation
- Erik H. Engdahl
- B24 - GRINDING POLISHING
Information Patent Grant
Integrated pad and belt for chemical mechanical polishing
- Patent number 6,328,642
- Issue date Dec 11, 2001
- Lam Research Corporation
- Anil K. Pant
- B24 - GRINDING POLISHING
Information Patent Grant
Use of zeta potential during chemical mechanical polishing for end...
- Patent number 6,325,706
- Issue date Dec 4, 2001
- Lam Research Corporation
- Wilbur C. Krusell
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for stabilizing the process temperature during...
- Patent number 6,224,461
- Issue date May 1, 2001
- Lam Research Corporation
- Robert G. Boehm
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and method for performing end point detection on a linear...
- Patent number 6,186,865
- Issue date Feb 13, 2001
- Lam Research Corporation
- Brian Thornton
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and method for film thickness measurement integrated into...
- Patent number 6,132,289
- Issue date Oct 17, 2000
- Lam Research Corporation
- Michael Labunsky
- B24 - GRINDING POLISHING
Information Patent Grant
Control of chemical-mechanical polishing rate across a substrate su...
- Patent number 5,916,012
- Issue date Jun 29, 1999
- Lam Research Corporation
- Anil K. Pant
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for aligning and tensioning a pad/belt used in...
- Patent number 5,871,390
- Issue date Feb 16, 1999
- Lam Research Corporation
- Anil K. Pant
- B24 - GRINDING POLISHING
Information Patent Grant
Control of chemical-mechanical polishing rate across a substrate su...
- Patent number 5,800,248
- Issue date Sep 1, 1998
- Ontrak Systems Inc.
- Anil K. Pant
- B24 - GRINDING POLISHING
Information Patent Grant
Sensors for a linear polisher
- Patent number 5,762,536
- Issue date Jun 9, 1998
- Lam Research Corporation
- Anil K. Pant
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
Integrated pad and belt for chemical mechanical polishing
- Publication number 20050118936
- Publication date Jun 2, 2005
- Lam Research Corporation
- Anil K. Pant
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical planarization method and apparatus for improved...
- Publication number 20040235398
- Publication date Nov 25, 2004
- Brian S. Thornton
- B24 - GRINDING POLISHING
Information Patent Application
System and method for creating and navigating a linear hypermedia r...
- Publication number 20020031988
- Publication date Mar 14, 2002
- Lam Research Corporation
- Anil K. Pant
- B24 - GRINDING POLISHING
Information Patent Application
Method and apparatus for polishing semiconductor wafers
- Publication number 20010036792
- Publication date Nov 1, 2001
- Lam Research Corporation
- Edward T. Ferri
- B24 - GRINDING POLISHING

Anil K. Pant

Person

Patents Grantslast 30 patents

Fabrication of an ion exchange polish pad

Method and apparatus to recondition an ion exchange polish pad

Method and apparatus for electrodialytic chemical mechanical polish...

Integrated pad and belt for chemical mechanical polishing

Polishing head for chemical mechanical polishing using linear plana...

Method and apparatus for polishing semiconductor wafers

Method and apparatus for polishing semiconductor wafers

Integrated pad and belt for chemical mechanical polishing

Use of zeta potential during chemical mechanical polishing for end...

Method and apparatus for stabilizing the process temperature during...

Apparatus and method for performing end point detection on a linear...

Apparatus and method for film thickness measurement integrated into...

Control of chemical-mechanical polishing rate across a substrate su...

Method and apparatus for aligning and tensioning a pad/belt used in...

Control of chemical-mechanical polishing rate across a substrate su...

Sensors for a linear polisher

Patents Applicationslast 30 patents

Integrated pad and belt for chemical mechanical polishing

Chemical mechanical planarization method and apparatus for improved...

System and method for creating and navigating a linear hypermedia r...

Method and apparatus for polishing semiconductor wafers