Anisul H. Khan

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Amorphous carbon multilayer coating with directional protection
- Patent number 11,437,230
- Issue date Sep 6, 2022
- Applied Materials, Inc.
- Wei Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of matching two or more plasma reactors
- Patent number 9,305,748
- Issue date Apr 5, 2016
- Applied Materials, Inc.
- Gaurav Saraf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming three dimensional NAND structures atop a substrate
- Patent number 9,236,255
- Issue date Jan 12, 2016
- Applied Materials, Inc.
- Sang Wook Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Predictive method of matching two plasma reactors
- Patent number 9,184,021
- Issue date Nov 10, 2015
- Applied Materials, Inc.
- Gaurav Saraf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to eliminate “M-shape” etch rate profile in inductively cou...
- Patent number 8,956,500
- Issue date Feb 17, 2015
- Applied Materials, Inc.
- Stephen Yuen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming three dimensional NAND structures atop a substrate
- Patent number 8,937,021
- Issue date Jan 20, 2015
- Applied Materials, Inc.
- Han Soo Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming a round bottom silicon trench recess for semico...
- Patent number 8,932,947
- Issue date Jan 13, 2015
- Applied Materials, Inc.
- Joo Won Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-film stack etching with polymer passivation of an overlying e...
- Patent number 8,747,684
- Issue date Jun 10, 2014
- Applied Materials, Inc.
- Sunil Srinivasan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support temperature control
- Patent number 8,596,336
- Issue date Dec 3, 2013
- Applied Materials, Inc.
- Richard Fovell
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Wet clean process for recovery of anodized chamber parts
- Patent number 8,231,736
- Issue date Jul 31, 2012
- Applied Materials, Inc.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shallow trench isolation etch process
- Patent number 8,133,817
- Issue date Mar 13, 2012
- Applied Materials, Inc.
- Hiroki Sasano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching multi-shaped openings in silicon
- Patent number 6,979,652
- Issue date Dec 27, 2005
- Applied Materials, Inc.
- Anisul Khan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming thermo-optic switches, routers and attenuators
- Patent number 6,954,561
- Issue date Oct 11, 2005
- Anisul Khan
- G02 - OPTICS
Information Patent Grant
Method of releasing devices from a substrate
- Patent number 6,905,616
- Issue date Jun 14, 2005
- Applied Materials, Inc.
- Ajay Kumar
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method for etching high-aspect-ratio features
- Patent number 6,897,155
- Issue date May 24, 2005
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of micromachining a multi-part cavity
- Patent number 6,827,869
- Issue date Dec 7, 2004
- Dragan Podlesnik
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Apparatus for performing self cleaning method of forming deep trenc...
- Patent number 6,802,933
- Issue date Oct 12, 2004
- Anisul Khan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching a trench in a silicon-on-insulator (SOI) structure
- Patent number 6,759,340
- Issue date Jul 6, 2004
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for in-situ etching a hardmask stack
- Patent number 6,696,365
- Issue date Feb 24, 2004
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for plasma etching silicon-germanium
- Patent number 6,642,151
- Issue date Nov 4, 2003
- Applied Materials, Inc.
- Anisul Khan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for dicing a semiconductor wafer
- Patent number 6,642,127
- Issue date Nov 4, 2003
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for etching conductors at high etch rates
- Patent number 6,593,244
- Issue date Jul 15, 2003
- Applied Materials Inc.
- Yiqiong Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching of silicon using fluorinated gas mixtures
- Patent number 6,583,063
- Issue date Jun 24, 2003
- Applied Materials, Inc.
- Anisul Khan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two etchant etch method
- Patent number 6,518,192
- Issue date Feb 11, 2003
- Applied Materials Inc.
- Anisul Khan
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Metal mask etching of silicon
- Patent number 6,491,835
- Issue date Dec 10, 2002
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High etch rate method for plasma etching silicon nitride
- Patent number 6,471,833
- Issue date Oct 29, 2002
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two etchant etch method
- Patent number 6,391,788
- Issue date May 21, 2002
- Applied Materials, Inc.
- Anisul Khan
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Silicon trench etch using silicon-containing precursors to reduce o...
- Patent number 6,380,095
- Issue date Apr 30, 2002
- Applied Materials, Inc.
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two etchant etch method
- Patent number 6,372,655
- Issue date Apr 16, 2002
- Applied Materials, Inc.
- Anisul Khan
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Self cleaning method of forming deep trenches in silicon substrates
- Patent number 6,318,384
- Issue date Nov 20, 2001
- Applied Materials, Inc.
- Anisul Khan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
AMORPHOUS CARBON MULTILAYER COATING WITH DIRECTIONAL PROTECTION
- Publication number 20210313166
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Wei Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT FOR SEMICONDUCTOR PROCESS CHAMBER HAVING SURFACE TREATMEN...
- Publication number 20160056059
- Publication date Feb 25, 2016
- Applied Materials, Inc.
- Jennifer SUN
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
METHOD OF MATCHING TWO OR MORE PLASMA REACTORS
- Publication number 20150096959
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- Gaurav Saraf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREDICTIVE METHOD OF MATCHING TWO PLASMA REACTORS
- Publication number 20150099314
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- Gaurav Saraf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A ROUND BOTTOM SILICON TRENCH RECESS FOR SEMICO...
- Publication number 20150031187
- Publication date Jan 29, 2015
- Applied Materials, Inc.
- Joo Won Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING THREE DIMENSIONAL NAND STRUCTURES ATOP A SUBSTRATE
- Publication number 20150004796
- Publication date Jan 1, 2015
- Applied Materials, Inc.
- SANG WOOK KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING THREE DIMENSIONAL NAND STRUCTURES ATOP A SUBSTRATE
- Publication number 20140377959
- Publication date Dec 25, 2014
- HAN SOO CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF ALIGNED DUAL PATTERNING TECHNIQUE ENHANCEMENT WITH MAGNETIC SH...
- Publication number 20140212994
- Publication date Jul 31, 2014
- Applied Materials, Inc.
- Hun Sang KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ETCHING SUBSTRATES USING PULSED DC VOLTAGE
- Publication number 20120088371
- Publication date Apr 12, 2012
- Applied Materials, Inc.
- ALOK RANJAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-FILM STACK ETCHING WITH POLYMER PASSIVATION OF AN OVERLYING E...
- Publication number 20110045672
- Publication date Feb 24, 2011
- Applied Materials, Inc.
- Sunil Srinivasan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FAST SUBSTRATE SUPPORT TEMPERATURE CONTROL
- Publication number 20090294101
- Publication date Dec 3, 2009
- Applied Materials, Inc.
- RICHARD FOVELL
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
SHALLOW TRENCH ISOLATION ETCH PROCESS
- Publication number 20090170333
- Publication date Jul 2, 2009
- APPLIED MATERIALS, INC.
- Hiroki Sasano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET CLEAN PROCESS FOR RECOVERY OF ANODIZED CHAMBER PARTS
- Publication number 20090056745
- Publication date Mar 5, 2009
- Applied Materials, Inc.
- JENNIFER Y. SUN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING AND PASSIVATING FOR HIGH ASPECT RATIO FEATURES
- Publication number 20080286978
- Publication date Nov 20, 2008
- Rong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO ELIMINATE "M-SHAPE" ETCH RATE PROFILE IN INDUCTIVELY COU...
- Publication number 20080264904
- Publication date Oct 30, 2008
- STEPHEN YUEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Encapsulation of post-etch halogenic residue
- Publication number 20060032833
- Publication date Feb 16, 2006
- APPLIED MATERIALS, INC.
- Mark Naoshi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming optical waveguides in a semiconductor substrate
- Publication number 20050211664
- Publication date Sep 29, 2005
- APPLIED MATERIALS, INC.
- Anisul Khan
- G02 - OPTICS
Information Patent Application
Method of releasing devices from a substrate
- Publication number 20040173575
- Publication date Sep 9, 2004
- Ajay Kumar
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Method for laterally etching a semiconductor structure
- Publication number 20040077178
- Publication date Apr 22, 2004
- APPLIED MATERIALS, INC.
- Chan-Syun Yang
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Method for etching high-aspect-ratio features
- Publication number 20040033697
- Publication date Feb 19, 2004
- APPLIED MATERIALS, INC.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a capacitor using a high K dielectric material
- Publication number 20030222296
- Publication date Dec 4, 2003
- APPLIED MATERIALS, INC.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching a trench in a silicon-on-insulator (SOI) structure
- Publication number 20030211753
- Publication date Nov 13, 2003
- Padmapani C. Nallan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching multi-shaped openings in silicon
- Publication number 20030189024
- Publication date Oct 9, 2003
- Applied Materials Inc.
- Anisul Khan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR PLASMA ETCHING SILICON-GERMANIUM
- Publication number 20030176075
- Publication date Sep 18, 2003
- APPLIED MATERIALS, INC.
- Anisul Khan
- G02 - OPTICS
Information Patent Application
Process for in-situ etching a hardmask stack
- Publication number 20030129840
- Publication date Jul 10, 2003
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for dicing a semiconductor wafer
- Publication number 20030077878
- Publication date Apr 24, 2003
- APPLIED MATERIALS, INC.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for increasing capacitance in stacked and trench capacitors
- Publication number 20030052088
- Publication date Mar 20, 2003
- Anisul Khan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming optical waveguides in a semiconductor substrate
- Publication number 20030052082
- Publication date Mar 20, 2003
- Anisul Khan
- G02 - OPTICS
Information Patent Application
Method of eliminating notching when anisotropically etching small l...
- Publication number 20030003748
- Publication date Jan 2, 2003
- Anisul Khan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of micromachining a multi-part cavity
- Publication number 20020185469
- Publication date Dec 12, 2002
- Applied Materials, Inc.
- Dragan Podlesnik
- B81 - MICRO-STRUCTURAL TECHNOLOGY

Anisul H. Khan

Person

Patents Grantslast 30 patents

Amorphous carbon multilayer coating with directional protection

Method of matching two or more plasma reactors

Methods for forming three dimensional NAND structures atop a substrate

Predictive method of matching two plasma reactors

Methods to eliminate “M-shape” etch rate profile in inductively cou...

Methods for forming three dimensional NAND structures atop a substrate

Methods for forming a round bottom silicon trench recess for semico...

Multi-film stack etching with polymer passivation of an overlying e...

Substrate support temperature control

Wet clean process for recovery of anodized chamber parts

Shallow trench isolation etch process

Etching multi-shaped openings in silicon

Methods for forming thermo-optic switches, routers and attenuators

Method of releasing devices from a substrate

Method for etching high-aspect-ratio features

Method of micromachining a multi-part cavity

Apparatus for performing self cleaning method of forming deep trenc...

Method of etching a trench in a silicon-on-insulator (SOI) structure

Process for in-situ etching a hardmask stack

Techniques for plasma etching silicon-germanium

Method for dicing a semiconductor wafer

Process for etching conductors at high etch rates

Plasma etching of silicon using fluorinated gas mixtures

Two etchant etch method

Metal mask etching of silicon

High etch rate method for plasma etching silicon nitride

Two etchant etch method

Silicon trench etch using silicon-containing precursors to reduce o...

Two etchant etch method

Self cleaning method of forming deep trenches in silicon substrates

Patents Applicationslast 30 patents

AMORPHOUS CARBON MULTILAYER COATING WITH DIRECTIONAL PROTECTION

COMPONENT FOR SEMICONDUCTOR PROCESS CHAMBER HAVING SURFACE TREATMEN...

METHOD OF MATCHING TWO OR MORE PLASMA REACTORS

PREDICTIVE METHOD OF MATCHING TWO PLASMA REACTORS

METHODS FOR FORMING A ROUND BOTTOM SILICON TRENCH RECESS FOR SEMICO...

METHODS FOR FORMING THREE DIMENSIONAL NAND STRUCTURES ATOP A SUBSTRATE

METHODS FOR FORMING THREE DIMENSIONAL NAND STRUCTURES ATOP A SUBSTRATE

SELF ALIGNED DUAL PATTERNING TECHNIQUE ENHANCEMENT WITH MAGNETIC SH...

METHODS FOR ETCHING SUBSTRATES USING PULSED DC VOLTAGE

MULTI-FILM STACK ETCHING WITH POLYMER PASSIVATION OF AN OVERLYING E...

FAST SUBSTRATE SUPPORT TEMPERATURE CONTROL

SHALLOW TRENCH ISOLATION ETCH PROCESS

WET CLEAN PROCESS FOR RECOVERY OF ANODIZED CHAMBER PARTS

ETCHING AND PASSIVATING FOR HIGH ASPECT RATIO FEATURES

METHODS TO ELIMINATE "M-SHAPE" ETCH RATE PROFILE IN INDUCTIVELY COU...

Encapsulation of post-etch halogenic residue

Method of forming optical waveguides in a semiconductor substrate

Method of releasing devices from a substrate

Method for laterally etching a semiconductor structure

Method for etching high-aspect-ratio features

Method of forming a capacitor using a high K dielectric material

Method of etching a trench in a silicon-on-insulator (SOI) structure

Etching multi-shaped openings in silicon

TECHNIQUES FOR PLASMA ETCHING SILICON-GERMANIUM

Process for in-situ etching a hardmask stack

Method for dicing a semiconductor wafer

Method for increasing capacitance in stacked and trench capacitors

Method of forming optical waveguides in a semiconductor substrate

Method of eliminating notching when anisotropically etching small l...

Method of micromachining a multi-part cavity