Anjana M. Patel

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Heater support kit for bevel etch chamber
- Patent number 11,948,790
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Tuan Anh Nguyen
- B08 - CLEANING
Information Patent Grant
Treatment for high-temperature cleans
- Patent number 11,699,577
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of reducing chamber residues
- Patent number 11,560,623
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Liangfa Hu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heater support kit for bevel etch chamber
- Patent number 10,903,066
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Tuan Anh Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RPS defect reduction by cyclic clean induced RPS cooling
- Patent number 10,755,903
- Issue date Aug 25, 2020
- Applied Materials, Inc.
- Sidharth Bhatia
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ etch rate determination for chamber clean endpoint
- Patent number 9,589,773
- Issue date Mar 7, 2017
- Applied Materials, Inc.
- Sidharth Bhatia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature silicon oxide conversion
- Patent number 8,445,078
- Issue date May 21, 2013
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Remote plasma clean process with cycled high and low pressure clean...
- Patent number 7,967,913
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Zhong Qiang Hua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stress management for tensile films
- Patent number 7,935,643
- Issue date May 3, 2011
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reactive ion etching for semiconductor device feature topography mo...
- Patent number 7,628,897
- Issue date Dec 8, 2009
- Applied Materials, Inc.
- Hemant P. Mungekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF REDUCING CHAMBER RESIDUES
- Publication number 20230151487
- Publication date May 18, 2023
- Applied Materials, Inc.
- Liangfa HU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TREATMENT FOR HIGH-TEMPERATURE CLEANS
- Publication number 20220384161
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Sarah Michelle Bobek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DEPOSITION RESIDUE CONTROL
- Publication number 20220165567
- Publication date May 26, 2022
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER SUPPORT KIT FOR BEVEL ETCH CHAMBER
- Publication number 20210143005
- Publication date May 13, 2021
- Applied Materials, Inc.
- Tuan Anh NGUYEN
- B08 - CLEANING
Information Patent Application
METHODS OF REDUCING CHAMBER RESIDUES
- Publication number 20200362457
- Publication date Nov 19, 2020
- Applied Materials, Inc.
- Liangfa HU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEATER SUPPORT KIT FOR BEVEL ETCH CHAMBER
- Publication number 20190272991
- Publication date Sep 5, 2019
- Applied Materials, Inc.
- Tuan Anh NGUYEN
- B08 - CLEANING
Information Patent Application
RPS DEFECT REDUCTION BY CYCLIC CLEAN INDUCED RPS COOLING
- Publication number 20170207069
- Publication date Jul 20, 2017
- Applied Materials, Inc.
- Sidharth BHATIA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU ETCH RATE DETERMINATION FOR CHAMBER CLEAN ENDPOINT
- Publication number 20160314944
- Publication date Oct 27, 2016
- Applied Materials, Inc.
- Sidharth BHATIA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE SILICON OXIDE CONVERSION
- Publication number 20120269989
- Publication date Oct 25, 2012
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
STRESS MANAGEMENT FOR TENSILE FILMS
- Publication number 20110034035
- Publication date Feb 10, 2011
- Applied Materials, Inc.
- Jingmei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REMOTE PLASMA CLEAN PROCESS WITH CYCLED HIGH AND LOW PRESSURE CLEAN...
- Publication number 20100095979
- Publication date Apr 22, 2010
- Applied Materials, Inc.
- Zhong Qiang Hua
- B08 - CLEANING
Information Patent Application
Reactive ion etching for semiconductor device feature topography mo...
- Publication number 20040079728
- Publication date Apr 29, 2004
- Applied Materials, Inc.
- Hemant P. Mungekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Anjana M. Patel

Person

Patents Grantslast 30 patents

Heater support kit for bevel etch chamber

Treatment for high-temperature cleans

Methods of reducing chamber residues

Heater support kit for bevel etch chamber

RPS defect reduction by cyclic clean induced RPS cooling

In-situ etch rate determination for chamber clean endpoint

Low temperature silicon oxide conversion

Remote plasma clean process with cycled high and low pressure clean...

Stress management for tensile films

Reactive ion etching for semiconductor device feature topography mo...

Patents Applicationslast 30 patents

METHODS OF REDUCING CHAMBER RESIDUES

TREATMENT FOR HIGH-TEMPERATURE CLEANS

SYSTEMS AND METHODS FOR DEPOSITION RESIDUE CONTROL

HEATER SUPPORT KIT FOR BEVEL ETCH CHAMBER

METHODS OF REDUCING CHAMBER RESIDUES

HEATER SUPPORT KIT FOR BEVEL ETCH CHAMBER

RPS DEFECT REDUCTION BY CYCLIC CLEAN INDUCED RPS COOLING

IN-SITU ETCH RATE DETERMINATION FOR CHAMBER CLEAN ENDPOINT

LOW TEMPERATURE SILICON OXIDE CONVERSION

STRESS MANAGEMENT FOR TENSILE FILMS

REMOTE PLASMA CLEAN PROCESS WITH CYCLED HIGH AND LOW PRESSURE CLEAN...

Reactive ion etching for semiconductor device feature topography mo...