Anna Golotsvan

Person

Qiryat Tivon, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 12,013,634
- Issue date Jun 18, 2024
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multiple-tool parameter set calibration and misregistration measure...
- Patent number 11,862,521
- Issue date Jan 2, 2024
- KLA Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite overlay metrology target
- Patent number 11,809,090
- Issue date Nov 7, 2023
- KLA Corporation
- Anna Golotsvan
- G01 - MEASURING TESTING
Information Patent Grant
Multi-resolution overlay metrology targets
- Patent number 11,726,410
- Issue date Aug 15, 2023
- KLA Corporation
- Eitan Hajaj
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fab management with dynamic sampling plans, optimized wafer measure...
- Patent number 11,615,974
- Issue date Mar 28, 2023
- KLA Corporation
- Amnon Manassen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Enhancing performance of overlay metrology
- Patent number 11,592,755
- Issue date Feb 28, 2023
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Dynamic amelioration of misregistration measurement
- Patent number 11,551,980
- Issue date Jan 10, 2023
- KLA-Tencor Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 11,537,043
- Issue date Dec 27, 2022
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Data-driven misregistration parameter configuration and measurement...
- Patent number 11,353,493
- Issue date Jun 7, 2022
- KLA-Tencor Corporation
- Shlomit Katz
- G01 - MEASURING TESTING
Information Patent Grant
System and method for error reduction for metrology measurements
- Patent number 11,353,799
- Issue date Jun 7, 2022
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20230099105
- Publication date Mar 30, 2023
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTI-RESOLUTION OVERLAY METROLOGY TARGETS
- Publication number 20220334501
- Publication date Oct 20, 2022
- KLA Corporation
- Eitan Hajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCING PERFORMANCE OF OVERLAY METROLOGY
- Publication number 20220317577
- Publication date Oct 6, 2022
- KLA Corporation
- Amnon Manassen
- G02 - OPTICS
Information Patent Application
Systems and Methods for Measurement of Misregistration and Ameliora...
- Publication number 20220307824
- Publication date Sep 29, 2022
- KLA Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Error Reduction for Metrology Measurements
- Publication number 20220155693
- Publication date May 19, 2022
- KLA Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE-TOOL PARAMETER SET CALIBRATION AND MISREGISTRATION MEASURE...
- Publication number 20210366790
- Publication date Nov 25, 2021
- KLA Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAB MANAGEMENT WITH DYNAMIC SAMPLING PLANS, OPTIMIZED WAFER MEASURE...
- Publication number 20210335638
- Publication date Oct 28, 2021
- KLA Corporation
- Amnon MANASSEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPOSITE OVERLAY METROLOGY TARGET
- Publication number 20210240089
- Publication date Aug 5, 2021
- KLA Corporation
- Anna Golotsvan
- G01 - MEASURING TESTING
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20210149296
- Publication date May 20, 2021
- KLA-Tencor Corporation
- Yoel Feler
- G01 - MEASURING TESTING
Information Patent Application
DATA-DRIVEN MISREGISTRATION PARAMETER CONFIGURATION AND MEASUREMENT...
- Publication number 20210011073
- Publication date Jan 14, 2021
- KLA-Tencor Corporation
- Shlomit Katz
- G05 - CONTROLLING REGULATING
Information Patent Application
DYNAMIC AMELIORATION OF MISREGISTRATION MEASUREMENT
- Publication number 20200286794
- Publication date Sep 10, 2020
- KLA-Tencor Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20190250504
- Publication date Aug 15, 2019
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING

Anna Golotsvan

Person

Patents Grantslast 30 patents

Reduction or elimination of pattern placement error in metrology me...

Multiple-tool parameter set calibration and misregistration measure...

Composite overlay metrology target

Multi-resolution overlay metrology targets

Fab management with dynamic sampling plans, optimized wafer measure...

Enhancing performance of overlay metrology

Dynamic amelioration of misregistration measurement

Reduction or elimination of pattern placement error in metrology me...

Data-driven misregistration parameter configuration and measurement...

System and method for error reduction for metrology measurements

Patents Applicationslast 30 patents

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

MULTI-RESOLUTION OVERLAY METROLOGY TARGETS

ENHANCING PERFORMANCE OF OVERLAY METROLOGY

Systems and Methods for Measurement of Misregistration and Ameliora...

System and Method for Error Reduction for Metrology Measurements

MULTIPLE-TOOL PARAMETER SET CALIBRATION AND MISREGISTRATION MEASURE...

FAB MANAGEMENT WITH DYNAMIC SAMPLING PLANS, OPTIMIZED WAFER MEASURE...

COMPOSITE OVERLAY METROLOGY TARGET

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

DATA-DRIVEN MISREGISTRATION PARAMETER CONFIGURATION AND MEASUREMENT...

DYNAMIC AMELIORATION OF MISREGISTRATION MEASUREMENT

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...