Anna M. Minvielle

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multilayer low reflectivity hard mask and process therefor
- Patent number 8,309,457
- Issue date Nov 13, 2012
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayer low reflectivity hard mask and process therefor
- Patent number 8,048,797
- Issue date Nov 1, 2011
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayer low reflectivity hard mask and process therefor
- Patent number 7,538,026
- Issue date May 26, 2009
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming narrowly spaced flash memory contact openings and...
- Patent number 7,507,661
- Issue date Mar 24, 2009
- Spansion LLC
- Emmanuil H. Lingunis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for designing grating structures for use in situ scatterome...
- Patent number 7,427,457
- Issue date Sep 23, 2008
- Advanced Micro Devices, Inc.
- Marina V. Plat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for fabricating contact holes
- Patent number 7,384,725
- Issue date Jun 10, 2008
- Advanced Micro Devices, Inc.
- Anna M. Minvielle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist or dry develop process for forming middle of line i...
- Patent number 7,112,489
- Issue date Sep 26, 2006
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning for elongated VSS contact flash memory
- Patent number 7,018,922
- Issue date Mar 28, 2006
- Advanced Micro Devices, Inc.
- Hung-eil Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning for elliptical Vss contact on flash memory
- Patent number 6,900,124
- Issue date May 31, 2005
- Advanced Micro Devices, Inc.
- Hung-eil Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Utilizing electrical performance data to predict CD variations acro...
- Patent number 6,562,639
- Issue date May 13, 2003
- Advanced Micro Devices, Inc.
- Anna Minvielle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Critical dimension control improvement method for step and scan pho...
- Patent number 6,493,063
- Issue date Dec 10, 2002
- Advanced Micro Devices, Inc.
- Rolf Seltmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for compensating for critical dimension variat...
- Patent number 6,255,125
- Issue date Jul 3, 2001
- Advanced Micro Devices, Inc.
- Regina T. Schmidt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of characterizing linewidth errors in a scanning lithography...
- Patent number 5,985,498
- Issue date Nov 16, 1999
- Advanced Micro Devices, Inc.
- Harry Levinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for making shallow trench marks
- Patent number 5,963,816
- Issue date Oct 5, 1999
- Advanced Micro Devices, Inc.
- Larry Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTILAYER LOW REFLECTIVITY HARD MASK AND PROCESS THEREFOR
- Publication number 20120045888
- Publication date Feb 23, 2012
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER LOW REFLECTIVITY HARD MASK AND PROCESS THEREFOR
- Publication number 20100009536
- Publication date Jan 14, 2010
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming narrowly spaced flash memory contact openings and...
- Publication number 20060035459
- Publication date Feb 16, 2006
- Emmanuil H. Lingunis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for fabricating contact holes
- Publication number 20050221233
- Publication date Oct 6, 2005
- Anna M. Minvielle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Anna M. Minvielle

Person

Patents Grantslast 30 patents

Multilayer low reflectivity hard mask and process therefor

Multilayer low reflectivity hard mask and process therefor

Multilayer low reflectivity hard mask and process therefor

Method of forming narrowly spaced flash memory contact openings and...

Methods for designing grating structures for use in situ scatterome...

System and method for fabricating contact holes

Negative resist or dry develop process for forming middle of line i...

Patterning for elongated VSS contact flash memory

Patterning for elliptical Vss contact on flash memory

Utilizing electrical performance data to predict CD variations acro...

Critical dimension control improvement method for step and scan pho...

Method and apparatus for compensating for critical dimension variat...

Method of characterizing linewidth errors in a scanning lithography...

Method for making shallow trench marks

Patents Applicationslast 30 patents

MULTILAYER LOW REFLECTIVITY HARD MASK AND PROCESS THEREFOR

MULTILAYER LOW REFLECTIVITY HARD MASK AND PROCESS THEREFOR

Method of forming narrowly spaced flash memory contact openings and...

System and method for fabricating contact holes