Anna TCHIKOULAEVA

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Dresden, DE

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Patents Grantslast 30 patents

Information Patent Grant
Fluorine-passivated reticles for use in lithography and methods for...
- Patent number 8,338,061
- Issue date Dec 25, 2012
- Advanced Micro Devices, Inc.
- Harry J. Levinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-passivated reticles for use in lithography and methods for...
- Patent number 7,985,513
- Issue date Jul 26, 2011
- Advanced Micro Devices, Inc.
- Harry J. Levinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
FLUORINE-PASSIVATED RETICLES FOR USE IN LITHOGRAPHY AND METHODS FOR...
- Publication number 20110244377
- Publication date Oct 6, 2011
- Advanced Micro Devices, Inc.
- Harry J. LEVINSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCING ION MIGRATION OF ABSORBER MATERIALS OF LITHOGRAPHY MASKS B...
- Publication number 20110027699
- Publication date Feb 3, 2011
- Anna Tchikoulaeva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-PASSIVATED RETICLES FOR USE IN LITHOGRAPHY AND METHODS FOR...
- Publication number 20090239155
- Publication date Sep 24, 2009
- Advanced Micro Devices, Inc.
- Harry J. LEVINSON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY