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Annette M. Crevasse
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Elkton, MD, US
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Patents Grants
last 30 patents
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Patent Grant
Formulations for high porosity chemical mechanical polishing pads w...
Patent number
12,064,846
Issue date
Aug 20, 2024
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Bryan E. Barton
B24 - GRINDING POLISHING
Patents Applications
last 30 patents
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Patent Application
MICRO-LAYER CMP POLISHING SUBPAD
Publication number
20240181596
Publication date
Jun 6, 2024
Rohm and Haas Electronic Materials CMP Holdings, INC.
Guanhua Hou
B24 - GRINDING POLISHING
Information
Patent Application
FORMULATIONS FOR HIGH POROSITY CHEMICAL MECHANICAL POLISHING PADS W...
Publication number
20220226961
Publication date
Jul 21, 2022
Rohm and Haas Electronic Materials CMP Holdings, INC.
Bryan E. Barton
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...