Annie Xia

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Lynnfield, MA, US

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Patents Grantslast 30 patents

Information Patent Grant
Method and system for forming a feature in a high-k layer
- Patent number 7,361,608
- Issue date Apr 22, 2008
- Tokyo Electron Limited
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for etching a film stack
- Patent number 7,172,969
- Issue date Feb 6, 2007
- Tokyo Electron Limited
- Annie Xia
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method and system for forming a feature in a high-k layer
- Publication number 20060065938
- Publication date Mar 30, 2006
- TOKYO ELECTRON LIMITED
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for etching a gate stack
- Publication number 20060049139
- Publication date Mar 9, 2006
- TOKYO ELECTRON LIMITED
- Annie Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for etching a film stack
- Publication number 20060051964
- Publication date Mar 9, 2006
- TOKYO ELECTRON LIMITED
- Annie Xia
- H01 - BASIC ELECTRIC ELEMENTS