Anthonie Kuijper

Person

Best, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Immersion liquid, exposure apparatus, and exposure process
- Patent number 10,712,675
- Issue date Jul 14, 2020
- ASML Netherlands B.V.
- Hans Jansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, drying device, metrology apparatus and devi...
- Patent number 10,018,925
- Issue date Jul 10, 2018
- ASML Netherlands B.V.
- Nicolaas Rudolf Kemper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion liquid, exposure apparatus, and exposure process
- Patent number 9,772,565
- Issue date Sep 26, 2017
- ASML Netherlands B.V.
- Hans Jansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, drying device, metrology apparatus and devi...
- Patent number 9,606,429
- Issue date Mar 28, 2017
- ASML Netherlands B.V.
- Nicolaas Rudolf Kemper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion liquid, exposure apparatus, and exposure process
- Patent number 9,454,088
- Issue date Sep 27, 2016
- ASML Netherlands B.V.
- Hans Jansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion liquid, exposure apparatus, and exposure process
- Patent number 9,164,391
- Issue date Oct 20, 2015
- ASML Netherlands B.V.
- Hans Jansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,988,657
- Issue date Mar 24, 2015
- ASML Netherlands B.V.
- Frank Johannes Jacobus Van Boxtel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, drying device, metrology apparatus and devi...
- Patent number 8,953,142
- Issue date Feb 10, 2015
- ASML Netherlands B.V.
- Nicolaas Rudolf Kemper
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion liquid, exposure apparatus, and exposure process
- Patent number 8,859,188
- Issue date Oct 14, 2014
- ASML Netherlands B.V.
- Hans Jansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithographic apparatus and a method of operating the apparatus
- Patent number 8,564,757
- Issue date Oct 22, 2013
- ASML Netherlands B.V.
- Bauke Jansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and a method of measuring flow rate in a two...
- Patent number 8,446,561
- Issue date May 21, 2013
- ASML Netherlands B.V.
- Pieter Jacob Kramer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and a method of operating the apparatus
- Patent number 8,432,531
- Issue date Apr 30, 2013
- ASML Netherlands B.V.
- Kornelis Tijmen Hoekerd
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,054,445
- Issue date Nov 8, 2011
- ASML Netherlands B.V.
- Hans Jansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVI...
- Publication number 20180292762
- Publication date Oct 11, 2018
- ASML NETHERLANDS B.V.
- Nicolaas Rudolf KEMPER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS
- Publication number 20180004100
- Publication date Jan 4, 2018
- ASML NETHERLANDS B.V.
- Hans JANSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVI...
- Publication number 20170192365
- Publication date Jul 6, 2017
- ASML NETHERLANDS B.V.
- Nicolaas Rudolf KEMPER
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS
- Publication number 20160033876
- Publication date Feb 4, 2016
- ASML NETHERLANDS B.V.
- Hans JANSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS
- Publication number 20150056559
- Publication date Feb 26, 2015
- ASML NETHERLANDS B.V.
- Hans JANSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVI...
- Publication number 20150015857
- Publication date Jan 15, 2015
- ASML NETHERLANDS B.V.
- Nicolaas Rudolf KEMPER
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20130010270
- Publication date Jan 10, 2013
- ASML NETHERLANDS B.V.
- Frank Johannes Jacobus VAN BOXTEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUID HANDLING STRUCTURE, MODULE FOR AN IMMERSION LITHOGRAPHIC APPA...
- Publication number 20120069309
- Publication date Mar 22, 2012
- ASML NETHERLANDS B.V.
- Paul WILLEMS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
- Publication number 20110080567
- Publication date Apr 7, 2011
- ASML NETHERLANDS B.V.
- Kornelis Tijmen HOEKERD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND A METHOD OF MEASURING FLOW RATE IN A TWO...
- Publication number 20110013159
- Publication date Jan 20, 2011
- ASML NETHERLANDS B.V.
- Pieter Jacob Kramer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
- Publication number 20100328634
- Publication date Dec 30, 2010
- ASML NETHERLANDS B.V.
- Bauke Jansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUID SUPPLY SYSTEM, A LITHOGRAPHIC APPARATUS, A METHOD OF VARYING...
- Publication number 20100208221
- Publication date Aug 19, 2010
- ASML NETHERLANDS B.V.
- Pieter Jacob Kramer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVI...
- Publication number 20100045950
- Publication date Feb 25, 2010
- ASML NETHERLANDS B.V.
- Nicolaas Rudolf Kemper
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Immersion Liquid, Exposure Apparatus, and Exposure Process
- Publication number 20090134488
- Publication date May 28, 2009
- ASML NETHERLANDS B.V.
- Hans Jansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070041001
- Publication date Feb 22, 2007
- ASML NETHERLANDS B.V.
- Hans Jansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Anthonie Kuijper

Person

Patents Grantslast 30 patents

Immersion liquid, exposure apparatus, and exposure process

Lithographic apparatus, drying device, metrology apparatus and devi...

Immersion liquid, exposure apparatus, and exposure process

Lithographic apparatus, drying device, metrology apparatus and devi...

Immersion liquid, exposure apparatus, and exposure process

Immersion liquid, exposure apparatus, and exposure process

Lithographic apparatus and device manufacturing method

Lithographic apparatus, drying device, metrology apparatus and devi...

Immersion liquid, exposure apparatus, and exposure process

Lithographic apparatus and a method of operating the apparatus

Lithographic apparatus and a method of measuring flow rate in a two...

Lithographic apparatus and a method of operating the apparatus

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVI...

IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS

LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVI...

IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS

IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS

LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVI...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

FLUID HANDLING STRUCTURE, MODULE FOR AN IMMERSION LITHOGRAPHIC APPA...

LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS

LITHOGRAPHIC APPARATUS AND A METHOD OF MEASURING FLOW RATE IN A TWO...

LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS

FLUID SUPPLY SYSTEM, A LITHOGRAPHIC APPARATUS, A METHOD OF VARYING...

LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVI...

Immersion Liquid, Exposure Apparatus, and Exposure Process

Lithographic apparatus and device manufacturing method