Anthony Dip

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Showerhead for process tool
- Patent number 12,180,589
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Anthony Dip
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Spatial atomic layer deposition
- Patent number 11,834,745
- Issue date Dec 5, 2023
- Tokyo Electron Limited
- Anthony Dip
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for improving planarity using selective atomic...
- Patent number 11,823,910
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- David O'Meara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple zone gas injection for control of gas phase radicals
- Patent number 11,781,220
- Issue date Oct 10, 2023
- Tokyo Electron Limited
- Anthony Dip
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas phase production of radicals for dielectrics
- Patent number 11,469,147
- Issue date Oct 11, 2022
- Tokyo Electron Limited
- Anthony Dip
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multiple patterning processes
- Patent number 11,417,526
- Issue date Aug 16, 2022
- Tokyo Electron Limited
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple zone gas injection for control of gas phase radicals
- Patent number 11,274,370
- Issue date Mar 15, 2022
- Tokyo Electron Limited
- Anthony Dip
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Internally cooled multi-hole injectors for delivery of process chem...
- Patent number 11,225,716
- Issue date Jan 18, 2022
- Tokyo Electron Limited
- Melvin Verbaas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for multi-film deposition and etching in a bat...
- Patent number 9,831,099
- Issue date Nov 28, 2017
- Tokyo Electron Limited
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayer sidewall spacer for seam protection of a patterned struc...
- Patent number 8,673,725
- Issue date Mar 18, 2014
- Tokyo Electron Limited
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual sidewall spacer for seam protection of a patterned structure
- Patent number 8,664,102
- Issue date Mar 4, 2014
- Tokyo Electron Limited
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film deposition apparatus
- Patent number 8,465,592
- Issue date Jun 18, 2013
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming strained epitaxial carbon-doped silicon films
- Patent number 8,466,045
- Issue date Jun 18, 2013
- Tokyo Electron Limited
- John Gumpher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film deposition apparatus
- Patent number 8,465,591
- Issue date Jun 18, 2013
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reduced defect silicon or silicon germanium deposition in micro-fea...
- Patent number 8,263,474
- Issue date Sep 11, 2012
- Tokyo Electron Limited
- Anthony Dip
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition systems and methods
- Patent number 8,043,432
- Issue date Oct 25, 2011
- Tokyo Electron Limited
- Anthony Dip
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-temperature dielectric film formation by chemical vapor deposition
- Patent number 7,994,070
- Issue date Aug 9, 2011
- Tokyo Electron Limited
- Anthony Dip
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal processing furnace, gas delivery system therefor, and metho...
- Patent number 7,910,494
- Issue date Mar 22, 2011
- Tokyo Electron Limited
- Anthony Dip
- C30 - CRYSTAL GROWTH
Information Patent Grant
In-situ hybrid deposition of high dielectric constant films using a...
- Patent number 7,816,278
- Issue date Oct 19, 2010
- Tokyo Electron Limited
- Kimberly G. Reid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ formation of oxidized aluminum nitride films
- Patent number 7,776,763
- Issue date Aug 17, 2010
- Tokyo Electron Limited
- Kimberly G. Reid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon germanium surface layer for high-k dielectric integration
- Patent number 7,737,051
- Issue date Jun 15, 2010
- Tokyo Electron Limited
- Anthony Dip
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for growing an oxynitride film on a substrate
- Patent number 7,659,214
- Issue date Feb 9, 2010
- Tokyo Electron Limited
- Kimberly G. Reid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for replacing a nitrous oxide based oxidation process with a...
- Patent number 7,635,655
- Issue date Dec 22, 2009
- Tokyo Electron Limited
- Anthony Dip
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal processing system with improved process gas flow and method...
- Patent number 7,632,354
- Issue date Dec 15, 2009
- Tokyo Electron Limited
- Anthony Dip
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for extending time between chamber cleaning processes
- Patent number 7,604,841
- Issue date Oct 20, 2009
- Tokyo Electron Limited
- Raymond Joe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for growing a thin oxynitride film on a substrate
- Patent number 7,534,731
- Issue date May 19, 2009
- Tokyo Electron Limited
- Kimberly G. Reid
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for removing an oxide from a substrate
- Patent number 7,524,769
- Issue date Apr 28, 2009
- Tokyo Electron Limited
- Anthony Dip
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sequential oxide removal using fluorine and hydrogen
- Patent number 7,501,349
- Issue date Mar 10, 2009
- Tokyo Electron Limited
- Anthony Dip
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of silicon-containing films from hexachlorodisilane
- Patent number 7,468,311
- Issue date Dec 23, 2008
- Tokyo Electron Limited
- Anthony Dip
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature formation of patterned epitaxial Si containing films
- Patent number 7,405,140
- Issue date Jul 29, 2008
- Tokyo Electron Limited
- Anthony Dip
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Deposition Systems with Rotating Electrostatic Chuck and Methods Th...
- Publication number 20240376602
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Melvin Verbaas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR IMPROVING PLANARITY USING SELECTIVE ATOMIC...
- Publication number 20240047218
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- David O'Meara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FURNACE WITH METAL FURNACE TUBE
- Publication number 20220178024
- Publication date Jun 9, 2022
- TOKYO ELECTRON LIMITED
- Melvin Verbaas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multiple Zone Gas Injection For Control of Gas Phase Radicals
- Publication number 20220098733
- Publication date Mar 31, 2022
- TOKYO ELECTRON LIMITED
- Anthony Dip
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS PHASE PRODUCTION OF RADICALS FOR DIELECTRICS
- Publication number 20220044974
- Publication date Feb 10, 2022
- TOKYO ELECTRON LIMITED
- Anthony Dip
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Improving Planarity using Selective Atomic...
- Publication number 20220037162
- Publication date Feb 3, 2022
- TOKYO ELECTRON LIMITED
- David O'Meara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Showerhead for Process Tool
- Publication number 20210404064
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Anthony Dip
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Thermally Cracking Ammonia
- Publication number 20210395883
- Publication date Dec 23, 2021
- TOKYO ELECTRON LIMITED
- Anthony Dip
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Spatial Atomic Layer Deposition
- Publication number 20210395886
- Publication date Dec 23, 2021
- TOKYO ELECTRON LIMITED
- Anthony Dip
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Systems and Methods for Depositing a Layer on a Substrate Using Ato...
- Publication number 20210355580
- Publication date Nov 18, 2021
- TOKYO ELECTRON LIMITED
- Anthony Dip
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multiple Patterning Processes
- Publication number 20210242020
- Publication date Aug 5, 2021
- TOKYO ELECTRON LIMITED
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNALLY COOLED MULTI-HOLE INJECTORS FOR DELIVERY OF PROCESS CHE...
- Publication number 20210156029
- Publication date May 27, 2021
- TOKYO ELECTRON LIMITED
- Melvin Verbaas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multiple Zone Gas Injection For Control of Gas Phase Radicals
- Publication number 20190360095
- Publication date Nov 28, 2019
- TOKYO ELECTRON LIMITED
- Anthony Dip
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR MULTI-FILM DEPOSITION AND ETCHING IN A BAT...
- Publication number 20170236719
- Publication date Aug 17, 2017
- TOKYO ELECTRON LIMITED
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION METHOD AND COMPUTER READABLE STORAGE MEDIUM
- Publication number 20130251904
- Publication date Sep 26, 2013
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING STRAINED EPITAXIAL CARBON-DOPED SILICON FILMS
- Publication number 20120003825
- Publication date Jan 5, 2012
- TOKYO ELECTRON LIMITED
- Anthony Dip
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL SIDEWALL SPACER FOR SEAM PROTECTION OF A PATTERNED STRUCTURE
- Publication number 20110241085
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER SIDEWALL SPACER FOR SEAM PROTECTION OF A PATTERNED STRUC...
- Publication number 20110241128
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- David L. O'Meara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER RE...
- Publication number 20110151122
- Publication date Jun 23, 2011
- TOKYO ELECTRON LIMITED
- HITOSHI KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film Deposition Apparatus, Film Deposition Method, and Computer Rea...
- Publication number 20090324826
- Publication date Dec 31, 2009
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER RE...
- Publication number 20090324828
- Publication date Dec 31, 2009
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU HYBRID DEPOSITION OF HIGH DIELECTRIC CONSTANT FILMS USING A...
- Publication number 20090246971
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Kimberly G. Reid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR GROWING AN OXYNITRIDE FILM ON A SUBSTRATE
- Publication number 20090088000
- Publication date Apr 2, 2009
- TOKYO ELECTRON LIMITED
- Kimberly G. Reid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMAL PROCESSING SYSTEM AND METHOD FOR FORMING AN OXIDE LAYER ON...
- Publication number 20090035463
- Publication date Feb 5, 2009
- TOKYO ELECTRON LIMITED
- Anthony Dip
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR GROWING A THIN OXYNITRIDE FILM ON A SUBSTRATE
- Publication number 20080242109
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Kimberly G. Reid
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION SYSTEMS AND METHODS
- Publication number 20080193643
- Publication date Aug 14, 2008
- TOKYO ELECTRON LIMITED
- Anthony Dip
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REDUCED DEFECT SILICON OR SILICON GERMANIUM DEPOSITION IN MICRO-FEA...
- Publication number 20080169534
- Publication date Jul 17, 2008
- TOKYO ELECTRON LIMITED
- Anthony Dip
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL PROCESSING SYSTEM WITH IMPROVED PROCESS GAS FLOW AND METHOD...
- Publication number 20080035055
- Publication date Feb 14, 2008
- TOKYO ELECTRON LIMITED
- Anthony Dip
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU FORMATION OF OXIDIZED ALUMINUM NITRIDE FILMS
- Publication number 20070259534
- Publication date Nov 8, 2007
- TOKYO ELECTRON LIMITED
- Kimberly G. Reid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR REPLACING A NITROUS OXIDE BASED OXIDATION PROCESS WITH A...
- Publication number 20070238313
- Publication date Oct 11, 2007
- TOKYO ELECTRON LIMITED
- Anthony Dip
- H01 - BASIC ELECTRIC ELEMENTS

Anthony Dip

Person

Patents Grantslast 30 patents

Showerhead for process tool

Spatial atomic layer deposition

Systems and methods for improving planarity using selective atomic...

Multiple zone gas injection for control of gas phase radicals

Gas phase production of radicals for dielectrics

Multiple patterning processes

Multiple zone gas injection for control of gas phase radicals

Internally cooled multi-hole injectors for delivery of process chem...

Method and apparatus for multi-film deposition and etching in a bat...

Multilayer sidewall spacer for seam protection of a patterned struc...

Dual sidewall spacer for seam protection of a patterned structure

Film deposition apparatus

Method of forming strained epitaxial carbon-doped silicon films

Film deposition apparatus

Reduced defect silicon or silicon germanium deposition in micro-fea...

Atomic layer deposition systems and methods

Low-temperature dielectric film formation by chemical vapor deposition

Thermal processing furnace, gas delivery system therefor, and metho...

In-situ hybrid deposition of high dielectric constant films using a...

In-situ formation of oxidized aluminum nitride films

Silicon germanium surface layer for high-k dielectric integration

Method for growing an oxynitride film on a substrate

Method for replacing a nitrous oxide based oxidation process with a...

Thermal processing system with improved process gas flow and method...

Method for extending time between chamber cleaning processes

Method for growing a thin oxynitride film on a substrate

Method and system for removing an oxide from a substrate

Sequential oxide removal using fluorine and hydrogen

Deposition of silicon-containing films from hexachlorodisilane

Low temperature formation of patterned epitaxial Si containing films

Patents Applicationslast 30 patents

Deposition Systems with Rotating Electrostatic Chuck and Methods Th...

SYSTEMS AND METHODS FOR IMPROVING PLANARITY USING SELECTIVE ATOMIC...

FURNACE WITH METAL FURNACE TUBE

Multiple Zone Gas Injection For Control of Gas Phase Radicals

GAS PHASE PRODUCTION OF RADICALS FOR DIELECTRICS

Systems and Methods for Improving Planarity using Selective Atomic...

Showerhead for Process Tool

System and Method for Thermally Cracking Ammonia

Spatial Atomic Layer Deposition

Systems and Methods for Depositing a Layer on a Substrate Using Ato...

Multiple Patterning Processes

INTERNALLY COOLED MULTI-HOLE INJECTORS FOR DELIVERY OF PROCESS CHE...

Multiple Zone Gas Injection For Control of Gas Phase Radicals

METHOD AND APPARATUS FOR MULTI-FILM DEPOSITION AND ETCHING IN A BAT...

FILM DEPOSITION METHOD AND COMPUTER READABLE STORAGE MEDIUM

METHOD OF FORMING STRAINED EPITAXIAL CARBON-DOPED SILICON FILMS

DUAL SIDEWALL SPACER FOR SEAM PROTECTION OF A PATTERNED STRUCTURE

MULTILAYER SIDEWALL SPACER FOR SEAM PROTECTION OF A PATTERNED STRUC...

FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER RE...

Film Deposition Apparatus, Film Deposition Method, and Computer Rea...

FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER RE...

IN-SITU HYBRID DEPOSITION OF HIGH DIELECTRIC CONSTANT FILMS USING A...

METHOD FOR GROWING AN OXYNITRIDE FILM ON A SUBSTRATE

THERMAL PROCESSING SYSTEM AND METHOD FOR FORMING AN OXIDE LAYER ON...

METHOD FOR GROWING A THIN OXYNITRIDE FILM ON A SUBSTRATE

ATOMIC LAYER DEPOSITION SYSTEMS AND METHODS

REDUCED DEFECT SILICON OR SILICON GERMANIUM DEPOSITION IN MICRO-FEA...

THERMAL PROCESSING SYSTEM WITH IMPROVED PROCESS GAS FLOW AND METHOD...

IN-SITU FORMATION OF OXIDIZED ALUMINUM NITRIDE FILMS

METHOD FOR REPLACING A NITROUS OXIDE BASED OXIDATION PROCESS WITH A...