Anthony Zampini

Person

  • Marlborough, MA, US

Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

    • Publication number 20190354015
    • Publication date Nov 21, 2019
    • Rohm and Haas Electronic Materials L.L.C.
    • Owendi Ongayi
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY

    • Publication number 20170285478
    • Publication date Oct 5, 2017
    • Rohm and Haas Electronic Materials L.L.C.
    • Anthony Zampini
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

    • Publication number 20160363862
    • Publication date Dec 15, 2016
    • Rohm and Haas Electronic Materials L.L.C.
    • Anthony Zampini
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY

    • Publication number 20160223911
    • Publication date Aug 4, 2016
    • Rohm and Haas Electronic Materials, L.L.C.
    • Anthony Zampini
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY

    • Publication number 20140030653
    • Publication date Jan 30, 2014
    • Anthony ZAMPINI
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

    • Publication number 20130004901
    • Publication date Jan 3, 2013
    • Rohm and Haas Electronic Materials L.L.C.
    • Owendi Ongayi
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Application

    COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

    • Publication number 20130004893
    • Publication date Jan 3, 2013
    • Rohm and Haas Electronic Materials L.L.C.
    • Vipul Jain
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Application

    COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR P...

    • Publication number 20110255061
    • Publication date Oct 20, 2011
    • Rohm and Haas Electronic Materials, L.L.C.
    • Deyan Wang
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    NOVEL RESINS AND PHOTORESIST COMPOSITIONS COMPRISING SAME

    • Publication number 20110039210
    • Publication date Feb 17, 2011
    • Rohm and Haas Electronic Materials L.L.C.
    • Cheng-Bai Xu
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

    • Publication number 20110033801
    • Publication date Feb 10, 2011
    • Rohm and Haas Electronic Materials L.L.C.
    • Anthony Zampini
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

    • Publication number 20110033800
    • Publication date Feb 10, 2011
    • Rohm and Haas Electronic Materials L.L.C.
    • Anthony ZAMPINI
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    ANTIREFLECTIVE HARD MASK COMPOSITIONS

    • Publication number 20100297539
    • Publication date Nov 25, 2010
    • Rohm and Haas Electronic Materials, L.L.C.
    • Dana A. Gronbeck
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Si-polymers and photoresists comprising same

    • Publication number 20090136867
    • Publication date May 28, 2009
    • Rohm and Haas Electronic Materials L.L.C.
    • Anthony Zampini
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Coating composition

    • Publication number 20080248331
    • Publication date Oct 9, 2008
    • Rohm and Haas Electronic Materials L.L.C.
    • Michael K. Gallagher
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Coating compositions for photolithography

    • Publication number 20080073754
    • Publication date Mar 27, 2008
    • Rohm and Haas Electronic Materials L.L.C.
    • Anthony Zampini
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Coating compositions for use with an overcoated photoresist

    • Publication number 20070264580
    • Publication date Nov 15, 2007
    • Rohm and Haas Electronic Materials L.L.C.
    • Anthony Zampini
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Coating compositions for photolithography

    • Publication number 20070238052
    • Publication date Oct 11, 2007
    • Rohm and Haas Electronic Materials L.L.C.
    • Anthony Zampini
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Antireflective hard mask compositions

    • Publication number 20070057253
    • Publication date Mar 15, 2007
    • Rohm and Haas Electronic Materials L.L.C.
    • Dana A. Gronbeck
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Coating compositions for use with an overcoated photoresist

    • Publication number 20060275696
    • Publication date Dec 7, 2006
    • Rohm and Haas Electronic Materials L.L.C.
    • Anthony Zampini
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Coating compositions for use with an overcoated photoresist

    • Publication number 20060228646
    • Publication date Oct 12, 2006
    • Rohm and Haas Electronic Materials L.L.C.
    • Anthony Zampini
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Adhesion promoter for ferroelectric polymer films

    • Publication number 20060147730
    • Publication date Jul 6, 2006
    • Rohm and Haas Electronic Materials L.L.C.
    • Kathleen M. O'Connell
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Polymers and photoresists comprising same

    • Publication number 20040248032
    • Publication date Dec 9, 2004
    • Anthony Zampini
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Solvents and photoresists compositions for short wavelength imaging

    • Publication number 20040209188
    • Publication date Oct 21, 2004
    • Shipley Company, L.L.C.
    • Charles R. Szmanda
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Phenolic/alicyclic copolymers and photoresists

    • Publication number 20030207200
    • Publication date Nov 6, 2003
    • Shipley Company, L.L.C.
    • George G. Barclay
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Solvents and photoresist compositions for short wavelength imaging

    • Publication number 20030036016
    • Publication date Feb 20, 2003
    • Shipley Company, L.L.C.
    • Charles R. Szmanda
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Photoresist compositions for short wavelength imaging

    • Publication number 20030027077
    • Publication date Feb 6, 2003
    • Shipley Company, L.L.C.
    • Anthony Zampini
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Application

    Antireflective porogens

    • Publication number 20030022953
    • Publication date Jan 30, 2003
    • Shipley Company, L.L.C.
    • Anthony Zampini
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    Antireflective porogens

    • Publication number 20020198269
    • Publication date Dec 26, 2002
    • Shipley Company, L.L.C.
    • Anthony Zampini
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    Polymer and photoresist compositions

    • Publication number 20020119391
    • Publication date Aug 29, 2002
    • Shipley Company, L.L.C.
    • George G. Barclay
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Novel polymers and photoresist compositions for short wavelength im...

    • Publication number 20020081499
    • Publication date Jun 27, 2002
    • Shipley Company, L.L.C.
    • Anthony Zampini
    • H01 - BASIC ELECTRIC ELEMENTS