Anto YASAKA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Ion source and electron source having single-atom termination struc...
- Patent number 10,529,531
- Issue date Jan 7, 2020
- Hitachi High-Tech Science Corporation
- Chuhei Oshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for acquiring image and ion beam apparatus
- Patent number 10,276,343
- Issue date Apr 30, 2019
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for acquiring image and ion beam apparatus
- Patent number 10,014,157
- Issue date Jul 3, 2018
- Hitachi High-Tech Science Corporation
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus
- Patent number 9,793,085
- Issue date Oct 17, 2017
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iridium tip, gas field ion source, focused ion beam apparatus, elec...
- Patent number 9,773,634
- Issue date Sep 26, 2017
- Hitachi High-Tech Science Corporation
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Emitter structure, gas ion source and focused ion beam system
- Patent number 9,640,361
- Issue date May 2, 2017
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iridium tip, gas field ion source, focused ion beam apparatus, elec...
- Patent number 9,583,299
- Issue date Feb 28, 2017
- Hitachi High-Tech Science Corporation
- Tomokazu Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Repair apparatus
- Patent number 9,378,858
- Issue date Jun 28, 2016
- Hitachi High-Tech Science Corporation
- Fumio Aramaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Focused ion beam apparatus with precious metal emitter surface
- Patent number 9,336,979
- Issue date May 10, 2016
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus, thin film forming method, defect c...
- Patent number 9,257,273
- Issue date Feb 9, 2016
- Hitachi High-Tech Science Corporation
- Yoshihiro Koyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Emitter structure, gas ion source and focused ion beam system
- Patent number 9,129,771
- Issue date Sep 8, 2015
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating emitter
- Patent number 8,999,178
- Issue date Apr 7, 2015
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitrogen ions from a gas field ion source held at a pressure of 1.0...
- Patent number 8,963,100
- Issue date Feb 24, 2015
- Hitachi High-Tech Science Corporation
- Anto Yasaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for fabricating emitter
- Patent number 8,764,994
- Issue date Jul 1, 2014
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect repair apparatus and method for EUV mask using a hydrogen io...
- Patent number 8,460,842
- Issue date Jun 11, 2013
- SII NanoTechnology Inc.
- Takashi Ogawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photomask correction method using composite charged particle beam,...
- Patent number 7,172,839
- Issue date Feb 6, 2007
- SII NanoTechnology Inc.
- Yasuhiko Sugiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of stabilizing operation for a liquid metal ion source
- Patent number 5,153,440
- Issue date Oct 6, 1992
- Seiko Instruments, Inc.
- Anto Yasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of correcting a pattern film
- Patent number 4,902,530
- Issue date Feb 20, 1990
- Seiko Instruments Inc.
- Anto Yasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ION SOURCE AND ELECTRON SOURCE HAVING SINGLE-ATOM TERMINATION STRUC...
- Publication number 20190164719
- Publication date May 30, 2019
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Chuhei OSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ACQUIRING IMAGE AND ION BEAM APPARATUS
- Publication number 20180269029
- Publication date Sep 20, 2018
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu KOZAKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...
- Publication number 20170148603
- Publication date May 25, 2017
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu Kozakai
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR ACQUIRING IMAGE AND ION BEAM APPARATUS
- Publication number 20170092461
- Publication date Mar 30, 2017
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu KOZAKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Repair Apparatus
- Publication number 20160322123
- Publication date Nov 3, 2016
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Fumio Aramaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20160225574
- Publication date Aug 4, 2016
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMITTER STRUCTURE, GAS ION SOURCE AND FOCUSED ION BEAM SYSTEM
- Publication number 20150357147
- Publication date Dec 10, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20150162160
- Publication date Jun 11, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Repair Apparatus
- Publication number 20150053866
- Publication date Feb 26, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Fumio Aramaki
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...
- Publication number 20150047079
- Publication date Feb 12, 2015
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tomokazu Kozakai
- G01 - MEASURING TESTING
Information Patent Application
EMITTER STRUCTURE, GAS ION SOURCE AND FOCUSED ION BEAM SYSTEM
- Publication number 20140291542
- Publication date Oct 2, 2014
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING EMITTER
- Publication number 20140246397
- Publication date Sep 4, 2014
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING EMITTER
- Publication number 20130248483
- Publication date Sep 26, 2013
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, THIN FILM FORMING METHOD, DEFECT C...
- Publication number 20130224889
- Publication date Aug 29, 2013
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yoshihiro Koyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FOCUSED ION BEAM APPARATUS
- Publication number 20130099133
- Publication date Apr 25, 2013
- Anto YASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Defect repair apparatus and method for EUV mask
- Publication number 20110189593
- Publication date Aug 4, 2011
- Takashi Ogawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
Photomask correction method using composite charged particle beam,...
- Publication number 20070267579
- Publication date Nov 22, 2007
- Yasuhiko Sugiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask correction method using composite charged particle beam,...
- Publication number 20040131953
- Publication date Jul 8, 2004
- Yasuhiko Sugiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Anto YASAKA

Person

Patents Grantslast 30 patents

Ion source and electron source having single-atom termination struc...

Method for acquiring image and ion beam apparatus

Method for acquiring image and ion beam apparatus

Focused ion beam apparatus

Iridium tip, gas field ion source, focused ion beam apparatus, elec...

Emitter structure, gas ion source and focused ion beam system

Iridium tip, gas field ion source, focused ion beam apparatus, elec...

Repair apparatus

Focused ion beam apparatus with precious metal emitter surface

Charged particle beam apparatus, thin film forming method, defect c...

Emitter structure, gas ion source and focused ion beam system

Method for fabricating emitter

Nitrogen ions from a gas field ion source held at a pressure of 1.0...

Method for fabricating emitter

Defect repair apparatus and method for EUV mask using a hydrogen io...

Photomask correction method using composite charged particle beam,...

Method of stabilizing operation for a liquid metal ion source

Method of correcting a pattern film

Patents Applicationslast 30 patents

ION SOURCE AND ELECTRON SOURCE HAVING SINGLE-ATOM TERMINATION STRUC...

METHOD FOR ACQUIRING IMAGE AND ION BEAM APPARATUS

Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...

METHOD FOR ACQUIRING IMAGE AND ION BEAM APPARATUS

Repair Apparatus

FOCUSED ION BEAM APPARATUS

EMITTER STRUCTURE, GAS ION SOURCE AND FOCUSED ION BEAM SYSTEM

FOCUSED ION BEAM APPARATUS

Repair Apparatus

Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Elec...

EMITTER STRUCTURE, GAS ION SOURCE AND FOCUSED ION BEAM SYSTEM

METHOD FOR FABRICATING EMITTER

METHOD FOR FABRICATING EMITTER

CHARGED PARTICLE BEAM APPARATUS, THIN FILM FORMING METHOD, DEFECT C...

FOCUSED ION BEAM APPARATUS

Defect repair apparatus and method for EUV mask

Photomask correction method using composite charged particle beam,...

Photomask correction method using composite charged particle beam,...