Anton Bernhard VAN OOSTEN

Person

Lommel, BE

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 12,112,260
- Issue date Oct 8, 2024
- ASML Netherlands B.V.
- Lorenzo Tripodi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process window based on defect probability
- Patent number 11,822,255
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Abraham Slachter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Matching pupil determination
- Patent number 11,460,782
- Issue date Oct 4, 2022
- ASML Netherlands B.V.
- Anton Bernhard Van Oosten
- G02 - OPTICS
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 11,314,174
- Issue date Apr 26, 2022
- ASML Netherlands B.V.
- Laurentius Cornelius De Winter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Guided patterning device inspection
- Patent number 11,287,748
- Issue date Mar 29, 2022
- ASML Netherlands B.V.
- Anton Bernhard Van Oosten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window based on defect probability
- Patent number 11,079,687
- Issue date Aug 3, 2021
- ASML Netherlands B.V.
- Abraham Slachter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 11,054,754
- Issue date Jul 6, 2021
- ASML Netherlands B.V.
- Frank Staals
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning stack optimization
- Patent number 10,775,705
- Issue date Sep 15, 2020
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of calibrating focus measurements, measurement method and me...
- Patent number 10,571,812
- Issue date Feb 25, 2020
- ASML Netherlands B.V.
- Fahong Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus, inspection method, lithographic apparatus, pa...
- Patent number 10,054,862
- Issue date Aug 21, 2018
- ASML Netherlands B.V.
- Anton Bernhard Van Oosten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Metrology Apparatus And Method For Determining A Characteristic Of...
- Publication number 20240412067
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Lorenzo Tripodi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS WINDOW BASED ON DEFECT PROBABILITY
- Publication number 20240126181
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATCHING PUPIL DETERMINATION
- Publication number 20220404718
- Publication date Dec 22, 2022
- ASML NETHERLANDS B.V.
- Anton Bernhard VAN OOSTEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS WINDOW BASED ON DEFECT PROBABILITY
- Publication number 20210356874
- Publication date Nov 18, 2021
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATCHING PUPIL DETERMINATION
- Publication number 20210302844
- Publication date Sep 30, 2021
- ASML NETHERLANDS B.V.
- Anton Bernhard VAN OOSTEN
- G02 - OPTICS
Information Patent Application
GUIDED PATTERNING DEVICE INSPECTION
- Publication number 20210041788
- Publication date Feb 11, 2021
- ASML NETHERLANDS B.V.
- Anton Bernhard VAN OOSTEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS WINDOW BASED ON DEFECT PROBABILITY
- Publication number 20210018850
- Publication date Jan 21, 2021
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Patterning Devices and Apparatuses for Measuring Focus...
- Publication number 20200264522
- Publication date Aug 20, 2020
- ASML NETHERLANDS B.V.
- Laurentius Cornelius DE WINTER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Methods and Patterning Devices and Apparatuses for Measuring Focus...
- Publication number 20200142324
- Publication date May 7, 2020
- ASML NETHERLANDS B.V.
- Frank STAALS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus and Method for Determining a Characteristic of...
- Publication number 20190378012
- Publication date Dec 12, 2019
- ASML NETHERLANDS B.V.
- Lorenzo Tripodi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERNING STACK OPTIMIZATION
- Publication number 20190204749
- Publication date Jul 4, 2019
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Calibrating Focus Measurements, Measurement Method and Me...
- Publication number 20190056673
- Publication date Feb 21, 2019
- ASML NETHERLANDS B.V.
- Fahong LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection Apparatus, Inspection Method, Lithographic Apparatus, Pa...
- Publication number 20180046091
- Publication date Feb 15, 2018
- ASML NETHERLANDS B.V.
- Anton Bernhard VAN OOSTEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection Apparatus, Inspection Method, Lithographic Apparatus, Pa...
- Publication number 20160363871
- Publication date Dec 15, 2016
- ASML NETHERLANDS B.V.
- Anton Bernhard VAN OOSTEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD AND APPARATUS
- Publication number 20110310369
- Publication date Dec 22, 2011
- ASML NETHERLANDS B.V.
- Uwe MICKAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Anton Bernhard VAN OOSTEN

Person

Patents Grantslast 30 patents

Metrology apparatus and method for determining a characteristic of...

Process window based on defect probability

Matching pupil determination

Methods and patterning devices and apparatuses for measuring focus...

Guided patterning device inspection

Process window based on defect probability

Methods and patterning devices and apparatuses for measuring focus...

Patterning stack optimization

Method of calibrating focus measurements, measurement method and me...

Inspection apparatus, inspection method, lithographic apparatus, pa...

Patents Applicationslast 30 patents

Metrology Apparatus And Method For Determining A Characteristic Of...

PROCESS WINDOW BASED ON DEFECT PROBABILITY

MATCHING PUPIL DETERMINATION

PROCESS WINDOW BASED ON DEFECT PROBABILITY

MATCHING PUPIL DETERMINATION

GUIDED PATTERNING DEVICE INSPECTION

PROCESS WINDOW BASED ON DEFECT PROBABILITY

Methods and Patterning Devices and Apparatuses for Measuring Focus...

Methods and Patterning Devices and Apparatuses for Measuring Focus...

Metrology Apparatus and Method for Determining a Characteristic of...

PATTERNING STACK OPTIMIZATION

Method of Calibrating Focus Measurements, Measurement Method and Me...

Inspection Apparatus, Inspection Method, Lithographic Apparatus, Pa...

Inspection Apparatus, Inspection Method, Lithographic Apparatus, Pa...

LITHOGRAPHIC METHOD AND APPARATUS