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Anton D. CHAVEZ

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  • West Newton, MA, US
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Patents Applicationslast 30 patents

  • Information Patent Application

    PHOTORESIST UNDERLAYER COMPOSITION
    • Publication number 20230103371
    • Publication date Apr 6, 2023
    • Rohm and Haas Electronic Materials L.L.C.
    • Iou-Sheng Ke
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    COATED UNDERLAYER FOR OVERCOATED PHOTORESIST
    • Publication number 20230057401
    • Publication date Feb 23, 2023
    • Rohm and Haas Electronic Materials L.L.C.
    • Anton Chavez
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    HIGH REFRACTIVE INDEX MATERIALS
    • Publication number 20220112321
    • Publication date Apr 14, 2022
    • Rohm and Haas Electronic Materials L.L.C.
    • Anastasia PATTERSON
    • G02 - OPTICS