Antonella Cucchetti

Person

Manchester by the Sea, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
System using pixelated faraday sensor
- Patent number 11,810,754
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Eric D. Hermanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic filter providing reduced particle generation
- Patent number 11,437,215
- Issue date Sep 6, 2022
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cathode ion source
- Patent number 11,114,277
- Issue date Sep 7, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam quality control using a movable mass resolving device
- Patent number 11,049,691
- Issue date Jun 29, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-current ion implanter and method for controlling ion beam usin...
- Patent number 11,011,343
- Issue date May 18, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cathode ion source
- Patent number 10,741,361
- Issue date Aug 11, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cathode ion source
- Patent number 10,446,372
- Issue date Oct 15, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual cathode ion source
- Patent number 9,978,554
- Issue date May 22, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Platen control
- Patent number 9,012,337
- Issue date Apr 21, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for ion implanting a target
- Patent number 8,937,003
- Issue date Jan 20, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Alexander S. Perel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Implant uniformity control
- Patent number 7,820,988
- Issue date Oct 26, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter optimizer scan waveform retention and recovery
- Patent number 7,547,460
- Issue date Jun 16, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Antonella Cucchetti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam implant current, spot width and position tuning
- Patent number 7,442,944
- Issue date Oct 28, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam contamination determination
- Patent number 7,402,820
- Issue date Jul 22, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Russell Low
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for alignment of ion beam systems using beam...
- Patent number 6,403,972
- Issue date Jun 11, 2002
- Varian Semiconductor Equipment Associates, Inc.
- Antonella Cucchetti
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM USING PIXELATED FARADAY SENSOR
- Publication number 20230187171
- Publication date Jun 15, 2023
- Applied Materials, Inc.
- Eric D. Hermanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC FILTER PROVIDING REDUCED PARTICLE GENERATION
- Publication number 20210183609
- Publication date Jun 17, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-CURRENT ION IMPLANTER AND METHOD FOR CONTROLLING ION BEAM USIN...
- Publication number 20210020399
- Publication date Jan 21, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Cathode Ion Source
- Publication number 20200294765
- Publication date Sep 17, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Cathode Ion Source
- Publication number 20190385811
- Publication date Dec 19, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Beam Quality Control Using A Movable Mass Resolving Device
- Publication number 20190198292
- Publication date Jun 27, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual Cathode Ion Source
- Publication number 20180211808
- Publication date Jul 26, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE FOR ION IMPLANTING A TARGET
- Publication number 20130072008
- Publication date Mar 21, 2013
- Alexander S. Perel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLATEN CONTROL
- Publication number 20120088035
- Publication date Apr 12, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPLANT UNIFORMITY CONTROL
- Publication number 20100084581
- Publication date Apr 8, 2010
- Victor M. Benveniste
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNING AN ION IMPLANTER FOR OPTIMAL PERFORMANCE
- Publication number 20080245957
- Publication date Oct 9, 2008
- Atul Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion beam contamination determination
- Publication number 20070241276
- Publication date Oct 18, 2007
- Russell Low
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion beam implant current, spot width and position tuning
- Publication number 20060076510
- Publication date Apr 13, 2006
- Shengwu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implanter optimized scan waveform retention and recovery
- Publication number 20020081788
- Publication date Jun 27, 2002
- Varian Semiconductor Equipment Associates, Inc.
- Antonella Cucchetti
- H01 - BASIC ELECTRIC ELEMENTS

Antonella Cucchetti

Person

Patents Grantslast 30 patents

System using pixelated faraday sensor

Electrostatic filter providing reduced particle generation

Dual cathode ion source

Ion beam quality control using a movable mass resolving device

High-current ion implanter and method for controlling ion beam usin...

Dual cathode ion source

Dual cathode ion source

Dual cathode ion source

Platen control

Technique for ion implanting a target

Implant uniformity control

Ion implanter optimizer scan waveform retention and recovery

Ion beam implant current, spot width and position tuning

Ion beam contamination determination

Methods and apparatus for alignment of ion beam systems using beam...

Patents Applicationslast 30 patents

SYSTEM USING PIXELATED FARADAY SENSOR

ELECTROSTATIC FILTER PROVIDING REDUCED PARTICLE GENERATION

HIGH-CURRENT ION IMPLANTER AND METHOD FOR CONTROLLING ION BEAM USIN...

Dual Cathode Ion Source

Dual Cathode Ion Source

Ion Beam Quality Control Using A Movable Mass Resolving Device

Dual Cathode Ion Source

TECHNIQUE FOR ION IMPLANTING A TARGET

PLATEN CONTROL

IMPLANT UNIFORMITY CONTROL

TUNING AN ION IMPLANTER FOR OPTIMAL PERFORMANCE

Ion beam contamination determination

Ion beam implant current, spot width and position tuning

Ion implanter optimized scan waveform retention and recovery