Antonius Theodorus Wilhelmus Kempen

Person

Den Bosch, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,846,887
- Issue date Dec 19, 2023
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,340,532
- Issue date May 24, 2022
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation collector, radiation source and lithographic apparatus
- Patent number 9,983,482
- Issue date May 29, 2018
- ASML Netherlands B.V.
- Erik Roelof Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source
- Patent number 9,860,966
- Issue date Jan 2, 2018
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source
- Patent number 9,655,222
- Issue date May 16, 2017
- ASML Netherlands B.V.
- Jeroen Van Den Akker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source and lithographic apparatus
- Patent number 9,510,432
- Issue date Nov 29, 2016
- ASML Netherlands B.V.
- Antonius Theodorus Wilhelmus Kempen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source and lithographic apparatus
- Patent number 9,462,667
- Issue date Oct 4, 2016
- ASML Netherlands B.V.
- Johan Frederik Dijksman
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for generating radiation
- Patent number 9,442,380
- Issue date Sep 13, 2016
- ASML Netherlands B.V.
- Ramin Badie
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multilayer mirror
- Patent number 9,329,503
- Issue date May 3, 2016
- ASML Netherlands B.V.
- Vadim Iourievich Timoshkov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation source
- Patent number 9,192,039
- Issue date Nov 17, 2015
- ASML Netherlands B.V.
- Antonius Theodorus Wilhelmus Kempen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radiation source, lithographic apparatus and device manufacturing m...
- Patent number 9,164,403
- Issue date Oct 20, 2015
- ASML Netherlands B.V.
- Antonius Theodorus Wilhelmus Kempen
- B08 - CLEANING
Information Patent Grant
Radiation source
- Patent number 9,119,280
- Issue date Aug 25, 2015
- ASML Netherlands B.V.
- Antonius Theodorus Wilhelmus Kempen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Collector mirror assembly and method for producing extreme ultravio...
- Patent number 9,013,679
- Issue date Apr 21, 2015
- ASML Netherlands B.V.
- Dzmitry Labetski
- G02 - OPTICS
Information Patent Grant
Radiation source and method for lithographic apparatus for device m...
- Patent number 8,890,099
- Issue date Nov 18, 2014
- ASML Netherlands B.V.
- Ronald Johannes Hultermans
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for applying a material onto a substrate using a droplet pri...
- Patent number 8,865,254
- Issue date Oct 21, 2014
- Nederlandse Organisatie voor Toegepast-Natuurwetenschappelijk Onderzoek TNO
- Antonius T. W. Kempen
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Radiation source, lithographic apparatus and device manufacturing m...
- Patent number 8,685,632
- Issue date Apr 1, 2014
- ASML Netherlands B.V.
- Antonius Theodorus Wilhelmus Kempen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus comprising a magnet, method for the protecti...
- Patent number 8,446,560
- Issue date May 21, 2013
- ASML Netherlands B.V.
- Johannes Hubertus Josephina Moors
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for chemical reduction of an oxidized contamination material...
- Patent number 7,667,820
- Issue date Feb 23, 2010
- ASML Netherlands B.V.
- Antonius Theodorus Wilhelmus Kempen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20240160109
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20220291591
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Controlling a Lithographic System
- Publication number 20220163895
- Publication date May 26, 2022
- ASML Netherlands B,V.
- Oscar Franciscus Jozephus NOORDMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20210109452
- Publication date Apr 15, 2021
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation Collector, Radiation Source and Lithographic Apparatus
- Publication number 20160026091
- Publication date Jan 28, 2016
- ASML NETHERLANDS B.V.
- Erik Roelof LOOPSTRA
- G02 - OPTICS
Information Patent Application
Method and Apparatus for Generating Radiation
- Publication number 20150268559
- Publication date Sep 24, 2015
- ASML NETHERLANDS B.V.
- Ramin Badie
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
RADIATION SOURCE
- Publication number 20150146182
- Publication date May 28, 2015
- ASML NETHERLANDS B.V.
- Jan Bernard Plechelmus Van Schoot
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Radiation Source and Lithographic Apparatus
- Publication number 20150055106
- Publication date Feb 26, 2015
- ASML NETHERLANDS B.V.
- Johan Frederik Dijksman
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Radiation Source and Lithographic Apparatus
- Publication number 20150015863
- Publication date Jan 15, 2015
- ASML Netherland B.V.
- Antonius Theodorus Wilhelmus Kempen
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Radiation Source and Method for Lithographic Apparatus for Device M...
- Publication number 20140209817
- Publication date Jul 31, 2014
- ASML NETHERLANDS B.V.
- Ronald Johannes Hultermans
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Radiation Source
- Publication number 20140203193
- Publication date Jul 24, 2014
- ASML NETHERLANDS B.V.
- Antonius Theodorus Wilhelmus Kempen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
RADIATION SOURCE
- Publication number 20140160453
- Publication date Jun 12, 2014
- ASML NETHERLANDS B.V.
- Antonius Theodorus Wilhelmus Kempen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
COLLECTOR MIRROR ASSEMBLY AND METHOD FOR PRODUCING EXTREME ULTRAVIO...
- Publication number 20130088697
- Publication date Apr 11, 2013
- ASML NETHERLANDS B.V.
- Dzmitry Labetski
- G02 - OPTICS
Information Patent Application
Radiation Source
- Publication number 20130077071
- Publication date Mar 28, 2013
- ASML NETHERLANDS B.V.
- Jeroen VAN DEN AKKER
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Multilayer Mirror
- Publication number 20130057840
- Publication date Mar 7, 2013
- ASML Netherland B.V.
- Vadim Iourievich Timoshkov
- B82 - NANO-TECHNOLOGY
Information Patent Application
Radiation Source, Lithographic Apparatus and Device Manufacturing M...
- Publication number 20120295205
- Publication date Nov 22, 2012
- ASML NETHERLANDS B.V.
- Antonius Theodorus Wilhelmus Kempen
- B08 - CLEANING
Information Patent Application
HYDROGEN RADICAL GENERATOR
- Publication number 20120006258
- Publication date Jan 12, 2012
- ASML NETHERLANDS B.V.
- Gerard Frans Jozef Schasfoort
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING M...
- Publication number 20110143288
- Publication date Jun 16, 2011
- ASML NETHERLANDS B.V.
- Antonius Theodorus Wilhelmus Kempen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS COMPRISING A MAGNET, METHOD FOR THE PROTECTI...
- Publication number 20110013157
- Publication date Jan 20, 2011
- ASML NETHERLANDS B.V.
- Johannes Hubertus Josephina Moors
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for removal of a deposition from an optical element, lithogr...
- Publication number 20090025750
- Publication date Jan 29, 2009
- ASML NETHERLANDS B.V.
- Maarten Marinus Wilhelmus Van Herpen
- B08 - CLEANING
Information Patent Application
Removal of deposition on an element of a lithographic apparatus
- Publication number 20080218709
- Publication date Sep 11, 2008
- ASML NETHERLANDS B.V.
- Roland Edward Van Vliet
- B08 - CLEANING
Information Patent Application
Method For Applying A Material Onto A Substrate Using A Droplet Pri...
- Publication number 20080193641
- Publication date Aug 14, 2008
- NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETEN
- Antonius T.W. Kempen
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Method for chemical reduction of an oxidized contamination material...
- Publication number 20070166215
- Publication date Jul 19, 2007
- ASML NETHERLANDS B.V.
- Antonius Theodorus Wilhelmus Kempen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Antonius Theodorus Wilhelmus Kempen

Person

Patents Grantslast 30 patents

Prolonging optical element lifetime in an EUV lithography system

Prolonging optical element lifetime in an EUV lithography system

Radiation collector, radiation source and lithographic apparatus

Radiation source

Radiation source

Radiation source and lithographic apparatus

Radiation source and lithographic apparatus

Method and apparatus for generating radiation

Multilayer mirror

Radiation source

Radiation source, lithographic apparatus and device manufacturing m...

Radiation source

Collector mirror assembly and method for producing extreme ultravio...

Radiation source and method for lithographic apparatus for device m...

Method for applying a material onto a substrate using a droplet pri...

Radiation source, lithographic apparatus and device manufacturing m...

Lithographic apparatus comprising a magnet, method for the protecti...

Method for chemical reduction of an oxidized contamination material...

Patents Applicationslast 30 patents

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

Method for Controlling a Lithographic System

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

Radiation Collector, Radiation Source and Lithographic Apparatus

Method and Apparatus for Generating Radiation

RADIATION SOURCE

Radiation Source and Lithographic Apparatus

Radiation Source and Lithographic Apparatus

Radiation Source and Method for Lithographic Apparatus for Device M...

Radiation Source

RADIATION SOURCE

COLLECTOR MIRROR ASSEMBLY AND METHOD FOR PRODUCING EXTREME ULTRAVIO...

Radiation Source

Multilayer Mirror

Radiation Source, Lithographic Apparatus and Device Manufacturing M...

HYDROGEN RADICAL GENERATOR

RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING M...

LITHOGRAPHIC APPARATUS COMPRISING A MAGNET, METHOD FOR THE PROTECTI...

Method for removal of a deposition from an optical element, lithogr...

Removal of deposition on an element of a lithographic apparatus

Method For Applying A Material Onto A Substrate Using A Droplet Pri...

Method for chemical reduction of an oxidized contamination material...