Anuja E. DeSilva

Person

Slingerlands, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Alternating hardmasks for tight-pitch line formation
- Patent number 11,171,002
- Issue date Nov 9, 2021
- Tessera, Inc.
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating hardmasks for tight-pitch line formation
- Patent number 10,580,652
- Issue date Mar 3, 2020
- Tessera, Inc.
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist having tuned interface hardmask layer for EUV exposure
- Patent number 10,141,188
- Issue date Nov 27, 2018
- International Business Machines Corporation
- Michael P Belyansky
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Resist having tuned interface hardmask layer for EUV exposure
- Patent number 10,134,592
- Issue date Nov 20, 2018
- International Business Machines Corporation
- Michael P Belyansky
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Alternating hardmasks for tight-pitch line formation
- Patent number 10,103,022
- Issue date Oct 16, 2018
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist having tuned interface hardmask layer for EUV exposure
- Patent number 9,929,012
- Issue date Mar 27, 2018
- International Business Machines Corporation
- Michael P Belyansky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self aligned conductive lines
- Patent number 9,911,647
- Issue date Mar 6, 2018
- International Business Machines Corporation
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self aligned conductive lines
- Patent number 9,786,554
- Issue date Oct 10, 2017
- International Business Machines Corporation
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION
- Publication number 20200266066
- Publication date Aug 20, 2020
- Tessera, Inc.
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION
- Publication number 20180350600
- Publication date Dec 6, 2018
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION
- Publication number 20180269060
- Publication date Sep 20, 2018
- International Business Machines Corporation
- John C. Arnold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Resist Having Tuned Interface Hardmask Layer For EUV Exposure
- Publication number 20180166277
- Publication date Jun 14, 2018
- International Business Machines Corporation
- Michael P. Belyansky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Resist Having Tuned Interface Hardmask Layer For EUV Exposure
- Publication number 20180166278
- Publication date Jun 14, 2018
- International Business Machines Corporation
- Michael P. Belyansky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF ALIGNED CONDUCTIVE LINES
- Publication number 20170358487
- Publication date Dec 14, 2017
- International Business Machines Corporation
- Sean D. Burns
- H01 - BASIC ELECTRIC ELEMENTS

Anuja E. DeSilva

Person

Patents Grantslast 30 patents

Alternating hardmasks for tight-pitch line formation

Alternating hardmasks for tight-pitch line formation

Resist having tuned interface hardmask layer for EUV exposure

Resist having tuned interface hardmask layer for EUV exposure

Alternating hardmasks for tight-pitch line formation

Resist having tuned interface hardmask layer for EUV exposure

Self aligned conductive lines

Self aligned conductive lines

Patents Applicationslast 30 patents

ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION

ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION

ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION

Resist Having Tuned Interface Hardmask Layer For EUV Exposure

Resist Having Tuned Interface Hardmask Layer For EUV Exposure

SELF ALIGNED CONDUCTIVE LINES