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Anwei Liu
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Fremont, CA, US
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last 30 patents
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Patent Grant
Method for double patterning lithography
Patent number
7,913,197
Issue date
Mar 22, 2011
Cadence Design Systems, Inc.
Michiel Victor Paul Kruger
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method and system for reticle-wide hierarchy management for represe...
Patent number
7,401,319
Issue date
Jul 15, 2008
Invarium, Inc.
Chi-Song Horng
G06 - COMPUTING CALCULATING COUNTING
Patents Applications
last 30 patents
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Patent Application
Method and system for reticle-wide hierarchy management for represe...
Publication number
20060143589
Publication date
Jun 29, 2006
Invarium, Inc.
Chi-Song Horng
G06 - COMPUTING CALCULATING COUNTING