Arie Jeffrey DEN BOEF

Person

Waalre, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Illumination and detection apparatus for a metrology apparatus
- Patent number 12,158,435
- Issue date Dec 3, 2024
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for overlay metrology and apparatus thereof
- Patent number 12,130,246
- Issue date Oct 29, 2024
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Detection apparatus for simultaneous acquisition of multiple divers...
- Patent number 12,086,973
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Teunis Willem Tukker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
On chip sensor for wafer overlay measurement
- Patent number 12,066,762
- Issue date Aug 20, 2024
- ASML Holding N.V. & ASML Netherlands B.V.
- Mohamed Swillam
- G02 - OPTICS
Information Patent Grant
Computational wafer inspection
- Patent number 12,067,340
- Issue date Aug 20, 2024
- ASML Netherlands B.V.
- Christophe David Fouquet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for determining information about a target structure
- Patent number 12,061,421
- Issue date Aug 13, 2024
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method
- Patent number 12,013,647
- Issue date Jun 18, 2024
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,007,700
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Diffraction based overlay metrology tool and method of diffraction...
- Patent number 11,953,450
- Issue date Apr 9, 2024
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,947,269
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology apparatus
- Patent number 11,940,739
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 11,828,585
- Issue date Nov 28, 2023
- ASML Netherlands B.V.
- Henricus Petrus Maria Pellemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus and a method of determining a characteristic of...
- Patent number 11,822,254
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology device and phase modulator apparatus therefor comprising...
- Patent number 11,815,675
- Issue date Nov 14, 2023
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase modulators in alignment to decrease mark size
- Patent number 11,803,130
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Recipe selection based on inter-recipe consistency
- Patent number 11,703,772
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,650,047
- Issue date May 16, 2023
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diffraction based overlay metrology tool and method of diffraction...
- Patent number 11,644,428
- Issue date May 9, 2023
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, computer product and system
- Patent number 11,640,116
- Issue date May 2, 2023
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diffraction based overlay metrology tool and method of diffraction...
- Patent number 11,619,595
- Issue date Apr 4, 2023
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus
- Patent number 11,549,806
- Issue date Jan 10, 2023
- ASML Netherland B.V.
- Marinus Johannes Maria Van Dam
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for angular-resolved spectroscopic lithography...
- Patent number 11,525,786
- Issue date Dec 13, 2022
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,428,521
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for illumination adjustment
- Patent number 11,429,029
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 11,415,900
- Issue date Aug 16, 2022
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, patterning device, apparatus and computer program
- Patent number 11,385,553
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Position sensor
- Patent number 11,333,985
- Issue date May 17, 2022
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus and a method of determining a characteristic of...
- Patent number 11,327,410
- Issue date May 10, 2022
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring a process parameter for a manufacturing process involving...
- Patent number 11,320,745
- Issue date May 3, 2022
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 11,307,024
- Issue date Apr 19, 2022
- ASML Netherlands B.V.
- Henricus Petrus Maria Pellemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DETECTION APPARATUS FOR SIMULTANEOUS ACQUISITION OF MULTIPLE DIVERS...
- Publication number 20240404036
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Teunis Willem TUKKER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPUTATIONAL WAFER INSPECTION
- Publication number 20240403537
- Publication date Dec 5, 2024
- ASML NETHERLANDS B.V.
- Christophe David FOUQUET
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20240361702
- Publication date Oct 31, 2024
- ASML NETHERLANDS B.V.
- Anagnostis Tsiatmas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...
- Publication number 20240319620
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
Metrology Apparatus
- Publication number 20240184218
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY METHOD
- Publication number 20240160151
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Willem Marie Julia Marcel COENE
- G02 - OPTICS
Information Patent Application
A METROLOGY APPARATUS AND A METROLOGY METHOD
- Publication number 20240061348
- Publication date Feb 22, 2024
- ASML NETHERLANDS B.V.
- Jeroen Arnoldus Leonardus Johannes RAAYMAKERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPH...
- Publication number 20240044639
- Publication date Feb 8, 2024
- ASML NETHERLANDS B.V.
- Henricus Petrus Maria PELLEMANS
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM
- Publication number 20240027918
- Publication date Jan 25, 2024
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD FOR MEASURING AN ETCHED TRENCH AND ASSOCIATED METR...
- Publication number 20240012339
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GE...
- Publication number 20240003809
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Peter Michael KRAUS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY APPARATUS BASED ON HIGH HARMONIC GENERATION AND ASSOCIATE...
- Publication number 20240004312
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Peter Michael KRAUS
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Metrology Apparatus and a Method of Determining a Characteristic of...
- Publication number 20230393490
- Publication date Dec 7, 2023
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY TOOL WITH POSITION CONTROL OF PROJECTION SYSTEM
- Publication number 20230359127
- Publication date Nov 9, 2023
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DARK FIELD DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY...
- Publication number 20230341813
- Publication date Oct 26, 2023
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION APPARATUS AND ASSOCIATED METROLOGY AND LITHOGRAPHIC AP...
- Publication number 20230229094
- Publication date Jul 20, 2023
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G02 - OPTICS
Information Patent Application
Diffraction Based Overlay Metrology Tool and Method of Diffraction...
- Publication number 20230075781
- Publication date Mar 9, 2023
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology System and Method for Determining a Characteristic of One...
- Publication number 20230062585
- Publication date Mar 2, 2023
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
DARK FIELD DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY...
- Publication number 20230044632
- Publication date Feb 9, 2023
- ASML NETHERLANDS B.V.
- Willem Marie Julia Marcel COENE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20230016664
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
PHASE MODULATORS IN ALIGNMENT TO DECREASE MARK SIZE
- Publication number 20220397833
- Publication date Dec 15, 2022
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEMS, COHERENCE SCRAMBLER ILLUMINATION SOURCES AND MET...
- Publication number 20220342228
- Publication date Oct 27, 2022
- ASML NETHERLANDS B.V.
- Irwan Dani SETIJA
- G02 - OPTICS
Information Patent Application
METROLOGY DEVICE AND PHASE MODULATOR APPARATUS THEREFOR
- Publication number 20220299751
- Publication date Sep 22, 2022
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ON CHIP SENSOR FOR WAFER OVERLAY MEASUREMENT
- Publication number 20220283516
- Publication date Sep 8, 2022
- ASML Holding N.V.
- Mohamed SWILLAM
- G02 - OPTICS
Information Patent Application
ILLUMINATION AND DETECTION APPARATUS FOR A METROLOGY APPARATUS
- Publication number 20220276180
- Publication date Sep 1, 2022
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING INFORMATION ABOUT A TARGET STRUCTURE
- Publication number 20220276569
- Publication date Sep 1, 2022
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection Method and Apparatus, Lithographic Apparatus, Lithograph...
- Publication number 20220196393
- Publication date Jun 23, 2022
- Henricus Petrus Maria PELLEMANS
- G01 - MEASURING TESTING
Information Patent Application
DETECTION APPARATUS FOR SIMULTANEOUS ACQUISITION OF MULTIPLE DIVERS...
- Publication number 20220172347
- Publication date Jun 2, 2022
- ASML NETHERLANDS B.V.
- Teunis Willem TUKKER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY APPARATUS
- Publication number 20220121127
- Publication date Apr 21, 2022
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OVERLAY METROLOGY AND APPARATUS THEREOF
- Publication number 20220074875
- Publication date Mar 10, 2022
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G06 - COMPUTING CALCULATING COUNTING

Arie Jeffrey DEN BOEF

Person

Patents Grantslast 30 patents

Illumination and detection apparatus for a metrology apparatus

Method for overlay metrology and apparatus thereof

Detection apparatus for simultaneous acquisition of multiple divers...

On chip sensor for wafer overlay measurement

Computational wafer inspection

Method and system for determining information about a target structure

Metrology method

Metrology system and method for determining a characteristic of one...

Diffraction based overlay metrology tool and method of diffraction...

Method and apparatus to determine a patterning process parameter

Metrology apparatus

Inspection method and apparatus, lithographic apparatus, lithograph...

Metrology apparatus and a method of determining a characteristic of...

Metrology device and phase modulator apparatus therefor comprising...

Phase modulators in alignment to decrease mark size

Recipe selection based on inter-recipe consistency

Metrology apparatus and method for determining a characteristic of...

Diffraction based overlay metrology tool and method of diffraction...

Metrology method, computer product and system

Diffraction based overlay metrology tool and method of diffraction...

Metrology apparatus

Method and apparatus for angular-resolved spectroscopic lithography...

Metrology method, target and substrate

Method and apparatus for illumination adjustment

Metrology system and method for determining a characteristic of one...

Metrology method, patterning device, apparatus and computer program

Position sensor

Metrology apparatus and a method of determining a characteristic of...

Measuring a process parameter for a manufacturing process involving...

Inspection method and apparatus, lithographic apparatus, lithograph...

Patents Applicationslast 30 patents

DETECTION APPARATUS FOR SIMULTANEOUS ACQUISITION OF MULTIPLE DIVERS...

COMPUTATIONAL WAFER INSPECTION

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...

Metrology Apparatus

DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY METHOD

A METROLOGY APPARATUS AND A METROLOGY METHOD

INSPECTION METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPH...

METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM

METROLOGY METHOD FOR MEASURING AN ETCHED TRENCH AND ASSOCIATED METR...

METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GE...

METROLOGY APPARATUS BASED ON HIGH HARMONIC GENERATION AND ASSOCIATE...

Metrology Apparatus and a Method of Determining a Characteristic of...

METROLOGY TOOL WITH POSITION CONTROL OF PROJECTION SYSTEM

DARK FIELD DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY...

ILLUMINATION APPARATUS AND ASSOCIATED METROLOGY AND LITHOGRAPHIC AP...

Diffraction Based Overlay Metrology Tool and Method of Diffraction...

Metrology System and Method for Determining a Characteristic of One...

DARK FIELD DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY...

METROLOGY METHOD, TARGET AND SUBSTRATE

PHASE MODULATORS IN ALIGNMENT TO DECREASE MARK SIZE

METROLOGY SYSTEMS, COHERENCE SCRAMBLER ILLUMINATION SOURCES AND MET...

METROLOGY DEVICE AND PHASE MODULATOR APPARATUS THEREFOR

ON CHIP SENSOR FOR WAFER OVERLAY MEASUREMENT

ILLUMINATION AND DETECTION APPARATUS FOR A METROLOGY APPARATUS

METHOD AND SYSTEM FOR DETERMINING INFORMATION ABOUT A TARGET STRUCTURE

Inspection Method and Apparatus, Lithographic Apparatus, Lithograph...

DETECTION APPARATUS FOR SIMULTANEOUS ACQUISITION OF MULTIPLE DIVERS...

METROLOGY APPARATUS

METHOD FOR OVERLAY METROLOGY AND APPARATUS THEREOF