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Arie Jeffrey Maria Den Boef
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Waalre, NL
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last 30 patents
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Patent Application
Inspection method and apparatus, lithographic apparatus, lithograph...
Publication number
20080037134
Publication date
Feb 14, 2008
ASML NETHERLANDS B.V.
Arie Jeffrey Maria Den Boef
G02 - OPTICS
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Patent Application
Optical metrology system and metrology mark characterization device
Publication number
20070153275
Publication date
Jul 5, 2007
ASML NETHERLANDS B.V.
Nicolaas Petrus Van Der Aa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY