Armand Eugene Albert KOOLEN

Person

Nuth, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,007,700
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 11,415,900
- Issue date Aug 16, 2022
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring a parameter of a patterning process, metrology...
- Patent number 11,150,563
- Issue date Oct 19, 2021
- ASML Netherlands B.V.
- Sergei Sokolov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring a parameter of a lithographic process, metrolog...
- Patent number 11,099,489
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Hugo Augustinus Joseph Cramer
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for measuring a parameter of interest using im...
- Patent number 10,983,445
- Issue date Apr 20, 2021
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus, lithographic system, and method of measuring a...
- Patent number 10,895,812
- Issue date Jan 19, 2021
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and device
- Patent number 10,866,526
- Issue date Dec 15, 2020
- ASML Holding N.V.
- Yevgeniy Konstantinovich Shmarev
- G01 - MEASURING TESTING
Information Patent Grant
Variable corrector of a wave front
- Patent number 10,852,247
- Issue date Dec 1, 2020
- ASML Holding N.V.
- Stanislav Smirnov
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 10,816,909
- Issue date Oct 27, 2020
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, computer program and lithographic s...
- Patent number 10,788,757
- Issue date Sep 29, 2020
- ASML Netherlands B.V.
- Su-Ting Cheng
- G01 - MEASURING TESTING
Information Patent Grant
Radiation receiving system
- Patent number 10,678,145
- Issue date Jun 9, 2020
- ASML Netherlands B.V.
- Alessandro Polo
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus, lithographic system, and method of measuring a...
- Patent number 10,599,047
- Issue date Mar 24, 2020
- ASML Netherlands B.V.
- Janneke Ravensbergen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus, method of measuring a structure, device manufa...
- Patent number 10,599,048
- Issue date Mar 24, 2020
- ASML Netherlands B.V.
- Sergey Tarabrin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, apparatus and computer program
- Patent number 10,598,483
- Issue date Mar 24, 2020
- ASML Netherlands B.V.
- Sergey Tarabrin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus control arrangement and method
- Patent number 10,551,308
- Issue date Feb 4, 2020
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G01 - MEASURING TESTING
Information Patent Grant
Beam homogenizer, illumination system and metrology system
- Patent number 10,495,889
- Issue date Dec 3, 2019
- ASML Netherlands B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, computer program and lithographic s...
- Patent number 10,423,077
- Issue date Sep 24, 2019
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Method for monitoring a characteristic of illumination from a metro...
- Patent number 10,317,805
- Issue date Jun 11, 2019
- ASML Netherlands B.V.
- Jolanda Theodora Josephina Schmetz-Schagen
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus, computer program and lithographic s...
- Patent number 10,191,391
- Issue date Jan 29, 2019
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for focusing in an inspection system
- Patent number 10,107,761
- Issue date Oct 23, 2018
- ASML Netherlands B.V.
- Yevgeniy Konstantinovich Shmarev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, substrate, lithographic system and...
- Patent number 9,811,003
- Issue date Nov 7, 2017
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, substrate, lithographic system and...
- Patent number 9,535,338
- Issue date Jan 3, 2017
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus, and device manufacturing method
- Patent number 9,158,194
- Issue date Oct 13, 2015
- ASML Netherlands B.V.
- Armand Eugene Albert Koolen
- G01 - MEASURING TESTING
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 8,497,975
- Issue date Jul 30, 2013
- ASML Netherlands B.V.
- Johannes Matheus Marie De Wit
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus, lithographic apparatus, device manu...
- Patent number 8,411,287
- Issue date Apr 2, 2013
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...
- Publication number 20240319620
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY TOOL CALIBRATION METHOD AND ASSOCIATED METROLOGY TOOL
- Publication number 20240184215
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Jin LIAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF METROLOGY AND ASSOCIATED APPARATUSES
- Publication number 20240036484
- Publication date Feb 1, 2024
- ASML NETHERLANDS B.V.
- Timothy Dugan DAVIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...
- Publication number 20240036480
- Publication date Feb 1, 2024
- ASML NETHERLANDS B.V.
- Armand Eugene Albert KOOLEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...
- Publication number 20230176491
- Publication date Jun 8, 2023
- ASML NETHERLANDS B.V.
- Olger Victor ZWIER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology System and Method for Determining a Characteristic of One...
- Publication number 20230062585
- Publication date Mar 2, 2023
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
Metrology System and Method For Determining a Characteristic of one...
- Publication number 20210003924
- Publication date Jan 7, 2021
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MEASURING A PARAMETER OF A PATTERNING PROCESS, METROLOGY...
- Publication number 20200192230
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Sergei SOKOLOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Measuring a Parameter of a Lithographic Process, Metrolog...
- Publication number 20200192231
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph CRAMER
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method and Apparatus, Computer Program and Lithographic S...
- Publication number 20190317413
- Publication date Oct 17, 2019
- ASML NETHERLANDS B.V.
- Su-Ting CHENG
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method and Apparatus, Computer Program and Lithographic S...
- Publication number 20190146356
- Publication date May 16, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus, Method of Measuring a Structure, Device Manufa...
- Publication number 20190129315
- Publication date May 2, 2019
- ASML NETHERLANDS B.V.
- Sergey Tarabrin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology System and Method For Determining a Characteristic of One...
- Publication number 20190107781
- Publication date Apr 11, 2019
- Stichting VU
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND DEVICE
- Publication number 20190094702
- Publication date Mar 28, 2019
- ASML NETHERLANDS B.V.
- Yevgeniy Konstantinovich Shmarev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus, Lithographic System, And Method Of Measuring A...
- Publication number 20180348645
- Publication date Dec 6, 2018
- ASML NETHERLANDS B.V.
- Janneke Ravensbergen
- G01 - MEASURING TESTING
Information Patent Application
RADIATION RECEIVING SYSTEM
- Publication number 20180292757
- Publication date Oct 11, 2018
- ASML NETHERLANDS B.V.
- Alessandro POLO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Monitoring a Characteristic of Illumination From a Metro...
- Publication number 20180173113
- Publication date Jun 21, 2018
- ASML NETHERLANDS B.V.
- Jolanda Theodora Josephina SCHMETZ-SCHAGEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus, Lithographic System, and Method of Measuring a...
- Publication number 20180173111
- Publication date Jun 21, 2018
- ASML NETHERLANDS B.V.
- Nitesh Pandey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology Method, Apparatus and Computer Program
- Publication number 20180073866
- Publication date Mar 15, 2018
- ASML NETHERLANDS B.V.
- Sergey Tarabrin
- G01 - MEASURING TESTING
Information Patent Application
VARIABLE CORRECTOR OF A WAVE FRONT
- Publication number 20180045657
- Publication date Feb 15, 2018
- ASML Holding N.V.
- Stanislav SMIRNOV
- G01 - MEASURING TESTING
Information Patent Application
Beam Homogenizer, Illumination System and Metrology System
- Publication number 20170248794
- Publication date Aug 31, 2017
- ASML NETHERLANDS B.V.
- Markus Franciscus Antonius EURLINGS
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR FOCUSING IN AN INSPECTION SYSTEM
- Publication number 20170191944
- Publication date Jul 6, 2017
- ASML Holding N.V.
- Yevgeniy Konstantinovich SHMAREV
- G01 - MEASURING TESTING
Information Patent Application
FOCUS CONTROL ARRANGEMENT AND METHOD
- Publication number 20170176328
- Publication date Jun 22, 2017
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method and Apparatus, Computer Program and Lithographic S...
- Publication number 20170097575
- Publication date Apr 6, 2017
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G01 - MEASURING TESTING
Information Patent Application
Metrology Method and Apparatus, Substrate, Lithographic System and...
- Publication number 20170068173
- Publication date Mar 9, 2017
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Method and Apparatus, Substrate, Lithographic System and...
- Publication number 20150138523
- Publication date May 21, 2015
- ASML Netherland B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Method and Apparatus, and Device Manufacturing Method
- Publication number 20130100427
- Publication date Apr 25, 2013
- ASML NETHERLANDS B.V.
- Armand Eugene Albert KOOLEN
- G01 - MEASURING TESTING
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20040257547
- Publication date Dec 23, 2004
- ASML NETHERLANDS B.V.
- Armand Eugene Albert Koolen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for determining parameters for lithographic projection, a co...
- Publication number 20040137343
- Publication date Jul 15, 2004
- ASML NETHERLANDS B.V.
- Markus Franciscus Antonius Eurlings
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20040114123
- Publication date Jun 17, 2004
- ASML NETHERLANDS B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Armand Eugene Albert KOOLEN

Person

Patents Grantslast 30 patents

Metrology system and method for determining a characteristic of one...

Metrology system and method for determining a characteristic of one...

Method of measuring a parameter of a patterning process, metrology...

Method of measuring a parameter of a lithographic process, metrolog...

Method and apparatus for measuring a parameter of interest using im...

Metrology apparatus, lithographic system, and method of measuring a...

Metrology method and device

Variable corrector of a wave front

Metrology system and method for determining a characteristic of one...

Metrology method and apparatus, computer program and lithographic s...

Radiation receiving system

Metrology apparatus, lithographic system, and method of measuring a...

Metrology apparatus, method of measuring a structure, device manufa...

Metrology method, apparatus and computer program

Focus control arrangement and method

Beam homogenizer, illumination system and metrology system

Metrology method and apparatus, computer program and lithographic s...

Method for monitoring a characteristic of illumination from a metro...

Metrology method and apparatus, computer program and lithographic s...

Method and device for focusing in an inspection system

Metrology method and apparatus, substrate, lithographic system and...

Metrology method and apparatus, substrate, lithographic system and...

Metrology method and apparatus, and device manufacturing method

Inspection method and apparatus, lithographic apparatus, lithograph...

Metrology method and apparatus, lithographic apparatus, device manu...

Patents Applicationslast 30 patents

METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...

METROLOGY TOOL CALIBRATION METHOD AND ASSOCIATED METROLOGY TOOL

METHOD OF METROLOGY AND ASSOCIATED APPARATUSES

A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...

A SUBSTRATE COMPRISING A TARGET ARRANGEMENT, AND ASSOCIATED AT LEAS...

Metrology System and Method for Determining a Characteristic of One...

Metrology System and Method For Determining a Characteristic of one...

METHOD OF MEASURING A PARAMETER OF A PATTERNING PROCESS, METROLOGY...

Method of Measuring a Parameter of a Lithographic Process, Metrolog...

Metrology Method and Apparatus, Computer Program and Lithographic S...

Metrology Method and Apparatus, Computer Program and Lithographic S...

Metrology Apparatus, Method of Measuring a Structure, Device Manufa...

Metrology System and Method For Determining a Characteristic of One...

METROLOGY METHOD AND DEVICE

Metrology Apparatus, Lithographic System, And Method Of Measuring A...

RADIATION RECEIVING SYSTEM

Method for Monitoring a Characteristic of Illumination From a Metro...

Metrology Apparatus, Lithographic System, and Method of Measuring a...

Metrology Method, Apparatus and Computer Program

VARIABLE CORRECTOR OF A WAVE FRONT

Beam Homogenizer, Illumination System and Metrology System

METHOD AND DEVICE FOR FOCUSING IN AN INSPECTION SYSTEM

FOCUS CONTROL ARRANGEMENT AND METHOD

Metrology Method and Apparatus, Computer Program and Lithographic S...

Metrology Method and Apparatus, Substrate, Lithographic System and...

Metrology Method and Apparatus, Substrate, Lithographic System and...

Metrology Method and Apparatus, and Device Manufacturing Method

Lithographic apparatus and device manufacturing method

Method for determining parameters for lithographic projection, a co...

Lithographic apparatus and device manufacturing method