Armin Semmler

Person

Muenchen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing a mask layout avoiding imaging errors for a mask
- Patent number 7,346,885
- Issue date Mar 18, 2008
- Qimonda AG
- Armin Semmler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method of structuring a photoresist by double exposur...
- Patent number 7,011,936
- Issue date Mar 14, 2006
- Infineon Technologies AG
- Christoph Nölscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask with repaired dummy structure and method of repairing...
- Patent number 6,756,164
- Issue date Jun 29, 2004
- Infineon Technologies AG
- Torsten Franke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Generating mask layout data for simulation of lithographic processes
- Patent number 6,631,511
- Issue date Oct 7, 2003
- Infineon Technologies AG
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method for optimizing the geometry of structural elements of a circ...
- Publication number 20060190850
- Publication date Aug 24, 2006
- Roderick Kohle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing a mask layout avoiding imaging errors for a mask
- Publication number 20060183028
- Publication date Aug 17, 2006
- Christian Meyne
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing a mask layout avoiding imaging errors for a mask
- Publication number 20060070018
- Publication date Mar 30, 2006
- Armin Semmler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing a mask layout avoiding imaging errors for a mask
- Publication number 20050125764
- Publication date Jun 9, 2005
- Armin Semmler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing for a mask a mask layout which avoids aberrations
- Publication number 20050120326
- Publication date Jun 2, 2005
- Infineon Technolgies AG
- Armin Semmler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and method of structuring a photoresist by double exposur...
- Publication number 20030143470
- Publication date Jul 31, 2003
- Christoph Nolscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure mask with repaired dummy structure and method of repairing...
- Publication number 20030003377
- Publication date Jan 2, 2003
- Torsten Franke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Generating mask layout data for simulation of lithographic processes
- Publication number 20020083408
- Publication date Jun 27, 2002
- Henning Haffner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Armin Semmler

Person

Patents Grantslast 30 patents

Method for producing a mask layout avoiding imaging errors for a mask

Photomask and method of structuring a photoresist by double exposur...

Exposure mask with repaired dummy structure and method of repairing...

Generating mask layout data for simulation of lithographic processes

Patents Applicationslast 30 patents

Method for optimizing the geometry of structural elements of a circ...

Method for producing a mask layout avoiding imaging errors for a mask

Method for producing a mask layout avoiding imaging errors for a mask

Method for producing a mask layout avoiding imaging errors for a mask

Method for producing for a mask a mask layout which avoids aberrations

Photomask and method of structuring a photoresist by double exposur...

Exposure mask with repaired dummy structure and method of repairing...

Generating mask layout data for simulation of lithographic processes