Arnoldus Jan Storm

Person

Delft, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Optical element and optical system for EUV lithography, and method...
- Patent number 10,690,812
- Issue date Jun 23, 2020
- Carl Zeiss SMT GmbH
- Hermanus Hendricus Petrus Theodorus Bekman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Particle cleaning of optical elements for microlithography
- Patent number 8,477,285
- Issue date Jul 2, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical arrangement and EUV lithography device with at least one he...
- Patent number 7,959,310
- Issue date Jun 14, 2011
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL USED...
- Publication number 20240319621
- Publication date Sep 26, 2024
- Carl Zeiss SMT GMBH
- Moritz BECKER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD...
- Publication number 20160187543
- Publication date Jun 30, 2016
- Carl Zeiss SMT GMBH
- Hermanus Hendricus Petrus Theodorus BEKMAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HYDROGEN RADICAL GENERATOR
- Publication number 20120006258
- Publication date Jan 12, 2012
- ASML NETHERLANDS B.V.
- Gerard Frans Jozef Schasfoort
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PARTICLE CLEANING OF OPTICAL ELEMENTS FOR MICROLITHOGRAPHY
- Publication number 20110188011
- Publication date Aug 4, 2011
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic apparatus and method
- Publication number 20080151201
- Publication date Jun 26, 2008
- ASML NETHERLANDS B.V.
- Arnoldus Jan Storm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ARRANGEMENT AND EUV LITHOGRAPHY DEVICE WITH AT LEAST ONE HE...
- Publication number 20080143981
- Publication date Jun 19, 2008
- Carl Zeis SMT AG
- Dirk Heinrich EHM
- B82 - NANO-TECHNOLOGY

Arnoldus Jan Storm

Person

Patents Grantslast 30 patents

Optical element and optical system for EUV lithography, and method...

Particle cleaning of optical elements for microlithography

Optical arrangement and EUV lithography device with at least one he...

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL USED...

OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD...

HYDROGEN RADICAL GENERATOR

PARTICLE CLEANING OF OPTICAL ELEMENTS FOR MICROLITHOGRAPHY

Lithographic apparatus and method

OPTICAL ARRANGEMENT AND EUV LITHOGRAPHY DEVICE WITH AT LEAST ONE HE...