Arthur HOTZEL

Person

Dresden, DE

People

Patents Grantslast 30 patents

Information Patent Grant
In-situ contactless monitoring of photomask pellicle degradation
- Patent number 10,161,915
- Issue date Dec 25, 2018
- Globalfoundries
- Remi Riviere
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods, apparatus, and systems for minimizing defectivity in top-c...
- Patent number 9,798,244
- Issue date Oct 24, 2017
- GLOBALFOUNDRIES Inc.
- Arthur Hotzel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, re...
- Patent number 9,798,238
- Issue date Oct 24, 2017
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Guo Xiang Ning
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods including a processing of wafers and spin coating tool
- Patent number 9,653,367
- Issue date May 16, 2017
- GLOBALFOUNDRIES Inc.
- Torsten Maehr
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, re...
- Patent number 9,341,961
- Issue date May 17, 2016
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Guo Xiang Ning
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Asymmetric reticle heating of multilayer reticles eliminated by dum...
- Patent number 9,091,943
- Issue date Jul 28, 2015
- GLOBALFOUNDRIES Inc.
- Arthur Hotzel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle defect correction by second exposure
- Patent number 9,075,934
- Issue date Jul 7, 2015
- GLOBALFOUNDRIES Inc.
- Arthur Hotzel
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Reticle defect correction by second exposure
- Patent number 9,005,882
- Issue date Apr 14, 2015
- GLOBALFOUNDRIES Inc.
- Arthur Hotzel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle defect correction by second exposure
- Patent number 8,785,112
- Issue date Jul 22, 2014
- Global Foundries Inc.
- Arthur Hotzel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mechanical fixture of pellicle to lithographic photomask
- Patent number 8,681,310
- Issue date Mar 25, 2014
- GLOBALFOUNDRIES Inc.
- Arthur Hotzel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic CD correction by second exposure
- Patent number 8,574,795
- Issue date Nov 5, 2013
- GLOBALFOUNDRIES Inc.
- Arthur Hotzel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic CD correction by second exposure
- Patent number 8,551,677
- Issue date Oct 8, 2013
- GLOBALFOUNDRIES Inc.
- Arthur Hotzel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vapor clean for haze and particle removal from lithographic photomasks
- Patent number 8,518,189
- Issue date Aug 27, 2013
- GLOBALFOUNDRIES Inc.
- Arthur Hotzel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHODS, APPARATUS, AND SYSTEMS FOR MINIMIZING DEFECTIVITY IN TOP-C...
- Publication number 20170139330
- Publication date May 18, 2017
- GLOBALFOUNDRIES INC.
- Arthur HOTZEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IN-SITU CONTACTLESS MONITORING OF PHOTOMASK PELLICLE DEGRADATION
- Publication number 20170122913
- Publication date May 4, 2017
- GLOBALFOUNDRIES INC.
- Remi RIVIERE
- G01 - MEASURING TESTING
Information Patent Application
METHODS INCLUDING A PROCESSING OF WAFERS AND SPIN COATING TOOL
- Publication number 20160379900
- Publication date Dec 29, 2016
- GLOBALFOUNDRIES INC.
- Torsten Maehr
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CROSS TECHNOLOGY RETICLE (CTR) OR MULTI-LAYER RETICLE (MLR) CDU, RE...
- Publication number 20160179006
- Publication date Jun 23, 2016
- GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Guo Xiang NING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CROSS TECHNOLOGY RETICLE (CTR) OR MULTI-LAYER RETICLE (MLR) CDU, RE...
- Publication number 20140268090
- Publication date Sep 18, 2014
- GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Guo Xiang NING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE DEFECT CORRECTION BY SECOND EXPOSURE
- Publication number 20140247438
- Publication date Sep 4, 2014
- GLOBALFOUNDRIES INC.
- Arthur Hotzel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ASYMMETRIC RETICLE HEATING OF MULTILAYER RETICLES ELIMINATED BY DUM...
- Publication number 20140185030
- Publication date Jul 3, 2014
- GLOBALFOUNDRIES INC.
- Arthur HOTZEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE DEFECT CORRECTION BY SECOND EXPOSURE
- Publication number 20130198697
- Publication date Aug 1, 2013
- GLOBALFOUNDRIES INC.
- Arthur HOTZEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHIC CD CORRECTION BY SECOND EXPOSURE
- Publication number 20130078558
- Publication date Mar 28, 2013
- GLOBALFOUNDRIES INC.
- Arthur Hotzel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC CD CORRECTION BY SECOND EXPOSURE
- Publication number 20130078557
- Publication date Mar 28, 2013
- GLOBALFOUNDRIES INC.
- Arthur Hotzel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE DEFECT CORRECTION BY SECOND EXPOSURE
- Publication number 20130078746
- Publication date Mar 28, 2013
- GLOBALFOUNDRIES INC.
- Arthur Hotzel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MECHANICAL FIXTURE OF PELLICLE TO LITHOGRAPHIC PHOTOMASK
- Publication number 20120140199
- Publication date Jun 7, 2012
- GLOBALFOUNDRIES INC.
- Arthur Hotzel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VAPOR CLEAN FOR HAZE AND PARTICLE REMOVAL FROM LITHOGRAPHIC PHOTOMASKS
- Publication number 20120138095
- Publication date Jun 7, 2012
- GLOBALFOUNDRIES INC.
- Arthur Hotzel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Arthur HOTZEL

Person

Patents Grantslast 30 patents

In-situ contactless monitoring of photomask pellicle degradation

Methods, apparatus, and systems for minimizing defectivity in top-c...

Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, re...

Methods including a processing of wafers and spin coating tool

Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, re...

Asymmetric reticle heating of multilayer reticles eliminated by dum...

Reticle defect correction by second exposure

Reticle defect correction by second exposure

Reticle defect correction by second exposure

Mechanical fixture of pellicle to lithographic photomask

Lithographic CD correction by second exposure

Lithographic CD correction by second exposure

Vapor clean for haze and particle removal from lithographic photomasks

Patents Applicationslast 30 patents

METHODS, APPARATUS, AND SYSTEMS FOR MINIMIZING DEFECTIVITY IN TOP-C...

IN-SITU CONTACTLESS MONITORING OF PHOTOMASK PELLICLE DEGRADATION

METHODS INCLUDING A PROCESSING OF WAFERS AND SPIN COATING TOOL

CROSS TECHNOLOGY RETICLE (CTR) OR MULTI-LAYER RETICLE (MLR) CDU, RE...

CROSS TECHNOLOGY RETICLE (CTR) OR MULTI-LAYER RETICLE (MLR) CDU, RE...

RETICLE DEFECT CORRECTION BY SECOND EXPOSURE

ASYMMETRIC RETICLE HEATING OF MULTILAYER RETICLES ELIMINATED BY DUM...

RETICLE DEFECT CORRECTION BY SECOND EXPOSURE

LITHOGRAPHIC CD CORRECTION BY SECOND EXPOSURE

LITHOGRAPHIC CD CORRECTION BY SECOND EXPOSURE

RETICLE DEFECT CORRECTION BY SECOND EXPOSURE

MECHANICAL FIXTURE OF PELLICLE TO LITHOGRAPHIC PHOTOMASK

VAPOR CLEAN FOR HAZE AND PARTICLE REMOVAL FROM LITHOGRAPHIC PHOTOMASKS