Arthur Sato

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Auxiliary circuit in RF matching network for frequency tuning assis...
- Patent number 10,879,044
- Issue date Dec 29, 2020
- Lam Research Corporation
- Yuhou Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for applying frequency and match tuning in a no...
- Patent number 10,679,825
- Issue date Jun 9, 2020
- Lam Research Corporation
- Ying Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for automatically determining capacitor values and systems...
- Patent number 10,438,775
- Issue date Oct 8, 2019
- Lam Research Corporation
- Arthur Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas plenum arrangement for improving etch non-uniformity in transfo...
- Patent number 10,431,426
- Issue date Oct 1, 2019
- Lam Research Corporation
- Tom Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cycle-averaged frequency tuning for low power voltage mode operation
- Patent number 10,347,464
- Issue date Jul 9, 2019
- Lam Research Corporation
- Arthur H. Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for reversing RF current polarity at one output...
- Patent number 10,332,725
- Issue date Jun 25, 2019
- Lam Research Corporation
- Arthur H. Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Determining a malfunctioning device in a plasma system
- Patent number 10,319,570
- Issue date Jun 11, 2019
- Lam Research Corporation
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for calibrating conversion models and performin...
- Patent number 10,297,422
- Issue date May 21, 2019
- Lam Research Corporation
- Arthur H. Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiofrequency adjustment for instability management in semiconduct...
- Patent number 10,134,570
- Issue date Nov 20, 2018
- Lam Research Corporation
- Arthur Sato
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Hybrid edge ring for plasma wafer processing
- Patent number 9,997,381
- Issue date Jun 12, 2018
- Lam Research Corporation
- Brian McMillin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Determining a malfunctioning device in a plasma system
- Patent number 9,620,337
- Issue date Apr 11, 2017
- Lam Research Corporation
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for improving wafer etch non-uniformity when us...
- Patent number 9,484,214
- Issue date Nov 1, 2016
- Lam Research Corporation
- Tom Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and apparatus for RF power compensation in plasma et...
- Patent number 9,412,670
- Issue date Aug 9, 2016
- Lam Research Corporation
- Robert G. O'Neill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode for use in measuring dielectric properties of parts
- Patent number 9,322,795
- Issue date Apr 26, 2016
- Lam Research Corporation
- Jaehyun Kim
- G01 - MEASURING TESTING
Information Patent Grant
Bypass capacitors for high voltage bias power in the mid frequency...
- Patent number 9,083,182
- Issue date Jul 14, 2015
- Lam Research Corporation
- Arthur Sato
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radiofrequency adjustment for instability management in semiconduct...
- Patent number 9,059,101
- Issue date Jun 16, 2015
- Lam Research Corporation
- Arthur Sato
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods for automatically determining capacitor values and systems...
- Patent number 8,828,259
- Issue date Sep 9, 2014
- Lam Research Corporation
- Arthur H. Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Current control in plasma processing systems
- Patent number 8,736,175
- Issue date May 27, 2014
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synchronized and shortened master-slave RF pulsing in a plasma proc...
- Patent number 8,692,467
- Issue date Apr 8, 2014
- Lam Research Corporation
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum sealing radio frequency (RF) and low frequency conducting ac...
- Patent number 8,597,428
- Issue date Dec 3, 2013
- Lam Research Corporation
- Danny Brown
- F15 - FLUID-PRESSURE ACTUATORS HYDRAULICS OR PNEUMATICS IN GENERAL
Information Patent Grant
Electrode for use in measuring dielectric properties of parts
- Patent number 8,519,724
- Issue date Aug 27, 2013
- Lam Research Corporation
- Jaehyun Kim
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for measuring dielectric properties of parts
- Patent number 8,269,510
- Issue date Sep 18, 2012
- Lam Research Corporation
- Jaehyun Kim
- G01 - MEASURING TESTING
Information Patent Grant
Methods for measuring dielectric properties of parts
- Patent number 7,973,539
- Issue date Jul 5, 2011
- Lam Research Corporation
- Jaehyun Kim
- G01 - MEASURING TESTING
Information Patent Grant
Methods for measuring dielectric properties of parts
- Patent number 7,911,213
- Issue date Mar 22, 2011
- Lam Research Corporation
- Jaehyun Kim
- G01 - MEASURING TESTING
Information Patent Grant
Methods for characterizing dielectric properties of parts
- Patent number 7,777,500
- Issue date Aug 17, 2010
- Lam Research Corporation
- Jaehyun Kim
- G01 - MEASURING TESTING
Information Patent Grant
Plasma reactor with coil antenna of concentrically spiral conductor...
- Patent number 6,504,126
- Issue date Jan 7, 2003
- Applied Materials, Inc.
- Xue-Yu Qian
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Pulsed RF power delivery for plasma processing
- Patent number 6,472,822
- Issue date Oct 29, 2002
- Applied Materials, Inc.
- Jin-Yuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with dynamic RF inductive and capacitive coupling co...
- Patent number 6,447,636
- Issue date Sep 10, 2002
- Applied Materials, Inc.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber having a voltage distribution electrode
- Patent number 6,447,637
- Issue date Sep 10, 2002
- Applied Materials Inc.
- Valentin N. Todorov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor inductive coil antenna with flat surface facing the...
- Patent number 6,401,652
- Issue date Jun 11, 2002
- Applied Materials, Inc.
- Jonathan D. Mohn
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Systems and Methods for Applying Frequency and Match Tuning in a No...
- Publication number 20190148114
- Publication date May 16, 2019
- LAM RESEARCH CORPORATION
- Ying Wu
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
AUXILIARY CIRCUIT IN RF MATCHING NETWORK FOR FREQUENCY TUNING ASSIS...
- Publication number 20180294566
- Publication date Oct 11, 2018
- LAM RESEARCH CORPORATION
- Yuhou Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Determining A Malfunctioning Device in A Plasma System
- Publication number 20170178873
- Publication date Jun 22, 2017
- LAM RESEARCH CORPORATION
- John C. Valcore
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR CALIBRATING CONVERSION MODELS AND PERFORMIN...
- Publication number 20170125218
- Publication date May 4, 2017
- LAM RESEARCH CORPORATION
- Arthur H. Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLE-AVERAGED FREQUENCY TUNING FOR LOW POWER VOLTAGE MODE OPERATION
- Publication number 20170076916
- Publication date Mar 16, 2017
- LAM RESEARCH CORPORATION
- Arthur H. Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS PLENUM ARRANGEMENT FOR IMPROVING ETCH NON-UNIFORMITY IN TRANSFO...
- Publication number 20170032931
- Publication date Feb 2, 2017
- LAM RESEARCH CORPORATION
- Tom KAMP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REVERSING RF CURRENT POLARITY AT ONE OUTPUT...
- Publication number 20160293382
- Publication date Oct 6, 2016
- LAM RESEARCH CORPORATION
- Arthur H. Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIOFREQUENCY ADJUSTMENT FOR INSTABILITY MANAGEMENT IN SEMICONDUCT...
- Publication number 20150248995
- Publication date Sep 3, 2015
- LAM RESEARCH CORPORATION
- Arthur Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR IMPROVING WAFER ETCH NON-UNIFORMITY WHEN US...
- Publication number 20150235808
- Publication date Aug 20, 2015
- LAM RESEARCH CORPORATION
- Tom Kamp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Automatically Determining Capacitor Values and Systems...
- Publication number 20140367044
- Publication date Dec 18, 2014
- Arthur Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System, Method and Apparatus for RF Power Compensation in Plasma Et...
- Publication number 20140349417
- Publication date Nov 27, 2014
- LAM RESEARCH CORPORATION
- Robert G. O'Neill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Radiofrequency Adjustment for Instability Management in Semiconduct...
- Publication number 20140256066
- Publication date Sep 11, 2014
- LAM RESEARCH CORPORATION
- Arthur Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID EDGE RING FOR PLASMA WAFER PROCESSING
- Publication number 20140235063
- Publication date Aug 21, 2014
- LAM RESEARCH CORPORATION
- Brian McMillin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Determining A Malfunctioning Device in A Plasma System
- Publication number 20140210508
- Publication date Jul 31, 2014
- LAM RESEARCH CORPORATION
- John C. Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrode for Use in Measuring Dielectric Properties of Parts
- Publication number 20130241581
- Publication date Sep 19, 2013
- LAM RESEARCH CORPORATION
- Jaehyun Kim
- G01 - MEASURING TESTING
Information Patent Application
BYPASS CAPACITORS FOR HIGH VOLTAGE BIAS POWER IN THE MID FREQUENCY...
- Publication number 20130128397
- Publication date May 23, 2013
- LAM RESEARCH CORPORATION
- Arthur Sato
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
SYNCHRONIZED AND SHORTENED MASTER-SLAVE RF PULSING IN A PLASMA PROC...
- Publication number 20130009545
- Publication date Jan 10, 2013
- Neil Martin Paul Benjamin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR AUTOMATICALLY DETERMINING CAPACITOR VALUES AND SYSTEMS...
- Publication number 20130008871
- Publication date Jan 10, 2013
- Arthur H. Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR MEASURING DIELECTRIC PROPERTIES OF PARTS
- Publication number 20110140715
- Publication date Jun 16, 2011
- LAM RESEARCH CORPORATION
- Jaehyun Kim
- G01 - MEASURING TESTING
Information Patent Application
CURRENT CONTROL IN PLASMA PROCESSING SYSTEMS
- Publication number 20110115379
- Publication date May 19, 2011
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Measuring Dielectric Properties of Parts
- Publication number 20100079152
- Publication date Apr 1, 2010
- LAM RESEARCH CORPORATION
- Jaehyun Kim
- G01 - MEASURING TESTING
Information Patent Application
VACUUM SEALING RADIO FREQUENCY (RF) AND LOW FREQUENCY CONDUCTING AC...
- Publication number 20090152958
- Publication date Jun 18, 2009
- LAM RESEARCH CORPORATION
- Danny Brown
- F15 - FLUID-PRESSURE ACTUATORS HYDRAULICS OR PNEUMATICS IN GENERAL
Information Patent Application
Methods for Characterizing Dielectric Properties of Parts
- Publication number 20090091335
- Publication date Apr 9, 2009
- Jaehyun Kim
- G01 - MEASURING TESTING
Information Patent Application
Electrode for Use in Measuring Dielectric Properties of Parts
- Publication number 20090091341
- Publication date Apr 9, 2009
- LAM RESEARCH CORPORATION
- Jaehyun Kim
- G01 - MEASURING TESTING
Information Patent Application
Apparatus for Measuring Dielectric Properties of Parts
- Publication number 20090091340
- Publication date Apr 9, 2009
- LAM RESEARCH CORPORATION
- Jaehyun Kim
- G01 - MEASURING TESTING
Information Patent Application
Process chamber having a voltage distribution electrode
- Publication number 20030006009
- Publication date Jan 9, 2003
- APPLIED MATERIALS, INC.
- Valentin N. Todorov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of eliminating notching when anisotropically etching small l...
- Publication number 20030003748
- Publication date Jan 2, 2003
- Anisul Khan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor with coil antenna of interleaved conductors
- Publication number 20010004000
- Publication date Jun 21, 2001
- APPLIED MATERIALS, INC.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor with coil antenna of plural helical conductors with...
- Publication number 20010001201
- Publication date May 17, 2001
- APPLIED MATERIALS, INC.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor with coil antenna of concentrically spiral conductor...
- Publication number 20010000898
- Publication date May 10, 2001
- APPLIED MATERIALS, INC.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS

Arthur Sato

Person

Patents Grantslast 30 patents

Auxiliary circuit in RF matching network for frequency tuning assis...

Systems and methods for applying frequency and match tuning in a no...

Methods for automatically determining capacitor values and systems...

Gas plenum arrangement for improving etch non-uniformity in transfo...

Cycle-averaged frequency tuning for low power voltage mode operation

Systems and methods for reversing RF current polarity at one output...

Determining a malfunctioning device in a plasma system

Systems and methods for calibrating conversion models and performin...

Radiofrequency adjustment for instability management in semiconduct...

Hybrid edge ring for plasma wafer processing

Determining a malfunctioning device in a plasma system

Systems and methods for improving wafer etch non-uniformity when us...

System, method and apparatus for RF power compensation in plasma et...

Electrode for use in measuring dielectric properties of parts

Bypass capacitors for high voltage bias power in the mid frequency...

Radiofrequency adjustment for instability management in semiconduct...

Methods for automatically determining capacitor values and systems...

Current control in plasma processing systems

Synchronized and shortened master-slave RF pulsing in a plasma proc...

Vacuum sealing radio frequency (RF) and low frequency conducting ac...

Electrode for use in measuring dielectric properties of parts

Apparatus for measuring dielectric properties of parts

Methods for measuring dielectric properties of parts

Methods for measuring dielectric properties of parts

Methods for characterizing dielectric properties of parts

Plasma reactor with coil antenna of concentrically spiral conductor...

Pulsed RF power delivery for plasma processing

Plasma reactor with dynamic RF inductive and capacitive coupling co...

Process chamber having a voltage distribution electrode

Plasma reactor inductive coil antenna with flat surface facing the...

Patents Applicationslast 30 patents

Systems and Methods for Applying Frequency and Match Tuning in a No...

AUXILIARY CIRCUIT IN RF MATCHING NETWORK FOR FREQUENCY TUNING ASSIS...

Determining A Malfunctioning Device in A Plasma System

SYSTEMS AND METHODS FOR CALIBRATING CONVERSION MODELS AND PERFORMIN...

CYCLE-AVERAGED FREQUENCY TUNING FOR LOW POWER VOLTAGE MODE OPERATION

GAS PLENUM ARRANGEMENT FOR IMPROVING ETCH NON-UNIFORMITY IN TRANSFO...

SYSTEMS AND METHODS FOR REVERSING RF CURRENT POLARITY AT ONE OUTPUT...

RADIOFREQUENCY ADJUSTMENT FOR INSTABILITY MANAGEMENT IN SEMICONDUCT...

SYSTEMS AND METHODS FOR IMPROVING WAFER ETCH NON-UNIFORMITY WHEN US...

Methods for Automatically Determining Capacitor Values and Systems...

System, Method and Apparatus for RF Power Compensation in Plasma Et...

Radiofrequency Adjustment for Instability Management in Semiconduct...

HYBRID EDGE RING FOR PLASMA WAFER PROCESSING

Determining A Malfunctioning Device in A Plasma System

Electrode for Use in Measuring Dielectric Properties of Parts

BYPASS CAPACITORS FOR HIGH VOLTAGE BIAS POWER IN THE MID FREQUENCY...

SYNCHRONIZED AND SHORTENED MASTER-SLAVE RF PULSING IN A PLASMA PROC...

METHODS FOR AUTOMATICALLY DETERMINING CAPACITOR VALUES AND SYSTEMS...

METHODS FOR MEASURING DIELECTRIC PROPERTIES OF PARTS

CURRENT CONTROL IN PLASMA PROCESSING SYSTEMS

Methods for Measuring Dielectric Properties of Parts

VACUUM SEALING RADIO FREQUENCY (RF) AND LOW FREQUENCY CONDUCTING AC...

Methods for Characterizing Dielectric Properties of Parts

Electrode for Use in Measuring Dielectric Properties of Parts

Apparatus for Measuring Dielectric Properties of Parts

Process chamber having a voltage distribution electrode

Method of eliminating notching when anisotropically etching small l...

Plasma reactor with coil antenna of interleaved conductors

Plasma reactor with coil antenna of plural helical conductors with...

Plasma reactor with coil antenna of concentrically spiral conductor...