Atashi Basu

Person

Menlo Park, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and precursors for selective deposition of metal films
- Patent number 11,887,847
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Kurt Fredrickson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Determination of recipes for manufacturing semiconductor devices
- Patent number 11,836,429
- Issue date Dec 5, 2023
- Lam Research Corporation
- Kapil Umesh Sawlani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Doped and undoped vanadium oxides for low-k spacer applications
- Patent number 11,621,160
- Issue date Apr 4, 2023
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and precursors for selective deposition of metal films
- Patent number 11,515,151
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Kurt Fredrickson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal precursors with modified diazabutadiene ligands for CVD and A...
- Patent number 11,332,488
- Issue date May 17, 2022
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Doped and undoped vanadium oxides for low-k spacer applications
- Patent number 11,094,533
- Issue date Aug 17, 2021
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precursors for the atomic layer deposition of transition metals and...
- Patent number 11,078,224
- Issue date Aug 3, 2021
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and materials for modifying the threshold voltage of metal...
- Patent number 11,049,722
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Siddarth Krishnan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fill process optimization using feature scale modeling
- Patent number 10,977,405
- Issue date Apr 13, 2021
- Lam Research Corporation
- Michael Bowes
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Silicon nitride films with high nitrogen content
- Patent number 10,811,250
- Issue date Oct 20, 2020
- Applied Materials, Inc.
- Atashi Basu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal precursors with modified diazabutadiene ligands for CVD and A...
- Patent number 10,752,649
- Issue date Aug 25, 2020
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition and treatment of films for patterning
- Patent number 10,699,952
- Issue date Jun 30, 2020
- Applied Materials, Inc.
- Atashi Basu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and materials for modifying the threshold voltage of metal...
- Patent number 10,615,041
- Issue date Apr 7, 2020
- Applied Materials, Inc.
- Siddarth Krishnan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low thickness dependent work-function nMOS integration for metal gate
- Patent number 10,608,097
- Issue date Mar 31, 2020
- Applied Materials, Inc.
- Paul F. Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Schemes for selective deposition for patterning applications
- Patent number 10,510,546
- Issue date Dec 17, 2019
- Applied Materials, Inc.
- Atashi Basu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doped and undoped vanadium oxides for low-k spacer applications
- Patent number 10,475,642
- Issue date Nov 12, 2019
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deployment of light energy within specific spectral bands in specif...
- Patent number 10,373,823
- Issue date Aug 6, 2019
- Applied Materials, Inc.
- Swaminathan T. Srinivasan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Schemes for selective deposition for patterning applications
- Patent number 10,347,495
- Issue date Jul 9, 2019
- Applied Materials, Inc.
- Atashi Basu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition and treatment of films for patterning
- Patent number 10,319,636
- Issue date Jun 11, 2019
- Applied Materials, Inc.
- Atashi Basu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aluminum content control of TiAIN films
- Patent number 10,170,321
- Issue date Jan 1, 2019
- Applied Materials, Inc.
- Wenyu Zhang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DETERMINATION OF RECIPES FOR MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20240095432
- Publication date Mar 21, 2024
- LAM RESEARCH CORPORATION
- Kapil Umesh Sawlani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Methods and Precursors for Selective Deposition of Metal Films
- Publication number 20230170210
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Kurt Fredrickson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DETERMINATION OF RECIPE FOR MANUFACTURING SEMICONDUCTOR
- Publication number 20220374572
- Publication date Nov 24, 2022
- LAM RESEARCH CORPORATION
- Kapil Umesh Sawlani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Doped And Undoped Vanadium Oxides For Low-K Spacer Applications
- Publication number 20210358744
- Publication date Nov 18, 2021
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Precursors With Modified Diazabutadiene Ligands For CVD And...
- Publication number 20200377538
- Publication date Dec 3, 2020
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Methods And Precursors For Selective Deposition Of Metal Films
- Publication number 20200312653
- Publication date Oct 1, 2020
- Applied Materials, Inc.
- Kurt Fredrickson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILL PROCESS OPTIMIZATION USING FEATURE SCALE MODELING
- Publication number 20200242209
- Publication date Jul 30, 2020
- LAM RESEARCH CORPORATION
- Michael Bowes
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Methods And Materials For Modifying The Threshold Voltage Of Metal...
- Publication number 20200234959
- Publication date Jul 23, 2020
- Applied Materials, Inc.
- Siddarth Krishnan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Doped And Undoped Vanadium Oxides For Low-K Spacer Applications
- Publication number 20200035486
- Publication date Jan 30, 2020
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Schemes for Selective Deposition for Patterning Applications
- Publication number 20190287807
- Publication date Sep 19, 2019
- Applied Materials, Inc.
- Atashi Basu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition And Treatment Of Films For Patterning
- Publication number 20190252252
- Publication date Aug 15, 2019
- Applied Materials, Inc.
- Atashi Basu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods And Materials For Modifying The Threshold Voltage Of Metal...
- Publication number 20190181011
- Publication date Jun 13, 2019
- Applied Materials, Inc.
- Siddarth Krishnan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING CAPPING PROTECTION FOR AN INTERCONNECTION STRUC...
- Publication number 20190148150
- Publication date May 16, 2019
- Applied Materials, Inc.
- Joung Joo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Thickness Dependent Work-Function nMOS Integration For Metal Gate
- Publication number 20190019874
- Publication date Jan 17, 2019
- Applied Materials, Inc.
- Paul F. Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon Nitride Films With High Nitrogen Content
- Publication number 20190013197
- Publication date Jan 10, 2019
- Applied Materials, Inc.
- Atashi Basu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPLOYMENT OF LIGHT ENERGY WITHIN SPECIFIC SPECTRAL BANDS IN SPECIF...
- Publication number 20180350595
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Swaminathan T. SRINIVASAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRECURSORS FOR THE ATOMIC LAYER DEPOSITION OF TRANSITION METALS AND...
- Publication number 20180291051
- Publication date Oct 11, 2018
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL PRECURSORS WITH MODIFIED DIAZABUTADIENE LIGANDS FOR CVD AND...
- Publication number 20180291052
- Publication date Oct 11, 2018
- Applied Materials, Inc.
- Jeffrey W. Anthis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Aluminum Content Control of TiAIN Films
- Publication number 20180269065
- Publication date Sep 20, 2018
- Applied Materials, Inc.
- Wenyu Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Schemes for Selective Deposition for Patterning Applications
- Publication number 20180218914
- Publication date Aug 2, 2018
- Applied Materials, Inc.
- Atashi Basu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition And Treatment Of Films For Patterning
- Publication number 20180144980
- Publication date May 24, 2018
- Applied Materials, Inc.
- Atashi Basu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Doped And Undoped Vanadium Oxides For Low-K Spacer Applications
- Publication number 20170309476
- Publication date Oct 26, 2017
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- H01 - BASIC ELECTRIC ELEMENTS

Atashi Basu

Person

Patents Grantslast 30 patents

Methods and precursors for selective deposition of metal films

Determination of recipes for manufacturing semiconductor devices

Doped and undoped vanadium oxides for low-k spacer applications

Methods and precursors for selective deposition of metal films

Metal precursors with modified diazabutadiene ligands for CVD and A...

Doped and undoped vanadium oxides for low-k spacer applications

Precursors for the atomic layer deposition of transition metals and...

Methods and materials for modifying the threshold voltage of metal...

Fill process optimization using feature scale modeling

Silicon nitride films with high nitrogen content

Metal precursors with modified diazabutadiene ligands for CVD and A...

Deposition and treatment of films for patterning

Methods and materials for modifying the threshold voltage of metal...

Low thickness dependent work-function nMOS integration for metal gate

Schemes for selective deposition for patterning applications

Doped and undoped vanadium oxides for low-k spacer applications

Deployment of light energy within specific spectral bands in specif...

Schemes for selective deposition for patterning applications

Deposition and treatment of films for patterning

Aluminum content control of TiAIN films

Patents Applicationslast 30 patents

DETERMINATION OF RECIPES FOR MANUFACTURING SEMICONDUCTOR DEVICES

Methods and Precursors for Selective Deposition of Metal Films

DETERMINATION OF RECIPE FOR MANUFACTURING SEMICONDUCTOR

Doped And Undoped Vanadium Oxides For Low-K Spacer Applications

Metal Precursors With Modified Diazabutadiene Ligands For CVD And...

Methods And Precursors For Selective Deposition Of Metal Films

FILL PROCESS OPTIMIZATION USING FEATURE SCALE MODELING

Methods And Materials For Modifying The Threshold Voltage Of Metal...

Doped And Undoped Vanadium Oxides For Low-K Spacer Applications

Schemes for Selective Deposition for Patterning Applications

Deposition And Treatment Of Films For Patterning

Methods And Materials For Modifying The Threshold Voltage Of Metal...

METHODS FOR FORMING CAPPING PROTECTION FOR AN INTERCONNECTION STRUC...

Low Thickness Dependent Work-Function nMOS Integration For Metal Gate

Silicon Nitride Films With High Nitrogen Content

DEPLOYMENT OF LIGHT ENERGY WITHIN SPECIFIC SPECTRAL BANDS IN SPECIF...

PRECURSORS FOR THE ATOMIC LAYER DEPOSITION OF TRANSITION METALS AND...

METAL PRECURSORS WITH MODIFIED DIAZABUTADIENE LIGANDS FOR CVD AND...

Aluminum Content Control of TiAIN Films

Schemes for Selective Deposition for Patterning Applications

Deposition And Treatment Of Films For Patterning

Doped And Undoped Vanadium Oxides For Low-K Spacer Applications