Atsuki Fukazawa

Person

Tama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for forming silicon nitride film selectively on top/bottom p...
- Patent number 11,676,812
- Issue date Jun 13, 2023
- ASM IP Holding B.V.
- Dai Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing silicon-free carbon-containing film as gap-fi...
- Patent number 11,646,197
- Issue date May 9, 2023
- ASM IP Holding B.V.
- Timothee Julien Vincent Blanquart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of topology-selective film formation of silicon oxide
- Patent number 11,637,011
- Issue date Apr 25, 2023
- ASM IP Holding B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing carbon-containing material on a surface of a s...
- Patent number 11,626,316
- Issue date Apr 11, 2023
- ASM IP Holding B.V.
- Mitsuya Utsuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming a topographically selective silicon oxide film...
- Patent number 11,610,774
- Issue date Mar 21, 2023
- ASM IP Holding B.V.
- Aurélie Kuroda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for filling a gap
- Patent number 11,610,775
- Issue date Mar 21, 2023
- ASM IP Holding B.V.
- Viljami Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Si precursors for deposition of SiN at low temperatures
- Patent number 11,587,783
- Issue date Feb 21, 2023
- ASM IP Holding B.V.
- Antti J. Niskanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming carbon-containing silicon/metal oxide or nitride...
- Patent number 11,453,943
- Issue date Sep 27, 2022
- ASM IP Holding B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 11,302,527
- Issue date Apr 12, 2022
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of topology-selective film formation of silicon oxide
- Patent number 11,127,589
- Issue date Sep 21, 2021
- ASM IP Holding B.V.
- Masaru Zaitsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Si precursors for deposition of SiN at low temperatures
- Patent number 11,069,522
- Issue date Jul 20, 2021
- ASM IP Holding B.V.
- Antti J. Niskanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 11,056,345
- Issue date Jul 6, 2021
- ASM IP Holding B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming conformal silicon carbide film by cyclic CVD
- Patent number 10,847,365
- Issue date Nov 24, 2020
- ASM IP Holding B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 10,784,105
- Issue date Sep 22, 2020
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing silicon-free carbon-containing film as gap-fi...
- Patent number 10,755,922
- Issue date Aug 25, 2020
- ASM IP Holding B.V.
- Timothee Julien Vincent Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming silicon nitride film selectively on top surface
- Patent number 10,720,322
- Issue date Jul 21, 2020
- ASM IP Holding B.V.
- Dai Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing oxide film by thermal ALD and PEALD
- Patent number 10,655,221
- Issue date May 19, 2020
- ASM IP Holding B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming silicon nitride film selectively on sidewalls or...
- Patent number 10,529,554
- Issue date Jan 7, 2020
- ASM IP Holding B.V.
- Dai Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 10,510,530
- Issue date Dec 17, 2019
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming spacers using silicon nitride film for spacer-de...
- Patent number 10,468,251
- Issue date Nov 5, 2019
- ASM IP Holding B.V.
- Dai Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of subatmospheric plasma-enhanced ALD using capacitively cou...
- Patent number 10,435,790
- Issue date Oct 8, 2019
- ASM IP Holding B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for filling a gap
- Patent number 10,395,919
- Issue date Aug 27, 2019
- ASM IP Holding B.V.
- Zaitsu Masaru
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Si precursors for deposition of SiN at low temperatures
- Patent number 10,395,917
- Issue date Aug 27, 2019
- ASM IP Holding B.V.
- Antti J. Niskanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for manufacturing semiconductor devices
- Patent number 10,262,865
- Issue date Apr 16, 2019
- ASM IP Holding B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Formation of silicon-containing thin films
- Patent number 10,186,420
- Issue date Jan 22, 2019
- ASM IP Holding B.V.
- Atsuki Fukazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming conformal nitrided, oxidized, or carbonized diel...
- Patent number 10,179,947
- Issue date Jan 15, 2019
- ASM IP Holding B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 10,147,600
- Issue date Dec 4, 2018
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Si precursors for deposition of SiN at low temperatures
- Patent number 9,905,416
- Issue date Feb 27, 2018
- ASM IP Holding B.V.
- Antti J. Niskanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 9,875,893
- Issue date Jan 23, 2018
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method of processing substrate
- Patent number 9,818,601
- Issue date Nov 14, 2017
- ASM IP Holding B.V.
- Masaki Tokunaga
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240150890
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Atsuki FUKAZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING A BORON NITRIDE FILM BY A PLASMA ENHANCED ATOMI...
- Publication number 20230272527
- Publication date Aug 31, 2023
- ASM IP HOLDING B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR FILLING A GAP
- Publication number 20230207309
- Publication date Jun 29, 2023
- ASM IP HOLDING B.V.
- Viljami PORE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING A TOPOGRAPHICALLY SELECTIVE SILICON OXIDE FILM...
- Publication number 20230143580
- Publication date May 11, 2023
- ASM IP HOLDING B.V.
- Aurélie Kuroda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20230031720
- Publication date Feb 2, 2023
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FILLING A GAP
- Publication number 20210313167
- Publication date Oct 7, 2021
- ASM IP HOLDING B.V.
- Viljami PORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DEPOSITING CARBON-CONTAINING MATERIAL ON A SURFACE OF A S...
- Publication number 20210151348
- Publication date May 20, 2021
- ASM IP HOLDING B.V.
- Mitsuya Utsuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF TOPOLOGY-SELECTIVE FILM FORMATION OF SILICON OXIDE
- Publication number 20210118667
- Publication date Apr 22, 2021
- ASM IP HOLDING B.V.
- Atsuki Fukazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A TOPOGRAPHICALLY SELECTIVE SILICON OXIDE FILM...
- Publication number 20210104399
- Publication date Apr 8, 2021
- ASM IP HOLDING B.V.
- Aurélie Kuroda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
- Publication number 20210082684
- Publication date Mar 18, 2021
- ASM IP HOLDING B.V.
- Antti J. Niskanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20200388487
- Publication date Dec 10, 2020
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITING SILICON-FREE CARBON-CONTAINING FILM AS GAP-FI...
- Publication number 20200365391
- Publication date Nov 19, 2020
- ASM IP HOLDING B.V.
- Timothee Julien Vincent Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING A BORON NITRIDE FILM BY A PLASMA ENHANCED ATOMI...
- Publication number 20200318237
- Publication date Oct 8, 2020
- ASM IP HOLDING B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING SILICON NITRIDE FILM SELECTIVELY ON TOP/BOTTOM P...
- Publication number 20200321209
- Publication date Oct 8, 2020
- ASM IP HOLDING B.V.
- Dai Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF TOPOLOGY-SELECTIVE FILM FORMATION OF SILICON OXIDE
- Publication number 20200251328
- Publication date Aug 6, 2020
- ASM IP HOLDING B.V.
- Masaru Zaitsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20200185218
- Publication date Jun 11, 2020
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING CONFORMAL SILICON CARBIDE FILM BY CYCLIC CVD
- Publication number 20200118815
- Publication date Apr 16, 2020
- ASM IP HOLDING B.V.
- Atsuki Fukazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITING OXIDE FILM BY PEALD USING NITROGEN
- Publication number 20200111669
- Publication date Apr 9, 2020
- ASM IP HOLDING B.V.
- Masaru Zaitsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING SILICON-FREE CARBON-CONTAINING FILM AS GAP-FI...
- Publication number 20200013612
- Publication date Jan 9, 2020
- ASM IP HOLDING B.V.
- Timothee Julien Vincent Blanquart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
- Publication number 20190371594
- Publication date Dec 5, 2019
- ASM IP HOLDING B.V.
- Antti J. Niskanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL PRECURSORS AND METHODS FOR DEPOSITING A SILICON OXIDE FILM...
- Publication number 20190249303
- Publication date Aug 15, 2019
- ASM IP HOLDING B.V.
- Aurélie Kuroda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20190189454
- Publication date Jun 20, 2019
- ASM IP HOLDING B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20190172708
- Publication date Jun 6, 2019
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SILICON NITRIDE FILM SELECTIVELY ON SIDEWALLS OF...
- Publication number 20190057857
- Publication date Feb 21, 2019
- ASM IP HOLDING B.V.
- Dai Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
- Publication number 20180366314
- Publication date Dec 20, 2018
- ASM IP HOLDING B.V.
- Antti J. Niskanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20180301342
- Publication date Oct 18, 2018
- ASM IP HOLDING B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING OXIDE FILM BY THERMAL ALD AND PEALD
- Publication number 20180223429
- Publication date Aug 9, 2018
- ASM IP HOLDING B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20180211834
- Publication date Jul 26, 2018
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF SILICON-CONTAINING THIN FILMS
- Publication number 20180151355
- Publication date May 31, 2018
- ASM IP HOLDING B.V.
- Atsuki Fukazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SUBATMOSPHERIC PLASMA-ENHANCED ALD USING CAPACITIVELY COU...
- Publication number 20180119283
- Publication date May 3, 2018
- ASM IP HOLDING B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Atsuki Fukazawa

Person

Patents Grantslast 30 patents

Method for forming silicon nitride film selectively on top/bottom p...

Method for depositing silicon-free carbon-containing film as gap-fi...

Method of topology-selective film formation of silicon oxide

Method of depositing carbon-containing material on a surface of a s...

Methods for forming a topographically selective silicon oxide film...

Method and apparatus for filling a gap

Si precursors for deposition of SiN at low temperatures

Method for forming carbon-containing silicon/metal oxide or nitride...

Methods for forming doped silicon oxide thin films

Method of topology-selective film formation of silicon oxide

Si precursors for deposition of SiN at low temperatures

Method for manufacturing semiconductor device

Method of forming conformal silicon carbide film by cyclic CVD

Methods for forming doped silicon oxide thin films

Method for depositing silicon-free carbon-containing film as gap-fi...

Method for forming silicon nitride film selectively on top surface

Method for depositing oxide film by thermal ALD and PEALD

Method for forming silicon nitride film selectively on sidewalls or...

Methods for forming doped silicon oxide thin films

Method for forming spacers using silicon nitride film for spacer-de...

Method of subatmospheric plasma-enhanced ALD using capacitively cou...

Method and apparatus for filling a gap

Si precursors for deposition of SiN at low temperatures

Methods for manufacturing semiconductor devices

Formation of silicon-containing thin films

Method for forming conformal nitrided, oxidized, or carbonized diel...

Methods for forming doped silicon oxide thin films

Si precursors for deposition of SiN at low temperatures

Methods for forming doped silicon oxide thin films

Substrate processing apparatus and method of processing substrate

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD

METHODS FOR FORMING A BORON NITRIDE FILM BY A PLASMA ENHANCED ATOMI...

METHOD AND APPARATUS FOR FILLING A GAP

METHODS FOR FORMING A TOPOGRAPHICALLY SELECTIVE SILICON OXIDE FILM...

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

METHOD AND APPARATUS FOR FILLING A GAP

METHOD OF DEPOSITING CARBON-CONTAINING MATERIAL ON A SURFACE OF A S...

METHOD OF TOPOLOGY-SELECTIVE FILM FORMATION OF SILICON OXIDE

METHODS FOR FORMING A TOPOGRAPHICALLY SELECTIVE SILICON OXIDE FILM...

Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

METHOD FOR DEPOSITING SILICON-FREE CARBON-CONTAINING FILM AS GAP-FI...

METHODS FOR FORMING A BORON NITRIDE FILM BY A PLASMA ENHANCED ATOMI...

METHOD FOR FORMING SILICON NITRIDE FILM SELECTIVELY ON TOP/BOTTOM P...

METHOD OF TOPOLOGY-SELECTIVE FILM FORMATION OF SILICON OXIDE

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

METHOD OF FORMING CONFORMAL SILICON CARBIDE FILM BY CYCLIC CVD

METHOD FOR DEPOSITING OXIDE FILM BY PEALD USING NITROGEN

METHOD FOR DEPOSITING SILICON-FREE CARBON-CONTAINING FILM AS GAP-FI...

Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES

CHEMICAL PRECURSORS AND METHODS FOR DEPOSITING A SILICON OXIDE FILM...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

METHOD FOR FORMING SILICON NITRIDE FILM SELECTIVELY ON SIDEWALLS OF...

Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES

METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES

METHOD FOR DEPOSITING OXIDE FILM BY THERMAL ALD AND PEALD

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

FORMATION OF SILICON-CONTAINING THIN FILMS

METHOD OF SUBATMOSPHERIC PLASMA-ENHANCED ALD USING CAPACITIVELY COU...