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Atsuko Hirata
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Kanagawa, JP
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Patents Grants
last 30 patents
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Patent Grant
Phenol novolak resin, production process thereof, and positive phot...
Patent number
6,939,926
Issue date
Sep 6, 2005
Tokyo Ohka Kogyo Co., Ltd.
Ken Miyagi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Positive photoresist composition comprising a phenolic compound hav...
Patent number
6,475,694
Issue date
Nov 5, 2002
Tokyo Ohka Kogyo Co., Ltd.
Kousuke Doi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive photoresist compositions and multilayer resist materials u...
Patent number
6,187,500
Issue date
Feb 13, 2001
Tokyo Ohka Kogyo Co., Ltd.
Ken Miyagi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
Phenol novolak resin, production process thereof, and positive phot...
Publication number
20040167312
Publication date
Aug 26, 2004
Tokyo Ohka Kogyo Co., Ltd.
Ken Miyagi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Positive photoresist composition
Publication number
20020001769
Publication date
Jan 3, 2002
Tokyo Ohka Kogyo Co., Ltd.
Kousuke Doi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Phenol novolak resin, production process thereof, and positive phot...
Publication number
20010024762
Publication date
Sep 27, 2001
Ken Miyagi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...