Atsushi Gomi

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film thickness measurement method, film thickness measurement devic...
- Patent number 12,018,928
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Kazunaga Ono
- G01 - MEASURING TESTING
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 11,894,222
- Issue date Feb 6, 2024
- Tokyo Electron Limited
- Atsushi Takeuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus
- Patent number 11,551,918
- Issue date Jan 10, 2023
- Tokyo Electron Limited
- Kenichi Imakita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering method and sputtering apparatus
- Patent number 11,404,255
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Kazunaga Ono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 10,468,237
- Issue date Nov 5, 2019
- Tokyo Electron Limited
- Atsushi Gomi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition device and deposition method
- Patent number 10,309,005
- Issue date Jun 4, 2019
- Tokyo Electron Limited
- Yasuhiko Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 10,049,860
- Issue date Aug 14, 2018
- Tokyo Electron Limited
- Atsushi Gomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method using reversible decomposition reaction
- Patent number 9,976,217
- Issue date May 22, 2018
- Tokyo Electron Limited
- Atsushi Gomi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum-processing apparatus, vacuum-processing method, and storage...
- Patent number 9,790,590
- Issue date Oct 17, 2017
- Tokyo Electron Limited
- Shinji Furukawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 9,576,850
- Issue date Feb 21, 2017
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 9,551,060
- Issue date Jan 24, 2017
- Tokyo Electron Limited
- Atsushi Gomi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition device
- Patent number 9,404,180
- Issue date Aug 2, 2016
- Tokyo Electron Limited
- Masamichi Hara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate mounting mechanism, and substrate processing apparatus
- Patent number 9,202,728
- Issue date Dec 1, 2015
- Tokyo Electron Limited
- Masamichi Hara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for film formation, apparatus for film formation, and comput...
- Patent number 9,062,374
- Issue date Jun 23, 2015
- Tokyo Electron Limited
- Masamichi Hara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming Cu wiring
- Patent number 9,064,690
- Issue date Jun 23, 2015
- Tokyo Electron Limited
- Tadahiro Ishizaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 8,999,841
- Issue date Apr 7, 2015
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mounting table structure, film forming apparatus and raw material r...
- Patent number 8,992,686
- Issue date Mar 31, 2015
- Tokyo Electron Limited
- Atsushi Gomi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming copper wiring and method and system for forming c...
- Patent number 8,859,422
- Issue date Oct 14, 2014
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Raw material recovery method and trapping mechanism for recovering...
- Patent number 8,408,025
- Issue date Apr 2, 2013
- Tokyo Electron Limited
- Atsushi Gomi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming copper wiring and copper film, and film forming...
- Patent number 8,399,353
- Issue date Mar 19, 2013
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal recovery method, metal recovery apparatus, gas exhaust system...
- Patent number 8,349,283
- Issue date Jan 8, 2013
- Tokyo Electron Limited
- Masamichi Hara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method and film formation apparatus
- Patent number 8,277,889
- Issue date Oct 2, 2012
- Tokyo Electron Limited
- Atsushi Gomi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for film formation, apparatus for film formation, and comput...
- Patent number 8,273,409
- Issue date Sep 25, 2012
- Tokyo Electron Limited
- Masamichi Hara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Void-free copper filling of recessed features using a smooth non-ag...
- Patent number 8,247,030
- Issue date Aug 21, 2012
- Tokyo Electron Limited
- Kenji Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas switching mechanism for plasma processing apparatus
- Patent number 7,717,061
- Issue date May 18, 2010
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing metal layers from metal-carbonyl precursors
- Patent number 7,078,341
- Issue date Jul 18, 2006
- Tokyo Electron Limited
- Hideaki Yamasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-pressure deposition of metal layers from metal-carbonyl precursors
- Patent number 6,989,321
- Issue date Jan 24, 2006
- Tokyo Electron Limited
- Hideaki Yamasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a metal layer using an intermittent precursor gas...
- Patent number 6,924,223
- Issue date Aug 2, 2005
- Tokyo Electron Limited
- Hideaki Yamasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR MAKING SEMICONDUCTOR DEVICES THAT INCLUDE METAL CAP LAYERS
- Publication number 20240363410
- Publication date Oct 31, 2024
- TOKYO ELECTRON LIMITED
- Ryota Yonezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING POSITION MISALIGNMENT CORRECTION METHOD AND FILM FORMI...
- Publication number 20240011148
- Publication date Jan 11, 2024
- TOKYO ELECTRON LIMITED
- Atsushi TAKEUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL OXIDE PRECLEANING PRIOR TO METAL FILLING
- Publication number 20230411142
- Publication date Dec 21, 2023
- TOKYO ELECTRON LIMITED
- Ryota Yonezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM THICKNESS MEASUREMENT METHOD, FILM THICKNESS MEASUREMENT DEVIC...
- Publication number 20230011226
- Publication date Jan 12, 2023
- TOKYO ELECTRON LIMITED
- Kazunaga ONO
- G01 - MEASURING TESTING
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20230005989
- Publication date Jan 5, 2023
- TOKYO ELECTRON LIMITED
- Keisuke SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS, PROCESSING CONDITION DETERMINATION METHOD,...
- Publication number 20220415634
- Publication date Dec 29, 2022
- TOKYO ELECTRON LIMITED
- Kenichi Imakita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20220098717
- Publication date Mar 31, 2022
- TOKYO ELECTRON LIMITED
- Kenichi IMAKITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20210407779
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Atsushi TAKEUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING METHOD AND SPUTTERING APPARATUS
- Publication number 20210082675
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Kazunaga ONO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20200381226
- Publication date Dec 3, 2020
- TOKYO ELECTRON LIMITED
- Kenichi IMAKITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OXIDATION PROCESSING MODULE, SUBSTRATE PROCESSING SYSTEM, AND OXIDA...
- Publication number 20200123649
- Publication date Apr 23, 2020
- TOKYO ELECTRON LIMITED
- Kazunaga ONO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20180315585
- Publication date Nov 1, 2018
- TOKYO ELECTRON LIMITED
- Atsushi Gomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming Perpendicular Magnetization Type Magnetic Tunnel...
- Publication number 20170317273
- Publication date Nov 2, 2017
- TOKYO ELECTRON LIMITED
- Toru KITADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION DEVICE AND DEPOSITION METHOD
- Publication number 20160251746
- Publication date Sep 1, 2016
- Tokyo Electron Limited
- Yasuhiko KOJIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20160032446
- Publication date Feb 4, 2016
- TOKYO ELECTRON LIMITED
- Atsushi GOMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20150235815
- Publication date Aug 20, 2015
- TOKYO ELECTRON LIMITED
- Atsushi Gomi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum-Processing Apparatus, Vacuum-Processing Method, and Storage...
- Publication number 20150187546
- Publication date Jul 2, 2015
- TOKYO ELECTRON LIMITED
- Shinji Furukawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MAGNETRON SPUTTERING APPARATUS
- Publication number 20150187549
- Publication date Jul 2, 2015
- TOKYO ELECTRON LIMITED
- Toru Kitada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETRON SPUTTERING DEVICE, MAGNETRON SPUTTERING METHOD, AND NON-T...
- Publication number 20150136596
- Publication date May 21, 2015
- TOKYO ELECTRON LIMITED
- Kanto Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20150114835
- Publication date Apr 30, 2015
- TOKYO ELECTRON LIMITED
- Atsushi GOMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLACING TABLE STRUCTURE
- Publication number 20150044368
- Publication date Feb 12, 2015
- TOKYO ELECTRON LIMITED
- Atsushi Gomi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20140377947
- Publication date Dec 25, 2014
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTER DEVICE
- Publication number 20140346037
- Publication date Nov 27, 2014
- Shigeru MIZUNO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING COPPER WIRING AND METHOD AND SYSTEM FOR FORMING C...
- Publication number 20140287163
- Publication date Sep 25, 2014
- Tadahiro ISHIZAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE, SE...
- Publication number 20140103529
- Publication date Apr 17, 2014
- TOKYO ELECTRON LIMITED
- Kenji Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING CU WIRING
- Publication number 20140045329
- Publication date Feb 13, 2014
- TOKYO ELECTRON LIMITED
- Tadahiro ISHIZAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING COPPER WIRING
- Publication number 20140030886
- Publication date Jan 30, 2014
- TOKYO ELECTRON LIMITED
- Takara FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THIN FILM FORMING METHOD
- Publication number 20130252417
- Publication date Sep 26, 2013
- TOKYO ELECTRON LIMITED
- Tadahiro ISHIZAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20130237053
- Publication date Sep 12, 2013
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20130203250
- Publication date Aug 8, 2013
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Atsushi Gomi

Person

Patents Grantslast 30 patents

Film thickness measurement method, film thickness measurement devic...

Film forming apparatus and film forming method

Film forming apparatus

Sputtering method and sputtering apparatus

Substrate processing apparatus

Deposition device and deposition method

Substrate processing apparatus

Film forming method using reversible decomposition reaction

Vacuum-processing apparatus, vacuum-processing method, and storage...

Method for manufacturing semiconductor device

Film forming apparatus and film forming method

Deposition device

Substrate mounting mechanism, and substrate processing apparatus

Method for film formation, apparatus for film formation, and comput...

Method for forming Cu wiring

Semiconductor device manufacturing method

Mounting table structure, film forming apparatus and raw material r...

Method of forming copper wiring and method and system for forming c...

Raw material recovery method and trapping mechanism for recovering...

Methods of forming copper wiring and copper film, and film forming...

Metal recovery method, metal recovery apparatus, gas exhaust system...

Film formation method and film formation apparatus

Method for film formation, apparatus for film formation, and comput...

Void-free copper filling of recessed features using a smooth non-ag...

Gas switching mechanism for plasma processing apparatus

Method of depositing metal layers from metal-carbonyl precursors

Low-pressure deposition of metal layers from metal-carbonyl precursors

Method of forming a metal layer using an intermittent precursor gas...

Patents Applicationslast 30 patents

METHODS FOR MAKING SEMICONDUCTOR DEVICES THAT INCLUDE METAL CAP LAYERS

FILM FORMING POSITION MISALIGNMENT CORRECTION METHOD AND FILM FORMI...

METAL OXIDE PRECLEANING PRIOR TO METAL FILLING

FILM THICKNESS MEASUREMENT METHOD, FILM THICKNESS MEASUREMENT DEVIC...

FILM FORMING APPARATUS AND FILM FORMING METHOD

FILM FORMING APPARATUS, PROCESSING CONDITION DETERMINATION METHOD,...

FILM FORMING APPARATUS AND FILM FORMING METHOD

FILM FORMING APPARATUS AND FILM FORMING METHOD

SPUTTERING METHOD AND SPUTTERING APPARATUS

FILM FORMING APPARATUS

OXIDATION PROCESSING MODULE, SUBSTRATE PROCESSING SYSTEM, AND OXIDA...

SUBSTRATE PROCESSING APPARATUS

Method for Forming Perpendicular Magnetization Type Magnetic Tunnel...

DEPOSITION DEVICE AND DEPOSITION METHOD

FILM FORMING APPARATUS AND FILM FORMING METHOD

SUBSTRATE PROCESSING APPARATUS

Vacuum-Processing Apparatus, Vacuum-Processing Method, and Storage...

MAGNETRON SPUTTERING APPARATUS

MAGNETRON SPUTTERING DEVICE, MAGNETRON SPUTTERING METHOD, AND NON-T...

FILM FORMING APPARATUS

PLACING TABLE STRUCTURE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

SPUTTER DEVICE

METHOD OF FORMING COPPER WIRING AND METHOD AND SYSTEM FOR FORMING C...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE, SE...

METHOD FOR FORMING CU WIRING

METHOD FOR FORMING COPPER WIRING

THIN FILM FORMING METHOD

FILM FORMING METHOD AND FILM FORMING APPARATUS

SEMICONDUCTOR DEVICE MANUFACTURING METHOD