Atsushi Hukushima

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Ibaraki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Tantalum sputtering target and method of manufacturing same
- Patent number 8,172,960
- Issue date May 8, 2012
- JX Nippon Mining & Metals Corporation
- Kunihiro Oda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target and manufacturing method thereof
- Patent number 8,029,629
- Issue date Oct 4, 2011
- JX Nippon Mining & Metals Corporation
- Atsushi Hukushima
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Patents Applicationslast 30 patents

Information Patent Application
Sputtering Target and Manufacturing Method Thereof
- Publication number 20100058827
- Publication date Mar 11, 2010
- Nippon Mining & Metals Co., Ltd.
- Atsushi Hukushima
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Tantalum sputtering target and method of manufacturing same
- Publication number 20070102288
- Publication date May 10, 2007
- Nikko Materials Co., Ltd.
- Kunihiro Oda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering target and production method therefor
- Publication number 20040245099
- Publication date Dec 9, 2004
- Atsushi Hukushima
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...