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Atsushi Ishikawa
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Hagagun, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Process for producing polyurethane
Patent number
6,767,929
Issue date
Jul 27, 2004
Kao Corporation
Atsushi Ishikawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Process for producing polyurethane foam
Patent number
6,410,608
Issue date
Jun 25, 2002
Kao Corporation
Mitsuru Sakai
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polyurethane foam for shoe soles
Patent number
6,329,441
Issue date
Dec 11, 2001
Kao Corporation
Makoto Okubo
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Semi-rigid polyurethane foam
Patent number
6,306,918
Issue date
Oct 23, 2001
Kao Corporation
Mitsuru Sakai
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Magnetic recording medium and manufacturing the same
Patent number
5,560,977
Issue date
Oct 1, 1996
Kao Corporation
Yuzo Yamamoto
G11 - INFORMATION STORAGE
Information
Patent Grant
Magnetic recording apparatus having reduced friction sliding parts
Patent number
5,162,962
Issue date
Nov 10, 1992
Kao Corporation
Michihide Yamauchi
G11 - INFORMATION STORAGE
Information
Patent Grant
Glasslike carbon composite material and method of preparing the same
Patent number
4,958,998
Issue date
Sep 25, 1990
Kao Corporation
Michihide Yamauchi
C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Patents Applications
last 30 patents
Information
Patent Application
POLYOL MIXTURE FOR PRODUCING RIGID POLYURETHANE FOAM
Publication number
20160145374
Publication date
May 26, 2016
KAO CORPORATION
Atsushi ISHIKAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Process for producing polyurethane
Publication number
20030004220
Publication date
Jan 2, 2003
Atsushi Ishikawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...