Atsushi Miyamoto

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Detergent for lithography and method of forming resist pattern with...
- Patent number 8,367,312
- Issue date Feb 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic rinse solution and method for forming patterned resist...
- Patent number 7,897,325
- Issue date Mar 1, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro Sawada
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Resist pattern forming method and composite rinse agent
- Patent number 7,811,748
- Issue date Oct 12, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning liquid for lithography and method for resist pattern forma...
- Patent number 7,795,197
- Issue date Sep 14, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rinsing fluid for lithography
- Patent number 7,741,260
- Issue date Jun 22, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Patents Applicationslast 30 patents

Information Patent Application
Detergent For Lithography And Method Of Forming Resist Pattern With...
- Publication number 20090004608
- Publication date Jan 1, 2009
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Rinsing Liquid for Lithography and Method for Resist Pattern Forma...
- Publication number 20080193876
- Publication date Aug 14, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning Liquid For Lithography And Method For Resist Pattern Forma...
- Publication number 20080096141
- Publication date Apr 24, 2008
- Yoshihiro Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Rinsing Fluid for Lithography
- Publication number 20080026975
- Publication date Jan 31, 2008
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Pattern Forming Method and Composite Rinse Agent
- Publication number 20070218399
- Publication date Sep 20, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Rinse Solution For Lithography
- Publication number 20070218412
- Publication date Sep 20, 2007
- TOKYO OHKA KOGYO CO., LTD.
- Jun Koshiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic rinse solution and method for forming patterned resist...
- Publication number 20060128581
- Publication date Jun 15, 2006
- Yoshihiro Sawada
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Atsushi Miyamoto

Person

Patents Grantslast 30 patents

Detergent for lithography and method of forming resist pattern with...

Lithographic rinse solution and method for forming patterned resist...

Resist pattern forming method and composite rinse agent

Cleaning liquid for lithography and method for resist pattern forma...

Rinsing fluid for lithography

Patents Applicationslast 30 patents

Detergent For Lithography And Method Of Forming Resist Pattern With...

Rinsing Liquid for Lithography and Method for Resist Pattern Forma...

Cleaning Liquid For Lithography And Method For Resist Pattern Forma...

Rinsing Fluid for Lithography

Resist Pattern Forming Method and Composite Rinse Agent

Rinse Solution For Lithography

Lithographic rinse solution and method for forming patterned resist...