Atsushi Sawachi

Person

Kurokawa-gun, Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Gas supply system, plasma processing apparatus, and gas supply method
- Patent number 12,170,187
- Issue date Dec 17, 2024
- Tokyo Electron Limited
- Atsushi Sawachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Performance calculation method and processing apparatus
- Patent number 12,046,454
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Atsushi Sawachi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Substrate processing apparatus, substrate processing system, and ma...
- Patent number 12,040,166
- Issue date Jul 16, 2024
- Tokyo Electron Limited
- Atsushi Sawachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow rate controller, gas supply system, and flow rate control method
- Patent number 12,033,834
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Atsushi Sawachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring device, measuring method, and vacuum processing apparatus
- Patent number 12,002,666
- Issue date Jun 4, 2024
- Tokyo Electron Limited
- Atsushi Sawachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Part replacement system and part replacement device
- Patent number 11,992,912
- Issue date May 28, 2024
- Tokyo Electron Limited
- Atsushi Sawachi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Gas supply system and gas supply method
- Patent number 11,698,648
- Issue date Jul 11, 2023
- Tokyo Electron Limited
- Atsushi Sawachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply system, plasma processing apparatus, and control method...
- Patent number 11,694,878
- Issue date Jul 4, 2023
- Tokyo Electron Limited
- Atsushi Sawachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas supply system, substrate processing apparatus, and control meth...
- Patent number 11,538,665
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Atsushi Sawachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of inspecting and inspection apparatus
- Patent number 11,513,541
- Issue date Nov 29, 2022
- Tokyo Electron Limited
- Atsushi Sawachi
- G01 - MEASURING TESTING
Information Patent Grant
Gas supply system, plasma processing apparatus, and control method...
- Patent number 11,217,432
- Issue date Jan 4, 2022
- Tokyo Electron Limited
- Atsushi Sawachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas supply system and gas supply method
- Patent number 10,996,688
- Issue date May 4, 2021
- Tokyo Electron Limited
- Atsushi Sawachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply system, substrate processing system and gas supply method
- Patent number 10,665,430
- Issue date May 26, 2020
- Tokyo Electron Limited
- Atsushi Sawachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing method
- Patent number 10,665,431
- Issue date May 26, 2020
- Tokyo Electron Limited
- Kazuyuki Tezuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method and processing apparatus
- Patent number 10,607,819
- Issue date Mar 31, 2020
- Tokyo Electron Limited
- Eiji Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for inspecting for leaks in gas supply system valves
- Patent number 10,533,916
- Issue date Jan 14, 2020
- Tokyo Electron Limited
- Atsushi Sawachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply system, plasma processing apparatus, and operation metho...
- Patent number 10,472,717
- Issue date Nov 12, 2019
- Tokyo Electron Limited
- Atsushi Sawachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply system, gas supply control method and gas replacement me...
- Patent number 10,229,844
- Issue date Mar 12, 2019
- Tokyo Electron Limited
- Atsushi Sawachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply control method
- Patent number 9,904,299
- Issue date Feb 27, 2018
- Tokyo Electron Limited
- Kumiko Ono
- G05 - CONTROLLING REGULATING
Information Patent Grant
Apparatus for dividing and supplying gas and method for dividing an...
- Patent number 9,477,232
- Issue date Oct 25, 2016
- Fujikin Incorporated
- Eiji Takahashi
- G05 - CONTROLLING REGULATING

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND MA...
- Publication number 20240339306
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASURING DEVICE, MEASURING METHOD, AND VACUUM PROCESSING APPARATUS
- Publication number 20240290591
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- G01 - MEASURING TESTING
Information Patent Application
PART REPLACEMENT SYSTEM AND PART REPLACEMENT DEVICE
- Publication number 20240261918
- Publication date Aug 8, 2024
- TOKYO ELECTRON LIMITED
- Atsushi Sawachi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
GAS SUPPLY DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20240242976
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Jun HIROSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY SYSTEM, GAS CONTROL SYSTEM, PLASMA PROCESSING APPARATUS,...
- Publication number 20240212987
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS, AND GAS SUPPLY METHOD
- Publication number 20230230812
- Publication date Jul 20, 2023
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20220148890
- Publication date May 12, 2022
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND MA...
- Publication number 20220122818
- Publication date Apr 21, 2022
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS, AND CONTROL METHOD...
- Publication number 20220115213
- Publication date Apr 14, 2022
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20210407768
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PART REPLACEMENT SYSTEM AND PART REPLACEMENT DEVICE
- Publication number 20210339350
- Publication date Nov 4, 2021
- TOKYO ELECTRON LIMITED
- Atsushi Sawachi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
GAS SUPPLY SYSTEM AND GAS SUPPLY METHOD
- Publication number 20210216088
- Publication date Jul 15, 2021
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MEASURING DEVICE, MEASURING METHOD, AND VACUUM PROCESSING APPARATUS
- Publication number 20210175055
- Publication date Jun 10, 2021
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- G01 - MEASURING TESTING
Information Patent Application
GAS SUPPLY SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND CONTROL METH...
- Publication number 20210134564
- Publication date May 6, 2021
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOW RATE CONTROLLER, GAS SUPPLY SYSTEM, AND FLOW RATE CONTROL ME...
- Publication number 20210111004
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY SYSTEM, PLASMA PROCESSING DEVICE, AND CONTROL METHOD F...
- Publication number 20210043425
- Publication date Feb 11, 2021
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PERFORMANCE CALCULATION METHOD AND PROCESSING APPARATUS
- Publication number 20210013012
- Publication date Jan 14, 2021
- TOKYO ELECTRON LIMITED
- Atsushi Sawachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF INSPECTING AND FLOW RATE CONTROLLER
- Publication number 20200124456
- Publication date Apr 23, 2020
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD OF INSPECTING AND INSPECTION APPARATUS
- Publication number 20200124455
- Publication date Apr 23, 2020
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- G05 - CONTROLLING REGULATING
Information Patent Application
GAS SUPPLY SYSTEM AND GAS SUPPLY METHOD
- Publication number 20190138033
- Publication date May 9, 2019
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING METHOD
- Publication number 20180294145
- Publication date Oct 11, 2018
- TOKYO ELECTRON LIMITED
- Kazuyuki Tezuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR INSPECTING FOR LEAKS IN GAS SUPPLY SYSTEM VALVES
- Publication number 20180180509
- Publication date Jun 28, 2018
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20180122620
- Publication date May 3, 2018
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY SYSTEM, SUBSTRATE PROCESSING SYSTEM AND GAS SUPPLY METHOD
- Publication number 20180012735
- Publication date Jan 11, 2018
- TOKYO ELECTRON LIMITED
- Atsushi SAWACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS, AND OPERATION METHO...
- Publication number 20170159180
- Publication date Jun 8, 2017
- TOKYO ELECTRON LIMITED
- Atsushi Sawachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY SYSTEM, GAS SUPPLY CONTROL METHOD AND GAS REPLACEMENT ME...
- Publication number 20160372348
- Publication date Dec 22, 2016
- TOKYO ELECTRON LIMITED
- Atsushi Sawachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY CONTROL METHOD
- Publication number 20160299514
- Publication date Oct 13, 2016
- TOKYO ELECTRON LIMITED
- Kumiko ONO
- G05 - CONTROLLING REGULATING
Information Patent Application
GAS SUPPLY METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150228457
- Publication date Aug 13, 2015
- TOKYO ELECTRON LIMITED
- Kazuo Yamashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150206713
- Publication date Jul 23, 2015
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR DIVIDING AND SUPPLYING GAS AND METHOD FOR DIVIDING AN...
- Publication number 20150059859
- Publication date Mar 5, 2015
- Fujikin Incorporated
- Eiji Takahashi
- G05 - CONTROLLING REGULATING

Atsushi Sawachi

Person

Patents Grantslast 30 patents

Gas supply system, plasma processing apparatus, and gas supply method

Performance calculation method and processing apparatus

Substrate processing apparatus, substrate processing system, and ma...

Flow rate controller, gas supply system, and flow rate control method

Measuring device, measuring method, and vacuum processing apparatus

Part replacement system and part replacement device

Gas supply system and gas supply method

Gas supply system, plasma processing apparatus, and control method...

Gas supply system, substrate processing apparatus, and control meth...

Method of inspecting and inspection apparatus

Gas supply system, plasma processing apparatus, and control method...

Gas supply system and gas supply method

Gas supply system, substrate processing system and gas supply method

Processing method

Cleaning method and processing apparatus

Method for inspecting for leaks in gas supply system valves

Gas supply system, plasma processing apparatus, and operation metho...

Gas supply system, gas supply control method and gas replacement me...

Gas supply control method

Apparatus for dividing and supplying gas and method for dividing an...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND MA...

MEASURING DEVICE, MEASURING METHOD, AND VACUUM PROCESSING APPARATUS

PART REPLACEMENT SYSTEM AND PART REPLACEMENT DEVICE

GAS SUPPLY DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS

GAS SUPPLY SYSTEM, GAS CONTROL SYSTEM, PLASMA PROCESSING APPARATUS,...

GAS SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS, AND GAS SUPPLY METHOD

PROCESSING APPARATUS AND PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND MA...

GAS SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS, AND CONTROL METHOD...

SUBSTRATE PROCESSING APPARATUS

PART REPLACEMENT SYSTEM AND PART REPLACEMENT DEVICE

GAS SUPPLY SYSTEM AND GAS SUPPLY METHOD

MEASURING DEVICE, MEASURING METHOD, AND VACUUM PROCESSING APPARATUS

GAS SUPPLY SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND CONTROL METH...

FLOW RATE CONTROLLER, GAS SUPPLY SYSTEM, AND FLOW RATE CONTROL ME...

GAS SUPPLY SYSTEM, PLASMA PROCESSING DEVICE, AND CONTROL METHOD F...

PERFORMANCE CALCULATION METHOD AND PROCESSING APPARATUS

METHOD OF INSPECTING AND FLOW RATE CONTROLLER

METHOD OF INSPECTING AND INSPECTION APPARATUS

GAS SUPPLY SYSTEM AND GAS SUPPLY METHOD

PROCESSING METHOD

METHOD FOR INSPECTING FOR LEAKS IN GAS SUPPLY SYSTEM VALVES

PLASMA PROCESSING APPARATUS

GAS SUPPLY SYSTEM, SUBSTRATE PROCESSING SYSTEM AND GAS SUPPLY METHOD

GAS SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS, AND OPERATION METHO...

GAS SUPPLY SYSTEM, GAS SUPPLY CONTROL METHOD AND GAS REPLACEMENT ME...

GAS SUPPLY CONTROL METHOD

GAS SUPPLY METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

APPARATUS FOR DIVIDING AND SUPPLYING GAS AND METHOD FOR DIVIDING AN...